Patents by Inventor Michiko Matsuda
Michiko Matsuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11963448Abstract: When a size is increased for mass production, an area of a pressurized surface is increased. This raised a problem in that insufficient load or the like causes a pressure during pressure sintering and a relative density of a thermoelectric conversion element to be likely to become insufficient. As a solution, there is provided a method for producing a thermoelectric conversion element, including: a step of mixing a skutterudite-type thermoelectric conversion material powder containing Sb and a sintering agent containing a compound including Mn and Sb, to obtain a mixture; and a step of sintering the mixture.Type: GrantFiled: March 22, 2021Date of Patent: April 16, 2024Assignee: Proterial, Ltd.Inventors: Michiko Matsuda, Takeshi Shimada
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Patent number: 11877513Abstract: This method is for manufacturing a thermoelectric conversion module in which a first conductive member, a thermoelectric conversion element, a second conductive member are joined by joining members, the method comprising: a step for, after applying on the first conductive member a first paste including metal particles, disposing the thermoelectric conversion element on the first paste, and compressing and spreading the first paste; a step for disposing the second conductive member, after applying a second paste including metal particles in a controlled amount, on the thermoelectric conversion element, and compressing and spreading the second paste; and a step for sintering the first and the second pastes to obtain joining members.Type: GrantFiled: September 4, 2020Date of Patent: January 16, 2024Assignee: Proterial, Ltd.Inventors: Tomotake Tohei, Takashi Nogawa, Nan Wang, Michiko Matsuda, Takeshi Shimada
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Publication number: 20230180608Abstract: When a size is increased for mass production, an area of a pressurized surface is increased. This raised a problem in that insufficient load or the like causes a pressure during pressure sintering and a relative density of a thermoelectric conversion element to be likely to become insufficient. As a solution, there is provided a method for producing a thermoelectric conversion element, including: a step of mixing a skutterudite-type thermoelectric conversion material powder containing Sb and a sintering agent containing a compound including Mn and Sb, to obtain a mixture; and a step of sintering the mixture.Type: ApplicationFiled: March 22, 2021Publication date: June 8, 2023Inventors: Michiko MATSUDA, Takeshi SHIMADA
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Publication number: 20220320413Abstract: This method is for manufacturing a thermoelectric conversion module in which a first conductive member, a thermoelectric conversion element, a second conductive member are joined by joining members, the method comprising: a step for, after applying on the first conductive member a first paste including metal particles, disposing the thermoelectric conversion element on the first paste, and compressing and spreading the first paste; a step for disposing the second conductive member, after applying a second paste including metal particles in a controlled amount, on the thermoelectric conversion element, and compressing and spreading the second paste; and a step for sintering the first and the second pastes to obtain joining members.Type: ApplicationFiled: September 4, 2020Publication date: October 6, 2022Applicant: HITACHI METALS, LTD.Inventors: Tomotake TOHEI, Takashi NOGAWA, Nan WANG, Michiko MATSUDA, Takeshi SHIMADA
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Patent number: 11411155Abstract: A thermoelectric conversion material includes a sintered body including a main phase including a plurality of crystal grains including Ce, Mn, Fe, and Sb and forming a skutterudite structure, and a grain boundary between crystal grains adjacent to each other. The grain boundary includes a sintering aid phase including at least Mn, Sb, and O. Thus, with respect to a skutterudite-type thermoelectric conversion material including Sb, which is a sintering-resistant material, it is possible to improve sinterability while maintaining a practical dimensionless figure-of-merit ZT, and to reduce processing cost.Type: GrantFiled: September 25, 2019Date of Patent: August 9, 2022Assignee: HITACHI METALS, LTD.Inventors: Michiko Matsuda, Takeshi Shimada, Yoshihiro Kamitani
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Patent number: 11171278Abstract: A thermoelectric conversion material having a high dimensionless figure of merit ZT includes: a large number of polycrystalline grains which include a skutterudite-type crystal structure containing Yb, Co, and Sb; and an intergranular layer which is between the neighboring polycrystalline grains and includes crystals in which an atomic ratio of O to Yb is more than 0.4 and less than 1.5. A method for manufacturing a thermoelectric conversion material includes: a weighing step; a mixing step; a ribbon preparation step by rapidly cooling and solidifying a melt of the raw materials by using a rapid liquid cooling solidifying method; a first heat treatment step including heat treating in an inert atmosphere with an adjusted oxygen concentration; a second heat treatment step including heat treating in a reducing atmosphere; and manufacturing the thermoelectric conversion material by a pressure sintering step in an inert atmosphere.Type: GrantFiled: January 15, 2019Date of Patent: November 9, 2021Assignee: HITACHI METALS, LTD.Inventors: Takeshi Shimada, Nan Wang, Michiko Matsuda
