Abstract: A substrate processing apparatus can align a substrate with a high precision and a high speed by monitoring a mark formed on a surface of the substrate; operating an amount of misalignment between the center of the substrate and a rotation center of a substrate support member; determining a presence of the misalignment and adjusting the substrate such that the center of the substrate coincides with the rotation center of the substrate support member.

Abstract: The present invention has a first optical detection mark having a predetermined positional coordinate in a lateral direction with respect to a carrier opening of a processing unit through which a carrier apparatus enters and exits, a second optical detection mark having a predetermined positional coordinate in a vertical direction with respect to the carrier opening, and an optical sensor provided on the substrate carrier apparatus for detecting the first or second optical detection mark. The substrate carrier apparatus is rotated by a predetermined angle from a position of the substrate carrier apparatus where the optical sensor detects the first optical detection mark, and the substrate carrier apparatus is moved in the vertical direction by a predetermined amount of movement from a position of the substrate carrier apparatus where the optical sensor detects the second optical detection mark.