Patents by Inventor Michio Kida
Michio Kida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8017862Abstract: In growing a single-crystal silicon by the present invention in a Czochralski method, after a surface of a silicon melt is brought into contact with a seed crystal in a crucible, the silicon melt being added with germanium, the single-crystal silicon is pulled while rotated, and the solar-cell single-crystal silicon substrate is sliced from the single-crystal silicon containing germanium, whereby a germanium content of solar-cell single-crystal silicon substrate is set in the range of not less than 0.03 mole % to less than 1.0 mole % when resistivity ranges from 1.4 to 1.9 ?cm. Therefore, conversion efficiency is enhanced when compared with conventional single-crystal silicon substrates. Accordingly, solar cell power generation costs decreases, so that the single-crystal silicon of the present invention can widely be utilized as the substrate for the solar cell in which the high conversion efficiency is increasingly demanded.Type: GrantFiled: October 20, 2006Date of Patent: September 13, 2011Assignee: Sumco Solar CorporationInventors: Michio Kida, Wugen Pan, Kyojiro Kaneko, Kazuo Nakajima, Noritaka Usami, Kozo Fujiwara
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Publication number: 20090044926Abstract: In a silicon casting apparatus according to the present invention, silicon melted by electromagnetic induction heating is continuously solidified using an electrically-conductive bottomless cold crucible and an induction coil surrounding the cold crucible. The cold crucible is made of copper alloy containing beryllium (desirably containing beryllium of 0.1 to 5 mass %), whereby the generation of electric-discharge flaw can be effectively prevented in performing electromagnetic casting. The use of the silicon casting apparatus according to the present invention can greatly extend a crucible life to reduce facility costs. Additionally, a solar-cell silicon ingot can be produced with high quality.Type: ApplicationFiled: August 15, 2008Publication date: February 19, 2009Inventors: Michio Kida, Kenichi Sasatani, Mitsuo Yoshihara, Tomohiro Onizuka
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Publication number: 20070089781Abstract: In growing a single-crystal silicon by the present invention in a Czochralski method, after a surface of a silicon melt is brought into contact with a seed crystal in a crucible, the silicon melt being added with germanium, the single-crystal silicon is pulled while rotated, and the solar-cell single-crystal silicon substrate is sliced from the single-crystal silicon containing germanium, whereby a germanium content of solar-cell single-crystal silicon substrate is set in the range of not less than 0.1 mole % and less than 1.0 mole %. Desirably the germanium content is set in the range of not less than 0.1 mole % to not more than 0.6 mole %, and the germanium content is set in the range of not less than 0.03 mole % to less than 1.0 mole % when resistivity ranges from 1.4 to 1.9 ?cm. Therefore, conversion efficiency can largely be enhanced compared with the case where the conventional single-crystal silicon substrate is used.Type: ApplicationFiled: October 20, 2006Publication date: April 26, 2007Inventors: Michio Kida, Wugen Pan, Kyojiro Kaneko, Kazuo Nakajima, Noritaka Usami, Kozo Fujiwara
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Patent number: 5895527Abstract: The invention relates to a single crystal pulling apparatus comprising; an outer crucible 11 positioned inside a chamber (gas tight container) 2, for storing a semiconductor melt 21, and an inner crucible 30 comprising a cylindrical partition body, mounted inside the outer crucible 11 to form a double crucible, and wherein a single crystal of semiconductor 26 is pulled from the semiconductor melt 21 stored inside the inner crucible 30. With this arrangement, the inner crucible 30 is made from quartz and comprises an inside layer A, an outside layer C, and an intermediate layer B which lies between the inside layer A and the outside layer C, and the intermediate layer B is made from quartz with a larger gas bubble content than the quartz which makes up the inside layer A and the outside layer C of the inner crucible 30.Type: GrantFiled: January 29, 1997Date of Patent: April 20, 1999Assignees: Mitsubishi Materials Silicon Corporation, Mitsubishi Materials Quartz Corporation, Mitsubishi Materials CorporationInventors: Hiroaki Taguchi, Takashi Atami, Hisashi Furuya, Masanori Fukui, Michio Kida
