Patents by Inventor Michio Kimura

Michio Kimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20030181378
    Abstract: A protein having amino acid sequence in SEQ ID No.: 1 of the Sequence Listing derived from human MP52, and a dimer protein thereof. A homodimer protein described above can be obtained by constructing a plasmid containing DNA coding amino acid sequence in SEQ ID No.: 1 of the Sequence Listing with a methionine at the N-terminus, introducing the plasmid into E. coli for transformation, solubilizing inclusion bodies obtained by culturing the transformant, purifying the monomer protein from the solubilized solution, refolding the monomer protein into a dimer protein and purifying the same.
    Type: Application
    Filed: February 12, 2003
    Publication date: September 25, 2003
    Applicant: Biopharm GmbH
    Inventors: Fusao Makishima, Hiroyuki Takamatsu, Hideo Miki, Shinji Kawai, Michio Kimura, Tomoaki Matsumoto, Mieko Katsuura, Koichi Enomoto, Yusuke Satoh
  • Publication number: 20030035661
    Abstract: An endless belt including an endless body having opposite side edges and an interior surface, and a pair of spaced apart parallel guides bonded to the interior surface of the endless body at positions adjacent to the side edges thereof and extending longitudinally along the side edges, wherein each of the guides is made of an elastic material and has inside and/or outside surfaces having specific roughness.
    Type: Application
    Filed: May 21, 2002
    Publication date: February 20, 2003
    Inventors: Toshiyuki Kabata, Michio Kimura, Hideo Nakamori, Shinji Nousyo, Akihiro Sugino
  • Publication number: 20020102633
    Abstract: A protein having amino acid sequence in SEQ ID No.:1 of the Sequence Listing derived from human MP52, and a dimer protein thereof. A homodimer protein described above can be obtained by constructing a plasmid containing DNA coding amino acid sequence in SEQ ID No.:1 of the Sequence Listing with a methionine at the N-terminus, introducing the plasmid into E. coli for transformation, solubilizing inclusion bodies obtained by culturing the transformant, purifying the monomer protein from the solubilized solution, refolding the monomer protein into a dimer protein and purifying the same.
    Type: Application
    Filed: December 9, 1997
    Publication date: August 1, 2002
    Inventors: FUSAO MAKISHIMA, HIROYUKI TAKAMATSU, HIDEO MIKI, SHINJI KAWAI, MICHIO KIMURA, TOMOAKI MATSUMOTO, MIEKO KATSUURA, KOICHI ENOMOTO, YUSUKE SATOH
  • Patent number: 5650495
    Abstract: An isolated protein having the amino terminal sequence of SEQ ID No. 1 and having a molecular weight of about 200 KDa is described. This animal brain-derived protein binds to OSF-1 (HBGF-8), which is a heparin-binding growth factor that has neuronal differentiation-enhancing activity, and a proliferative action on osteoblasts.
    Type: Grant
    Filed: March 5, 1996
    Date of Patent: July 22, 1997
    Assignee: Hoechst Japan Limited
    Inventors: Michio Kimura, Kazuyuki Doi
  • Patent number: 5612390
    Abstract: A thiol methacrylate or acrylate compound represented by the formula (1) or (2), ##STR1## wherein R.sup.1 is H or CH.sub.3 and X is selected from: ##STR2## wherein R.sup.1 is H or CH.sub.3 and m is an integer of 1 to 4. The thiol methacrylate or acrylate compound gives a resin having a high refractive index, a large Abbe number, and a good hardness and heat resistance, and giving little or no smell at processing.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: March 18, 1997
    Assignee: Toray Industries, Inc.
    Inventors: Yuichiro Iguchi, Michio Kimura, Koichiro Oka
  • Patent number: 5502141
    Abstract: A thiol methacrylate or acrylate compound represented by the formula (1) or (2): ##STR1## wherein R.sup.1 is H or CH and X is selected from: ##STR2## wherein R.sup.1 is H or CH.sub.3 and m is an integer of 1 to 4. The thiol methacrylate or acrylate compound gives a resin having a high refractive index, a large Abbe number, and a good hardness and heat resistance, and giving little or no smell at processing.
    Type: Grant
    Filed: December 8, 1994
    Date of Patent: March 26, 1996
    Assignee: Toray Industries, Inc.
    Inventors: Yuichiro Iguchi, Michio Kimura, Koichiro Oka
  • Patent number: 5399735
    Abstract: A thiol methacrylate or acrylate compound represented by the formula (1) or (2): ##STR1## wherein R.sup.1 is H or CH.sub.3 and X is selected from: ##STR2## wherein R.sup.1 is H or CH.sub.3 and m is an integer of 1 to 4. The thiol methacrylate or acrylate compound gives a resin having a high refractive index, a large Abbe number, and a good hardness and heat resistance, and giving little or no smell at processing.