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Publication number: 20210257530Abstract: A thermoelectric conversion material includes a sintered body including a main phase including a plurality of crystal grains including Ce, Mn, Fe, and Sb and forming a skuttterudite structure, and a grain boundary between crystal grains adjacent to each other. The grain boundary includes a sintering aid phase including at least Mn, Sb, and O. Thus, with respect to a skutterudite-type thermoelectric conversion material including Sb, which is a sintering-resistant material, it is possible to improve sinterability while maintaining a practical dimensionless figure-of-merit ZT, and to reduce processing cost.Type: ApplicationFiled: September 25, 2019Publication date: August 19, 2021Applicant: HITACHI METALS, LTD.Inventors: Michiko MATSUDA, Takeshi SHIMADA, Yoshihiro KAMITANI
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Publication number: 20210074898Abstract: A thermoelectric conversion material having a high dimensionless figure of merit ZT includes: a large number of polycrystalline grains which include a skutterudite-type crystal structure containing Yb, Co, and Sb; and an intergranular layer which is between the neighboring polycrystalline grains and includes crystals in which an atomic ratio of O to Yb is more than 0.4 and less than 1.5. A method for manufacturing a thermoelectric conversion material includes: a weighing step; a mixing step; a ribbon preparation step by rapidly cooling and solidifying a melt of the raw materials by using a rapid liquid cooling solidifying method; a first heat treatment step including heat treating in an inert atmosphere with an adjusted oxygen concentration; a second heat treatment step including heat treating in a reducing atmosphere; and manufacturing the thermoelectric conversion material by a pressure sintering step in an inert atmosphere.Type: ApplicationFiled: January 15, 2019Publication date: March 11, 2021Applicant: HITACHI METALS, LTD.Inventors: Takeshi SHIMADA, Nan WANG, Michiko MATSUDA
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Patent number: 10418241Abstract: A nitride semiconductor template includes a substrate, and a chlorine-containing nitride semiconductor layer. The chlorine-containing nitride semiconductor layer contains an iron concentration of not higher than 1×1017 cm?3.Type: GrantFiled: August 20, 2015Date of Patent: September 17, 2019Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Taichiroo Konno, Hajime Fujikura, Michiko Matsuda
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Patent number: 9397232Abstract: There is provided a nitride semiconductor epitaxial substrate having a group III nitride semiconductor layer with C-plane as a surface, grown on a substrate via a buffer layer of the group III nitride semiconductor containing Al, wherein the buffer layer has an inversion domain on the surface.Type: GrantFiled: April 3, 2015Date of Patent: July 19, 2016Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Hajime Fujikura, Taichiroo Konno, Michiko Matsuda
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Patent number: 9236252Abstract: A metal chloride gas generator includes: a tube reactor including a receiving section for receiving a metal on an upstream side, and a growing section in which a growth substrate is placed on a downstream side; a gas inlet pipe arranged to extend from an upstream end with a gas inlet via the receiving section to the growing section, for introducing a gas from the upstream end to supply the gas to the receiving section, and supplying a metal chloride gas produced by a reaction between the gas and the metal in the receiving section to the growing section; and a heat shield plate placed in the reactor to thermally shield the upstream end from the growing section. The gas inlet pipe is bent between the upstream end and the heat shield plate.Type: GrantFiled: August 8, 2012Date of Patent: January 12, 2016Assignee: SCIOCS COMPANY LIMITEDInventors: Taichiroo Konno, Hajime Fujikura, Michiko Matsuda
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Publication number: 20150357416Abstract: A nitride semiconductor template includes a substrate, and a chlorine-containing nitride semiconductor layer. The chlorine-containing nitride semiconductor layer contains an iron concentration of not higher than 1×1017 cm?3.Type: ApplicationFiled: August 20, 2015Publication date: December 10, 2015Inventors: Taichiroo KONNO, Hajime Fujikura, Michiko Matsuda
