Patents by Inventor Michihiro OGAWA

Michihiro OGAWA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200050106
    Abstract: A photosensitive composition for EUV light includes a predetermined resin and a photoacid generator, or includes a predetermined resin having a repeating unit having a photoacid generating group, and satisfies Conditions 1 and 2, Condition 1: The A value determined by Formula (1) is 0.14 or more, A=([H]×0.04+[C]×1.0+[N]×2.1+[O]×3.6+[F]×5.6+[S]×1.5+[I]×39.5)/([H]×1+[C]×12+[N]×14+[O]×16+[F]×19+[S]×32+[I]×127)??Formula (1): Condition 2: The concentration of the solid content in the photosensitive composition for EUV light is 2.5% by mass or less.
    Type: Application
    Filed: October 17, 2019
    Publication date: February 13, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Michihiro SHIRAKAWA, Hajime FURUTANI, Mitsuhiro FUJITA, Tomotaka TSUCHIMURA, Takashi KAWASHIMA, Michihiro OGAWA, Akihiro KANEKO, Hironori OKA, Yasuharu SHIRAISHI
  • Publication number: 20190243039
    Abstract: A structure includes: a near infrared transmitting filter that shields light in a visible range and allows transmission of at least a part of light in a near infrared range; and a member that is provided on an optical path of the near infrared transmitting filter on at least one of an incidence side into the near infrared transmitting filter or an emission side from the near infrared transmitting filter, allows transmission of light in a near infrared range, and has a refractive index of 1.7 or higher for the light in the near infrared range.
    Type: Application
    Filed: April 16, 2019
    Publication date: August 8, 2019
    Applicant: FUJIFILM Corporation
    Inventors: Hirotaka TAKISHITA, Yutaro FUKAMI, Kyohei ARAYAMA, Hiroaki IDEI, Michihiro OGAWA, Yushi KANEKO, Shunsuke KITAJIMA
  • Publication number: 20190219922
    Abstract: There is provided a resist composition containing a resin. The resin includes a repeating unit (a) having one or more *—OY0 groups substituted for an aromatic ring; and a phenolic hydroxyl group (b) or a partial structure (c) represented by Formula (X). Here, the *—OY0 group is a group that is decomposed due to an action of an acid to generate a phenolic hydroxyl group, and Y0 is a specific protective group. In a case where the repeating unit (a) includes none of the phenolic hydroxyl group (b) and the partial structure (c), the repeating unit (a) is a repeating unit in which the *—OY0 group is decomposed due to an action of an acid to generate two or more phenolic hydroxyl groups.
    Type: Application
    Filed: March 25, 2019
    Publication date: July 18, 2019
    Applicant: FujiFilm Corporation
    Inventors: Akihiro KANEKO, Shuji Hirano, Takashi Kawashima, Michihiro Ogawa, Hajime Furutani, Wataru Nihashi, Hideaki Tsubaki, Kyohei Sakita
  • Publication number: 20190185656
    Abstract: A curable composition contains a resin containing a curable group, a colorant, a polymerization inhibitor, and a polymerization initiator. A manufacturing method of the curable composition includes a colorant dispersing step of mixing together the resin containing a curable group, the colorant, and the polymerization inhibitor and a mixing step of mixing together the colorant dispersion and the polymerization initiator so as to obtain the curable composition. A cured film is obtained by curing the curable composition. A color filter, a solid-state imaging element, and an infrared sensor have the cured film. A manufacturing method of the cured film includes a curable composition layer-forming step, an exposure step, and a development step.
    Type: Application
    Filed: February 22, 2019
    Publication date: June 20, 2019
    Applicant: FUJIFILM Corporation
    Inventors: Michihiro Ogawa, Yutaro Fukami, Junichi Ito, Yushi Kaneko, Hiroaki Idei, Daisuke Hamada, Tatsuo Ishikawa
  • Publication number: 20180355088
    Abstract: The present invention provides a dispersion composition from which a curable composition having excellent developability can be obtained and in which generation of precipitates under a low temperature environment is suppressed. In addition, the present invention provides a curable composition, a light-shielding film obtained by curing the curable composition, a color filter containing a cured film obtained by curing the curable composition, a solid-state imaging device and an image display device, a resin, and a method for manufacturing a cured film. The dispersion composition of the present invention contains a colorant and a resin, in which the resin contains a structural unit A having a polymer chain and a structural unit B having an acid group, and the polymer chain contains 2 or more structural units GF, and the structural unit GF is selected from the group consisting of a structural unit composed of an oxyalkylene group and a structural unit composed of an oxyalkylene carbonyl group.
