Abstract: Provided is an anti-fog coating composition that rarely suffers from blushing when applied and dried even under high-humidity conditions and that can be heat-cured even at low temperature in a short time and form a coating film that exhibits excellent tight adhesion to a substrate and excellent heat resistance and anti-fog properties. The anti-fog coating composition comprises (A) a copolymer prepared from a monomer mixture of a monomer (A1), a monomer (A2) and a monomer (A3); (B) a basic compound such as amines; and (C) a surfactant such as anionic surfactants. The monomer (A1) is a vinyl monomer that has an N-methylol group or an N-alkoxymethylol group. The monomer (A2) is a vinyl monomer that has a sulfonic acid group. The monomer (A3) is an alkyl(meth)acrylate monomer.

Abstract: Provided is an anti-fog coating composition that rarely suffers from blushing when applied and dried even under high-humidity conditions and that can be heat-cured even at low temperature in a short time and form a coating film that exhibits excellent tight adhesion to a substrate and excellent heat resistance and anti-fog properties. The anti-fog coating composition comprises (A) a copolymer prepared from a monomer mixture of a monomer (A1), a monomer (A2) and a monomer (A3); (B) a basic compound such as amines; and (C) a surfactant such as anionic surfactants. The monomer (A1) is a vinyl monomer that has an N-methylol group or an N-alkoxymethylol group. The monomer (A2) is a vinyl monomer that has a sulfonic acid group. The monomer (A3) is an alkyl(meth)acrylate monomer.

Abstract: A graft copolymer composition capable of producing a molded product retaining a satisfactory appearance over a long period of time and having abrasion resistance, scratching resistance and bending resistance. The graft copolymer composition contains a graft copolymer as the main component and a lubricant including a fatty acid amide or an alkylene oxide derivative. The graft copolymer includes an olefin polymer segment (a) and a vinyl polymer segment (b). Particles of one segment are dispersed in the other one segment. The diameter of the particles is 0.001 to 10 ?m. The vinyl polymer segment (b) is formed from a polar vinyl monomer.

Abstract: The invention provides a heat-resistant, low-dielectric polymeric material that is preferably a copolymer in which a non-polar &agr;-olefin base polymer segment and a vinyl aromatic copolymer segment are chemically combined with each other, and that is a thermoplastic resin showing a multi-phase structure in which a dispersion phase formed by one segment is finely dispersed in a continuous phase formed by another segment. It is thus possible to achieve a polymeric material that is excellent in heat resistance, has high strength, and has a low dielectric constant and a reduced dielectric loss, and so is suitable for an electrical insulating material for high-frequency purposes.

Abstract: The invention has for its object to provide a composite dielectric material having any desired dielectric constant selectable from a relatively wide range in a high-frequency band and a low dielectric loss tangent, and a film, substrate, electronic part or molded or otherwise formed article using the same. To accomplish this object, there is provided a composite dielectric material composition comprising a heat-resistant, low-dielectric polymeric material that is a resin composition comprising one or two or more resins having a weight-average absolute molecular weight of at least 1,000, wherein the sum of carbon atoms and hydrogen atoms in said composition is at least 99%, and some or all resin molecules have a chemical bond therebetween, and a filler. A film, substrate, electronic part or molded or otherwise formed article is obtained using this composition.

Abstract: The present block copolymer contains a structural unit (A) derived from a compound represented by the general formula (I): CH.sub.2 .dbd.CR.sub.1 COOR.sub.2 R.sub.f, and also contains a structural unit (B) consisting of a polymer moiety represented by at least one of the structural formulae (III) and (IV) and another polymer moiety derived from a compound represented by the general formula (II): CH.sub.2 .dbd.CR.sub.3 R.sub.4. For preparing the above block copolymer, a block copolymer consisting of the structural unit (A) derived from a compound represented by the general formula (I): CH.sub.2 .dbd.CR.sub.1 COOR.sub.2 R.sub.f and the structural unit (B1) derived from a compound represented by the general formula (II): CH.sub.2 .dbd.CR.sub.3 R.sub.4 and a compound represented by the general formula (V): CH.dbd.CR.sub.6 COO(R.sub.9).sub.t H are reacted with a compound represented by the general formula (VI): R.sub.10 COCl to allow a dehydrochlorination reaction to take place.