    Type: Grant
    Filed: December 17, 1993
    Date of Patent: March 21, 1995
    Assignee: Toray Industries, Inc.
    Inventors: Yuichiro Iguchi, Michio Kimura, Koichiro Oka
  • Patent number: 5294690
    Abstract: A thiol methacrylate or acrylate compound represented by the formula (1) or(2); ##STR1## wherein R.sup.1 is H or CH.sub.3 and X is selected from: ##STR2## wherein R.sup.1 is H or CH.sub.3 and m is an integer of 1 to 4. The thiol methacrylate or acrylate compound gives a resin having a high refractive index, a large Abbe number, and a good hardness and heat resistance, and giving little or no smell at processing.
    Type: Grant
    Filed: January 6, 1993
    Date of Patent: March 15, 1994
    Assignee: Toray Industries, Inc.
    Inventors: Yuichiro Iguchi, Michio Kimura, Koichiro Oka
  • Patent number: 5247041
    Abstract: A thiol methacrylate or acrylate compound represented by the formula (1) or (2): ##STR1## wherein R.sup.1 is H or CH.sub.3 and X is selected from: ##STR2## wherein R.sup.1 is H or CH.sub.3 and m is an integer of 1 to 4. The thiol methacrylate or acrylate compound gives a resin having a high refractive index, a large Abbe number, and a good hardness and heat resistance, and giving little or no smell at processing.
    Type: Grant
    Filed: March 2, 1992
    Date of Patent: September 21, 1993
    Assignee: Toray Industries, Inc.
    Inventors: Yuichiro Iguchi, Michio Kimura, Koichiro Oka
  • Patent number: 5105222
    Abstract: An electrophotographic copying apparatus is provided with a belt-shaped photoconductor comprising. A magnetic electroconductive support and a photoconductive layer are formed on the photoconduction. A magnetic cleaning member is positioned for cleaning the surface of the belt-shaped photoconductor.
    Type: Grant
    Filed: January 25, 1991
    Date of Patent: April 14, 1992
    Assignee: Ricoh Company, Ltd.
    Inventors: Katsuichi Ohta, Michio Kimura, Kazuya Ishida, Izumi Aiso, Satoshi Igari
  • Patent number: 4962245
    Abstract: By a process for preparing halogenated benzene derivatives comprising distilling or stripping a mixture of the isomers of a halogenated benzene derivative containing a hydrogen halide to remove the hydrogen halide from the isomeric mixture of the halogenated benzene derivative and then contacting with a zeolite adsorbent for selectivity separating the desired isomer of the halogenated benzene derivative, it is possible to prevent from degrading the zeolite adsorbent. And it is possible to separate selectively industrially an desired isomer of the halogenated benzene derivative for a long time without reduction of productivity and to separate selectively the desired isomer in high purity.
    Type: Grant
    Filed: February 21, 1989
    Date of Patent: October 9, 1990
    Assignee: Toray Industries
    Inventors: Takashi Kanai, Michio Kimura, Yoshio Noguchi
  • Patent number: 4922039
    Abstract: A specific isomer of dichlorocumene is separated from a mixture containing dichlorocumene isomers by adsorptive separation, wherein the zeolite having at least 2 of silica/alumina molar ratio and 0.6 to 1.0 nm of pore size is used as the adsorbent and halogenated benzene or halogenated alkyl benzene is used as desorbent.
    Type: Grant
    Filed: December 27, 1988
    Date of Patent: May 1, 1990
    Assignee: Toray Industries
    Inventors: Bunshi Yamada, Michio Kimura, Yoshio Noguchi
  • Patent number: 4894269
    Abstract: A system for securely offixing to a structure at a recess therein comprises a container body filled with a main component and sealed with a cap formed in part by solidifying a hardening agent and an inorganic material with a solidifying agent. The cap may be formed by confining a hardening agent in a film or coated film of plastics. The container body is further subjected to flaw or strain working or otherwise formed to be weakened so as to break into small pieces when subjected to a force by the element. The main component and the hardening agent then react, within the recess, to securely affix the element to the structure. In another aspect of the invention, a method is provided for retaining the first component in its frangible container with a cap comprising the reactive or hardening agent for placement in a recess of the structure for forcible breakage of the container, a reaction and secure affixation by the reaction product.
    Type: Grant
    Filed: December 3, 1987
    Date of Patent: January 16, 1990
    Assignee: Nippon Decoluxe Kabushiki Kaisha
    Inventor: Michio Kimura
  • Patent number: 4871635
    Abstract: A repeatedly usable electrophotographic photoconductor comprising (a) an electroconductive support, (b) an undercoat layer containing therein at least one salt selected from the group consisting of carboxylates, amino carboxylates, phosphates, polyphosphates, phosphites, phosphate derivatives, borates, sulfates and sulfites, and (c) a photoconductive layer, which layers are successively overlaid on the electroconductive support.