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Patent number: 9105755Abstract: There is provided a nitride semiconductor epitaxial substrate having a group III nitride semiconductor layer with C-plane as a surface, grown on a substrate via a buffer layer of the group III nitride semiconductor containing Al, wherein the buffer layer has an inversion domain on the surface.Type: GrantFiled: June 15, 2012Date of Patent: August 11, 2015Assignee: HITACHI METALS, LTD.Inventors: Hajime Fujikura, Taichiroo Konno, Michiko Matsuda
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Publication number: 20150214308Abstract: There is provided a nitride semiconductor epitaxial substrate having a group III nitride semiconductor layer with C-plane as a surface, grown on a substrate via a buffer layer of the group III nitride semiconductor containing Al, wherein the buffer layer has an inversion domain on the surface.Type: ApplicationFiled: April 3, 2015Publication date: July 30, 2015Inventors: Hajime FUJIKURA, Taichiroo KONNO, Michiko MATSUDA
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Publication number: 20130092950Abstract: A nitride semiconductor growth substrate includes a principal surface including a C-plane of a sapphire substrate, and a convex portion that is formed on the principal surface, has a cone or pyramid shape or a truncated cone or pyramid shape, is disposed to form a lattice pattern in a top view thereof, and includes a side surface inclined at an angle of less than 90 degrees relative to the principal surface. The convex portion has a height of 0.5 to 3 ?m from the principal surface. A distance between adjacent ones of the convex portion is 1 to 6 ?m. The side surface of the convex portion has a surface roughness (RMS) of not more than 10 nm.Type: ApplicationFiled: September 13, 2012Publication date: April 18, 2013Applicant: Hitachi Cable, Ltd.Inventors: Hajime FUJIKURA, Michiko Matsuda, Taichiroo Konno
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Publication number: 20130043442Abstract: A metal chloride gas generator includes: a tube reactor including a receiving section for receiving a metal on an upstream side, and a growing section in which a growth substrate is placed on a downstream side; a gas inlet pipe arranged to extend from an upstream end with a gas inlet via the receiving section to the growing section, for introducing a gas from the upstream end to supply the gas to the receiving section, and supplying a metal chloride gas produced by a reaction between the gas and the metal in the receiving section to the growing section; and a heat shield plate placed in the reactor to thermally shield the upstream end from the growing section. The gas inlet pipe is bent between the upstream end and the heat shield plate.Type: ApplicationFiled: August 8, 2012Publication date: February 21, 2013Applicant: Hitachi Cable, Ltd.Inventors: Taichiroo KONNO, Hajime FUJIKURA, Michiko MATSUDA
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Publication number: 20130001644Abstract: There is provided a nitride semiconductor epitaxial substrate having a group III nitride semiconductor layer with C-plane as a surface, grown on a substrate via a buffer layer of the group III nitride semiconductor containing Al, wherein the buffer layer has an inversion domain on the surface.Type: ApplicationFiled: June 15, 2012Publication date: January 3, 2013Applicant: HITACHI CABLE, LTD.Inventors: Hajime FUJIKURA, Taichiroo KONNO, Michiko MATSUDA
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Patent number: 7016043Abstract: A quality evaluation method and apparatus for non-bran rice evaluate quality or taste of non-bran rice by identifying proportions of a hull layer, an aleurone layer, an endosperm layer, which adhere to a surface of the non-bran rice according to luminance levels of self-emitted fluorescence obtained by irradiating the non-bran rice with excitation light.Type: GrantFiled: October 16, 2002Date of Patent: March 21, 2006Assignees: Satake Corporation, Japan Rice Millers AssociationInventors: Takeshi Fukumori, Shigeharu Kanemoto, Nobuhiro Matsumoto, Takamasa Mesaki, Hiroyuki Maehara, Yuka Kuribayashi, Michiko Matsuda, Kazuo Amano
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Publication number: 20030112440Abstract: A quality evaluation method and apparatus for non-bran rice evaluate quality or taste of non-bran rice by identifying proportions of a hull layer, an aleurone layer, an endosperm layer, which adhere to a surface of the non-bran rice according to luminance levels of self-emitted fluorescence obtained by irradiating the non-bran rice with excitation light.Type: ApplicationFiled: October 16, 2002Publication date: June 19, 2003Applicants: Satake Corporation, Japan Rice Millers AssociationInventors: Takeshi Fukumori, Shigeharu Kanemoto, Nobuhiro Matsumoto, Takamasa Mesaki, Hiroyuki Maehara, Yuka Kuribayashi, Michiko Matsuda, Kazuo Amano
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Patent number: 4430320Abstract: A radioactive diagnostic agent for renal cortex, adrenal cortex, myocardium, brain stem, spinal nerve, etc., which comprises as an essential component monoiodoacetic acid wherein the iodine atom is radioactive.Type: GrantFiled: October 8, 1981Date of Patent: February 7, 1984Assignee: Kabushiki Kaisha Seitai Kagaku KenkyushoInventors: Akiyo Shigematsu, Akira Tsuya, Michiaki Aihara, Akiko Suzuki, Michiko Matsuda