Patents by Inventor Michihito Nakatani

Michihito Nakatani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240399319
    Abstract: The present invention provides an anion exchange membrane that has low electrical resistance when used in electrodialysis, is produced without an increase in cost, and is excellent in selective permeability to monovalent anions, and a method for producing the same. The anion exchange membrane has a tertiary amino group and a quaternary ammonium group as functional groups, such that an intensity ratio of the tertiary amino group to the quaternary ammonium group is 1.0 or more as measured by X-ray photoelectron spectroscopy on a surface of the anion exchange membrane having the tertiary amino group and the quaternary ammonium group as the functional groups.
    Type: Application
    Filed: August 24, 2022
    Publication date: December 5, 2024
    Applicants: ASTOM Corporation, TOKUYAMA CORPORATION
    Inventors: Kazuo MIZUGUCHI, Nobuhiko OHMURA, Masayuki KISHINO, Michihito NAKATANI
  • Patent number: 11186600
    Abstract: A bismuth compound which is little toxic, insoluble in a monomer, usable for optical purpose and used as a substitute for a lead compound, in which a phosphoric acid ester having a (meth)acrylic group(s) is bonded to bismuth, and a method of producing the bismuth compound by reacting bismuth (meth)acrylate or bismuth subsalicylate with a phosphoric acid ester having a (meth)acrylic group(s) and carrying out dehydration.
    Type: Grant
    Filed: March 14, 2019
    Date of Patent: November 30, 2021
    Assignee: TOKUYAMA CORPORATION
    Inventors: Takayoshi Kawasaki, Junji Momoda, Tomohiro Kawamura, Mayumi Kishi, Michihito Nakatani
  • Publication number: 20210070790
    Abstract: A bismuth compound which is little toxic, insoluble in a monomer, usable for optical purpose and used as a substitute for a lead compound, in which a phosphoric acid ester having a (meth)acrylic group(s) is bonded to bismuth, and a method of producing the bismuth compound by reacting bismuth (meth)acrylate or bismuth subsalicylate with a phosphoric acid ester having a (meth)acrylic group(s) and carrying out dehydration.
    Type: Application
    Filed: March 14, 2019
    Publication date: March 11, 2021
    Applicant: TOKUYAMA CORPORATION
    Inventors: Takayoshi KAWASAKI, Junji MOMODA, Tomohiro KAWAMURA, Mayumi KISHI, Michihito NAKATANI
  • Patent number: 10906021
    Abstract: The purpose of the present invention is to provide a stainless steel member and a production method thereof, said stainless steel member having a passivation layer formed on a surface of a base material formed from stainless steel, wherein the film thickness of the passivation layer is 2-20 nm, and the concentration of chromium atoms in the outermost surface of the passivation layer is 0.1-2.3 by atomic percentage. Also provided are a device or container, the liquid-contact part of which in contact with a semiconductor treatment liquid is formed from the stainless steel member, a semiconductor treatment liquid production method for producing the semiconductor treatment liquid by using the device, and a semiconductor treatment liquid storage method for storing the semiconductor treatment liquid in the container.
    Type: Grant
    Filed: February 25, 2019
    Date of Patent: February 2, 2021
    Assignee: TOKUYAMA CORPORATION
    Inventors: Akira Sera, Michihito Nakatani, Yumiko Nakamura
  • Publication number: 20210001303
    Abstract: The purpose of the present invention is to provide a stainless steel member and a production method thereof, said stainless steel member having a passivation layer formed on a surface of a base material formed from stainless steel, wherein the film thickness of the passivation layer is 2-20 nm, and the concentration of chromium atoms in the outermost surface of the passivation layer is 0.1-2.3 by atomic percentage. Also provided are a device or container, the liquid-contact part of which in contact with a semiconductor treatment liquid is formed from the stainless steel member, a semiconductor treatment liquid production method for producing the semiconductor treatment liquid by using the device, and a semiconductor treatment liquid storage method for storing the semiconductor treatment liquid in the container.
    Type: Application
    Filed: February 25, 2019
    Publication date: January 7, 2021
    Applicant: TOKUYAMA CORPORATION
    Inventors: Akira Sera, Michihito Nakatani, Yumiko Nakamura