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Patent number: 5891245Abstract: A single crystal pulling method employing; a gas tight container, a double crucible for storing a semiconductor melt inside the gas tight container comprising an inter-connected outer crucible and inner crucible, and a source material supply tube suspended from an upper portion of the gas tight container and positioned so that a granulated or powdered source material can be added from a lower end opening thereof to the semiconductor melt inside the outer crucible, with the source material being injected into the source material supply tube together with an inert gas flowing towards the enclosed container, characterized in that said source material is injected under conditions where the flow rate N (1/min.multidot.cm.sup.2) of the inert gas is within the range 0.0048P+0.0264<N<0.07P, where P (Torr) is the internal pressure inside said gas tight container.Type: GrantFiled: January 10, 1997Date of Patent: April 6, 1999Assignees: Mitsubishi Materials Sillcon Corporation, Mitsubishi Materials CorporationInventors: Takashi Atami, Hiroaki Taguchi, Hisashi Furuya, Michio Kida
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Patent number: 5873938Abstract: A single crystal pulling apparatus wherein a semiconductor melt is stored in an outer crucible, and a cylindrical inner crucible which acts as a partition body, is mounted inside the outer crucible to thus form a double crucible, and a single crystal of semiconductor is pulled from the semiconductor melt inside the inner crucible. The inner crucible contains a communicating portion, which is formed when the double crucible is formed, for allowing flow of the semiconductor melt into the inner crucible, and the communicating portion incorporates an arrangement for removal of gas bubbles which have adhered to the communicating portion.Type: GrantFiled: December 26, 1996Date of Patent: February 23, 1999Assignees: Mitsubishi Materials Silicon Corporation, Mitsubishi Materials CorporationInventors: Takashi Atami, Hisashi Furuya, Michio Kida
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Patent number: 5871581Abstract: A single crystal pulling apparatus comprising: a gas tight container, a double crucible for storing a semiconductor melt inside the gas tight container comprising an outer crucible and an inner crucible which are connected at a lower edge, and source material supply means for adding source material to the semiconductor melt at a position between the outer crucible and the inner crucible, characterized in that a flow restriction member is provided inside the semiconductor melt region between the outer crucible and the inner crucible for restricting the flow of the semiconductor melt.Type: GrantFiled: January 10, 1997Date of Patent: February 16, 1999Assignees: Mitsubishi Materials Silicon Corporation, Mitsubishi Materials CorporationInventors: Takashi Atami, Hiroaki Taguchi, Hisashi Furuya, Michio Kida
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Patent number: 5858087Abstract: The principal construction of a single crystal pulling apparatus involves a chamber (gas tight chamber) inside of which is a double crucible 3 for storing a semiconductor melt 21, comprising an outer crucible 11 and an inner crucible 12 communicated with each other, and a source material supply tube 5 suspended from an upper portion of the chamber, and positioned so that granular source material 8 can be introduced from a lower end opening 5a thereof into the semiconductor melt 21 between the outer crucible 11 and the inner crucible 12. An incline portion 13 is provided at a lower end of the source material supply tube 5 on the inner crucible 12 side, for introducing source material 8 discharging from the lower end opening 5a to the semiconductor melt 21 in the vicinity of the side wall of the outer crucible 11.Type: GrantFiled: December 26, 1996Date of Patent: January 12, 1999Assignees: Mitsubishi Materials Silicon Corp., Mitsubishi Materials Corp.Inventors: Hiroaki Taguchi, Takashi Atami, Hisashi Furuya, Michio Kida
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Patent number: 5840115Abstract: A method of growing a single crystal of semiconductor using a CZ growth technique, having a step (0<t<t1) wherein a single crystal of semiconductor is pulled while a source material is supplied continuously to maintain a constant amount of semiconductor melt, and a step (t2<t<t3) wherein the supply of source material is halted, and the single crystal of semiconductor is pulled using residual melt from the first step.Type: GrantFiled: January 10, 1997Date of Patent: November 24, 1998Assignee: Zag Ltd.Inventors: Hiroaki Taguchi, Takashi Atami, Hisashi Furuya, Michio Kida
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Patent number: 5779792Abstract: The present invention provides an improved single crystal pulling apparatus for pulling a single crystal semiconductor such as silicon or gallium arsenide. The apparatus of the present invention comprises a gas tight container, a crucible which is disposed inside the container, a heater, and a pair of coils to apply a cusp magnetic field in the semiconductor melt. The crucible is separated into two regions by a cylindrical partition body, and an outside region is used to supply source material and to melt the source material and an inside region is used for pulling up the single crystal. The inside and outside regions are communicated with the communication passage provided at the bottom of the partition body. Electrical currents in opposing directions are applied to a pair of coils for generating in the melt a cusp magnetic field which includes a vertical portion and a horizontal portion relative to the crucible.Type: GrantFiled: January 10, 1997Date of Patent: July 14, 1998Assignees: Mitsubishi Materials Silicon Corporation, Mitsubishi Materials CorporationInventors: Takashi Atami, Hisashi Furuya, Michio Kida
