Patents by Inventor Michihisa Takachi

Michihisa Takachi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Resist mask processing method using hydrogen containing plasma
    Patent number: 9337020
    Abstract: A method for processing a resist mask includes: (a) a step of preparing, in a processing chamber, a target object to be processed having a patterned resist mask provided thereon; and (b) a step of generating a plasma of the hydrogen-containing gas by supplying a hydrogen-containing gas and supplying a microwave into the processing chamber. The hydrogen-containing gas may be, e.g., H2 gas.
    Type: Grant
    Filed: June 17, 2013
    Date of Patent: May 10, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Michihisa Takachi, Yusuke Shimizu, Toshihisa Ozu
  • RESIST MASK PROCESSING METHOD
    Publication number: 20150104957
    Abstract: A method for processing a resist mask includes: (a) a step of preparing, in a processing chamber, a target object to be processed having a patterned resist mask provided thereon; and (b) a step of generating a plasma of the hydrogen-containing gas by supplying a hydrogen-containing gas and supplying a microwave into the processing chamber. The hydrogen-containing gas may be, e.g., H2 gas.
    Type: Application
    Filed: June 17, 2013
    Publication date: April 16, 2015
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Michihisa Takachi, Yusuke Shimizu, Toshihisa Ozu