    Type: Grant
    Filed: May 13, 1988
    Date of Patent: October 3, 1989
    Assignee: Ricoh Company, Ltd.
    Inventors: Kenji Seki, Junichiroh Hashimoto, Michio Kimura, Hirofumi Yamanami, Satomi Mochizuki, Izumi Aiso
  • Patent number: 4830942
    Abstract: An electrophotographic photoconductor an electroconductive substrate, an intermediate layer comprising a charge generating azo pigment and a thermosetting resin, a charge generating layer and a charge transporting layer, which layers are successively overlaid on the electroconductive substrate, the charge generating azo pigment being any of the azo pigments (1) through (4): ##STR1##
    Type: Grant
    Filed: May 26, 1987
    Date of Patent: May 16, 1989
    Assignee: Ricoh Company Ltd.
    Inventors: Toshio Fukagai, Michio Kimura, Masafumi Ohta, Mitsuru Hashimoto
  • Patent number: 4220088
    Abstract: A safe static-resistant electric initiator is constructed by clamping the fitting portion of a cup having a bottom with a protruding part of a plug and the open part of a loaded shell corresponding to said plug. The electric initiator comprises an ignition device and a loaded shell having said ignition device at its open part, said ignition device comprising the cup having a bottom which is breakable by the ignition flame of an ignition composition, an ignition composition filled in said cup, the protruding part for supporting said cup and the plug provided with a bridge wire at the portions of the terminal bared parts of two leg wires which pass through the insides of the plug and said protruding part.
    Type: Grant
    Filed: June 20, 1978
    Date of Patent: September 2, 1980
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Michio Kimura, Nobuyuki Izawa, Nobuaki Sakuma
  • Patent number: 4060550
    Abstract: Indolylacetic acid derivatives, which have excellent anti-inflammatory, antipyretic and analgesic activities, represented by the formula, ##STR1## wherein X.sub.1 and X.sub.2 are each methylene; A is an unsubstituted ethylenically unsaturated hydrocarbon chain having up to 5 carbon atoms; m is 0 or 1; n is 1 or 2; R.sub.3 is alkyl having up to 4 carbon atoms; cycloalkyl having 3 to 7 carbon atoms, unsubstituted or C.sub.1 -C.sub.4 alkyl-, nitro-, trifluoromethyl-, methylenedioxy-, ethylenedioxy- or halogen-substituted phenyl, or halogen-, C.sub.1 -C.sub.4 alkyl- or phenyl-substituted or benzene ring-condensed C.sub.3 -C.sub.7 cycloalkyl, or unsubstituted or halogen-, C.sub.1 -C.sub.4 alkyl- or phenyl-substituted or benzene ring-condensed C.sub.5 -C.sub.6 cycloalkenyl; and B is ##STR2## .
    Type: Grant
    Filed: January 23, 1976
    Date of Patent: November 29, 1977
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Michio Kimura, Shigeho Inaba, Hisao Yamamoto
  • Patent number: 3974145
    Abstract: Novel indolylacetic acid derivatives, which have excellent anti-inflammatory, antipyretic and analgesic activities, represented by the formula, ##SPC1##Wherein X.sub.1 and X.sub.2 each is a member selected from the group consisting of oxygen and methylene; A is a member selected from the group consisting of unsubstituted saturated hydrocarbon chain having up to 5 carbon atoms, unsubstituted unsaturated hydrocarbon chain having up to 5 carbon atoms and substituted saturated or substituted ethylenically unsaturated hydrocarbon chain having up to 5 carbon atoms, in which the substituents are selected from the group consisting of halogen or phenyl, the hydrocarbon chain being straight or blanched one; m is 0 or 1; n is 1 or 2; R.sub.1 and R.sub.2 each is a member selected from the group consisting of hydrogen and alkyl having up to 4 carbon atoms; R.sub.
    Type: Grant
    Filed: February 4, 1974
    Date of Patent: August 10, 1976
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Michio Kimura, Shigeho Inaba, Hisao Yamamoto
  • Patent number: 3951984
    Abstract: A 3-benzazocine compound of the formula: ##SPC1##Wherein R.sub.1, R.sub.3, R.sub.4, R.sub.5 and R.sub.8 are each hydrogen or lower alkyl, R.sub.2 is hydrogen, lower alkyl or phenyl and R.sub.6 and R.sub.7 are each lower alkyl, and its pharmaceutically acceptable acid addition salts, which are useful as analgesics and can be produced by reacting a tetrahydropyridine compound of the formula: ##SPC2##Wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, R.sub.6, R.sub.7 and R.sub.8 are each as defined above or its salt with a Lewis acid.
    Type: Grant
    Filed: December 18, 1973
    Date of Patent: April 20, 1976
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Michio Kimura, Takeshi Nakajima, Toshio Atsumi, Kenji Kobayashi, Yoshiaki Takebayashi, Shigeho Inaba, Hisao Yamamoto