Patents by Inventor Michihiro Kawaguchi

Michihiro Kawaguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for detecting substrate position of charged particle beam photolithography apparatus and charged particle beam photolithography apparatus
    Patent number: 8237139
    Abstract: One aspect of the invention provides a substrate position detecting method for charged particle beam photolithography apparatus in order to be able to measure accurately and simply a substrate position on a stage.
    Type: Grant
    Filed: May 12, 2010
    Date of Patent: August 7, 2012
    Assignee: NuFlare Technology, Inc.
    Inventors: Kota Fujiwara, Yoshiro Yamanaka, Michihiro Kawaguchi, Kazuhiro Shiba
  • SUBSTRATE COVER AND CHARGED PARTICLE BEAM WRITING METHOD USING SAME
    Publication number: 20110155930
    Abstract: A substrate cover 40 includes a conductive portion 41 having a shape corresponding to a peripheral edge region of a substrate. Since at least part of the conductive portion includes transmissive portions 47 each formed of a light transmissive member, it is configured so as to allow desired light to penetrate through. The position of each edge portion of the substrate is detected in such a manner that the substrate is disposed with the substrate cover 40 placed thereon between light irradiation means and a light detecting unit, irradiation light directed from the light irradiation means located above the substrate to the edge portion of the substrate is made to penetrate through at least part of the substrate cover 40, the edge portion of the substrate is then irradiated with light from the irradiation means.
    Type: Application
    Filed: December 16, 2010
    Publication date: June 30, 2011
    Applicants: NuFlare Technology, Inc., Kabushiki Kaisha Toshiba
    Inventors: Michihiro KAWAGUCHI, Keisuke Yamaguchi, Shun Kanezawa, Soichiro Mitsui, Kiminobu Akeno
  • METHOD FOR DETECTING SUBSTRATE POSITION OF CHARGED PARTICLE BEAM PHOTOLITHOGRAPHY APPARATUS AND CHARGED PARTICLE BEAM PHOTOLITHOGRAPHY APPARATUS
    Publication number: 20100290023
    Abstract: One aspect of the invention provides a substrate position detecting method for charged particle beam photolithography apparatus in order to be able to measure accurately and simply a substrate position on a stage.
    Type: Application
    Filed: May 12, 2010
    Publication date: November 18, 2010
    Applicant: NuFlare Technology, Inc.
    Inventors: Kota FUJIWARA, Yoshiro Yamanaka, Michihiro Kawaguchi, Kazuhiro Shiba