    Type: Application
    Filed: August 21, 2018
    Publication date: December 13, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Michihiro OGAWA, Yutaro FUKAMI
  • Publication number: 20180188650
    Abstract: An object of the present invention is to provide a curable composition satisfying both of excellent low reflectivity and excellent developability, a method for producing a cured film, an infrared color filter provided with a light-shielding film, and a solid-state imaging device. The curable composition of the present invention includes a fluorine-containing polymer including a repeating unit represented by Formula (A) and a repeating unit represented by Formula (B), a polymerizable compound, and a coloring agent. In Formula (A), R1 represents a hydrogen atom or an alkyl group, and L1 represents a divalent chained linking group having 3 or more carbon atoms in total, which may include an ester bond. In Formula (B), R2 represents a hydrogen atom or an alkyl group, L2 represents a single bond or a divalent linking group, and Rf represents a monovalent organic group including an fluorine atom.
    Type: Application
    Filed: February 27, 2018
    Publication date: July 5, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Michihiro OGAWA, Hideki TAKAKUWA, Hisamitsu TOMEBA
  • Patent number: 10005722
    Abstract: A polyester resin composition including a ketene imine compound represented by the Formula (1) and polyester shows excellent hydrolysis resistance and prevents yellowing. At least one of R11, R12, R21 and R22 represents an alkyl, aryl, alkoxy or aryloxy group which may have a substituent; R15 and R25 represent an alkyl, aryl, alkoxy or aryloxy group which may have a substituent; R3 represents an alkyl or aryl group which may have a substituent; and a and b represent an integer of 0 to 3.
    Type: Grant
    Filed: September 10, 2015
    Date of Patent: June 26, 2018
    Assignee: FUJIFILM Corporation
    Inventors: Masaomi Makino, Shigeki Uehira, Makoto Fukuda, Masatoshi Mizumura, Michihiro Ogawa
  • Patent number: 9533945
    Abstract: By forming a polyester film from a polyester resin composition including ketene imine compound represented by the following Formula (1) and polyester, the polyester film having excellent hydrolysis resistance in which volatilization of the ketene imine compound or the ketene compound can be suppressed. In Formula (1), R1 and R2 represent an alkyl group, an aryl group, an alkoxy group, an alkoxycarbonyl group, an aminocarbonyl group, an aryloxy group, an acyl group, or an aryloxycarbonyl group, and the R1—C(?C)—R2 substructure has a molecular weight of 320 or greater. R3 represents an alkyl group or an aryl group.
    Type: Grant
    Filed: May 5, 2015
    Date of Patent: January 3, 2017
    Assignee: FUJIFILM CORPORATION
    Inventors: Shigeki Uehira, Makoto Fukuda, Michihiro Ogawa, Masaomi Makino, Masatoshi Mizumura, Seiya Sakurai
  • Publication number: 20160280851
    Abstract: A polyester resin composition is provided with which irritant gases do not occur in production and no increase in the viscosity of a polyester resin is exhibited even when a terminal blocking agent is contained. The composition includes an iminoether compound of Formula (1) and a polyester. Further provided are an iminoether compound, a method for producing a carboxylic acid ester, a polyester film, a back sheet for a solar cell module, and a solar cell module. R2 represents an optionally substituted alkyl, cycloalkyl, aryl or alkoxy group; R3 represents a specific alkyl or aryl group; and R11, R12 and R13 each independently represents a hydrogen atom or an optionally substituted alkyl or aryl group.
    Type: Application
    Filed: June 8, 2016
    Publication date: September 29, 2016
    Applicant: FUJIFILM Corporation
    Inventors: Shigeki UEHIRA, Makoto FUKUDA, Michihiro OGAWA, Masatoshi MIZUMURA
  • Publication number: 20160002150
    Abstract: A polyester resin composition including a ketene imine compound represented by the Formula (1) and polyester shows excellent hydrolysis resistance and prevents yellowing. At least one of R11, R12, R21 and R22 represents an alkyl, aryl, alkoxy or aryloxy group which may have a substituent; R15 and R25 represent an alkyl, aryl, alkoxy or aryloxy group which may have a substituent; R3 represents an alkyl or aryl group which may have a substituent; and a and b represent an integer of 0 to 3.
    Type: Application
    Filed: September 10, 2015
    Publication date: January 7, 2016
    Applicant: FUJIFILM Corporation
    Inventors: Masaomi MAKINO, Shigeki UEHIRA, Makoto FUKUDA, Masatoshi MIZUMURA, Michihiro OGAWA
  • Publication number: 20150232419
    Abstract: By forming a polyester film from a polyester resin composition including ketene imine compound represented by the following Formula (1) and polyester, the polyester film having excellent hydrolysis resistance in which volatilization of the ketene imine compound or the ketene compound can be suppressed. In Formula (1), R1 and R2 represent an alkyl group, an aryl group, an alkoxy group, an alkoxycarbonyl group, an aminocarbonyl group, an aryloxy group, an acyl group, or an aryloxycarbonyl group, and the R1—C(?C)—R2 substructure has a molecular weight of 320 or greater. R3 represents an alkyl group or an aryl group.
    Type: Application
    Filed: May 5, 2015
    Publication date: August 20, 2015
    Applicant: FUJIFILM CORPORATION
    Inventors: Shigeki UEHIRA, Makoto FUKUDA, Michihiro OGAWA, Masaomi MAKINO, Masatoshi MIZUMURA, Seiya SAKURAI