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Patent number: 5306474Abstract: An apparatus for growing a single crystal is disclosed which includes a double crucible assembly. The double crucible assembly has an outer crucible and an inner crucible disposed in the outer crucible. A support member is provided for supporting the inner crucible, and the support member is formed of an inorganic oxide non-reactive with silicon oxide. The upper end portion of the inner crucible may be formed of the same inorganic oxide. Alumina or mullite is suitable as the inorganic oxide. With the above construction, silicon single crystals obtained by the crystal growing apparatus will be free of contamination by carbon or heavy metals, and will exhibit excellent quality.Type: GrantFiled: July 29, 1992Date of Patent: April 26, 1994Assignee: Mitsubishi Materials CorporationInventors: Michio Kida, Yoshiaki Arai, Naoki Ono, Kensho Sahira
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Patent number: 5196086Abstract: A monocrystal rod utilized for producing the semiconductor device or solar cell includes a neck section, a main rod section and a shoulder section. The neck section is smaller in diameter than a seed crystal. The main rod section is formed integrally with the neck section and is larger in diameter than the neck section. The shoulder section is tapered for linking the neck section to the main rod section. The main rod section has a stopper section at the top portion of the main rod section, and the stopper section is larger than the main rod section.Also, an apparatus for preparing the monocrystal rod has a safety member for supporting upward the stopper section of the falling monocrystal rod.Further, a method of preparing the monocrystal rod includes the steps as follows. The seed crystal is pulled out from a melt in a crucible while rotating it.Type: GrantFiled: January 17, 1992Date of Patent: March 23, 1993Assignee: Mitsubishi Materials CorporationInventors: Michio Kida, Kensho Sahira, Akikuni Nozoe
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Patent number: 5196173Abstract: In apparatuses for melting semiconductor material and growing single crystals of semiconductor material, the apparatus comprising:(a) a furnace,(b) a cylindrical double crucible assembly comprising an inner crucible in which single crystals of semiconductor material are grown at a vertical-concentric line thereof, the inner crucible having an upper part and a lower part, and an outer crucible in which melted semiconductor material is received, the outer crucible having the inner crucible disposed therein,(c) a susceptor for supporting the outer crucible,(d) rotating means for rotating the susceptor,(e) a feed pipe for supplying starting material in the space formed between the inner and the outer crucibles,(f) fluid-passage means for permitting the melted semiconductor material to flow between the inner and outer crucibles, the fluid-passage means being disposed at the lower part of the inner crucible, andwherein the inner crucible being set inside the outer crucible in a separable manner, the apparatus improType: GrantFiled: October 12, 1989Date of Patent: March 23, 1993Assignee: Mitsubishi Materials CorporationInventors: Yoshiaki Arai, Michio Kida, Naoki Ono, Kensho Sahira
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Patent number: 5173270Abstract: A monocrystal rod utilized for producing the semiconductor device or solar cell includes a neck section, a main rod section and a shoulder section. The neck section is smaller in diameter than a seed crystal. The main rod section is formed integrally with the neck section and is larger in diameter than the neck section. The shoulder section is tapered for linking the neck section to the main rod section. The main rod section has a stopper section at the top portion of the main rod section, and the stopper section is larger than the main rod section.Also, an apparatus for preparing the monocrystal rod has a safety member for supporting upwards the stopper section of the falling monocrystal rod.Further, a method of preparing the monocrystal rod includes the steps as follows. The seed crystal is pulled out from a melt in a crucible while rotating it.Type: GrantFiled: August 16, 1990Date of Patent: December 22, 1992Assignee: Mitsubishi Materials CorporationInventors: Michio Kida, Kensho Sahira, Akikuni Nozoe
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Patent number: 5080873Abstract: A crystal growing apparatus includes a crucible, a feed pipe and a pulling mechanism. The crucible serves to melt a crystalline material. The feed pipe serves to cause the crystalline material to fall into the crucible to charge the crucible with the crystalline material. The pulling mechanism serves to pull a single-crystal from the molten material in the crucible. The feed pipe has a lower end positioned slightly above the surface of the molten material in the crucible and including a plurality of baffle plates mounted on an inner peripheral wall thereof in longitudinally spaced relation to one another. The baffle plates are arranged so that a pitch defined between adjacent two baffle plates decreases toward the lower end of the feed pipe.Type: GrantFiled: May 10, 1990Date of Patent: January 14, 1992Assignee: Mitsubishi Materials CorporationInventors: Naoki Ono, Michio Kida, Yoshiaki Arai, Kensho Sahira
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Patent number: 5069741Abstract: A quartz double crucible assembly utilized for producing silicon crystalline rods is manufactured as follows. First, outer and inner quartz crucibles are prepared by means of arc fusion method. Then, the outer and inner crucibles are received in a vessel accommodated in a heat-treating furnace. Subsequently, the crucibles are heated to a prescribed elevated temperature. Thus, the outer and inner crucibles are caused to join together, and a double crucible assembly is produced.Type: GrantFiled: September 27, 1989Date of Patent: December 3, 1991Assignee: Mitsubishi Kinzoku Kabushiki KaishaInventors: Michio Kida, Kensho Sahira
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Patent number: 5009862Abstract: An apparatus for melting a semiconductor material and growing a semiconductor crystal from the melted material includes a susceptor having a peripheral rim, a quartz crucible assembly for receiving the semiconductor material therein. The crucible assembly includes an outer crucible housed in and supported by the susceptor and an inner crucible adapted to be so placed within the outer crucible as to define a multi-wall structure.Type: GrantFiled: May 23, 1990Date of Patent: April 23, 1991Assignee: Mitsubishi Kinzoku Kabushiki KaishaInventors: Michio Kida, Yoshiaki Arai, Kensho Sahira
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Patent number: 4980015Abstract: In a method for pulling a single crystal, employing a double crucible assembly, the dopant concentration of the molten raw material in an inner crucible prior to the pulling, is raised to a value higher than the dopant concentration C of the molten raw material in the inner crucible at the steady state. Furthermore, at the initial stage of the pulling, the raw material having a dopant content ratio of no greater than kC is introduced into the outer crucible at a rate greater than the rate of decrease of the molten raw material within the inner crucible during the pulling, to achieve a concentration ratio of dopant between the inner and outer crucibles at a target value. Subsequently, the raw material having kC as the dopant content ratio is introduced into the outer crucible, at a rate equal to the rate of decrease of the molten raw material during the pulling.Type: GrantFiled: June 1, 1989Date of Patent: December 25, 1990Assignee: Mitsubishi Metal CorporationInventors: Naoki Ono, Michio Kida, Yoshiaki Arai, Kensho Sahira
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Patent number: 4973518Abstract: A monocrystal rod utilized for producing the semiconductor device or solar cell includes a neck section, a main rod section and a shoulder section. The neck section is smaller in diameter than a seed crystal. The main rod section is formed integrally with the neck section and is larger in diameter than the neck section. The shoulder section is tapered for linking the neck section to the main rod section. The main rod section has a stopper section at the top portion of the main rod section, and the stopper section is larger than the main rod section.Also, an apparatus for preparing the monocrystal rod has a safety member for supporting upwards the stopper section of the falling monocrystal rod.Further, a method of preparing the monocrystal rod includes the steps as follows. The seed crystal is pulled out from a melt in a crucible while rotating it.Type: GrantFiled: April 7, 1988Date of Patent: November 27, 1990Assignee: Mitsubishi Kinzoku Kabushiki KaishaInventors: Michio Kida, Kensho Sahira, Akikuni Nozoe
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Patent number: 4936949Abstract: An apparatus for melting a semiconductor material and growing a semiconductor crystal from the melted material includes a susceptor having a peripheral rim, a quartz crucible assembly for receiving the semiconductor material therein. The crucible assembly includes an outer crucible housed in and supported by the susceptor and an inner crucible adapted to be so placed within the outer crucible as to define a multi-wall structure.Type: GrantFiled: June 1, 1988Date of Patent: June 26, 1990Assignee: Mitsubishi Kinzoku Kabushiki KaishaInventors: Michio Kida, Yoshiaki Arai, Kensho Sahira