Abstract: An exposure method includes a first exposure step of irradiating a mask (10), which is arranged near a plate (P), with exposure light and exposing a predetermined pattern formed on the mask onto a plate; and a second exposure step of irradiating a light converging pattern formation member (20), which is arranged near the plate and includes a plurality of light converging portions (20a, 20b), with exposure light and exposing a light converging pattern having a predetermined shape onto the plate. At least part of the predetermined pattern exposed onto the plate in the first exposure step and at least part of the light converging pattern formed on the plate in the second exposure step overlap each other.

Abstract: An exposure method includes a first exposure step of irradiating a mask, which is arranged near a plate, with exposure light and exposing a predetermined pattern formed on the mask onto a plate; and a second exposure step of irradiating a light converging pattern formation member, which is arranged near the plate and includes a plurality of light converging portions, with exposure light and exposing a light converging pattern having a predetermined shape onto the plate. At least part of the predetermined pattern exposed onto the plate in the first exposure step and at least part of the light converging pattern formed on the plate in the second exposure step overlap each other.

Abstract: An exposure method includes a first exposure step of irradiating a mask, which is arranged near a plate, with exposure light and exposing a predetermined pattern formed on the mask onto a plate; and a second exposure step of irradiating a light converging pattern formation member, which is arranged near the plate and includes a plurality of light converging portions, with exposure light and exposing a light converging pattern having a predetermined shape onto the plate. At least part of the predetermined pattern exposed onto the plate in the first exposure step and at least part of the light converging pattern formed on the plate in the second exposure step overlap each other.

Abstract: An illumination optical apparatus, used in a projection exposure apparatus for projecting and exposing a pattern arranged in a first plane to a second plane, for supplying the first surface with illumination light from a light source comprises an optical path combiner arranged in an optical path between the light source and the first surface, for combining a plurality of light beams different from each other from the light source such that the first and second light beams illuminate the first surface closely to each other. The optical path combiner includes a discrete point positioned on or near a third surface optically conjugate with the first surface. The plurality of light beams travel by way of a plurality of regions sectioned by the discrete point, respectively.

Abstract: An exposure method includes a first exposure step of irradiating a mask, which is arranged near a plate, with exposure light and exposing a predetermined pattern formed on the mask onto a plate; and a second exposure step of irradiating a light converging pattern formation member, which is arranged near the plate and includes a plurality of light converging portions, with exposure light and exposing a light converging pattern having a predetermined shape onto the plate. At least part of the predetermined pattern exposed onto the plate in the first exposure step and at least part of the light converging pattern formed on the plate in the second exposure step overlap each other.

Abstract: When forming a magnified image of a mask pattern on an object with a plurality of projection optical systems, the mask pattern is minimized in size. A projection exposure apparatus relatively moves a mask and a substrate and forms a magnified image of a pattern of the mask. The apparatus includes projection optical systems, each having an enlargement magnification and forming an image of a pattern of the mask on the substrate. A first line segment formed by connecting view points of the projection optical systems on the mask and a second line segment formed by connecting conjugate points of the view points on the substrate form corresponding sides of two similar figures of which magnification ratio is the magnification.

Abstract: An illumination optical apparatus, used in a projection exposure apparatus for projecting and exposing a pattern arranged in a first plane to a second plane, for supplying the first surface with illumination light from a light source comprises an optical path combiner arranged in an optical path between the light source and the first surface, for combining a plurality of light beams different from each other from the light source such that the first and second light beams illuminate the first surface closely to each other. The optical path combiner includes a discrete point positioned on or near a third surface optically conjugate with the first surface. The plurality of light beams travel by way of a plurality of regions sectioned by the discrete point, respectively.

Abstract: A method for exposure control comprising the steps of measuring the change of the transmissivity or transmittance for the light incident to the projection optical system prior to the exposure operation effected by illuminating a pattern on a reticle to form an image of the pattern on a photosensitive wafer through the projection optical system, storing the measured change of the transmissivity, sequentially measuring the amount of the light incident to the projection optical system during the exposure operation, calculating the exposure light amount for the photosensitive wafer from the exposure light amount based on the stored change of the transmissivity, and integrating the exposure from the start of the exposure operation to terminate the exposure operation when the total exposure light amount has reached a predetermined value. The total exposure light amount for the wafer surface can be controlled even if the transmissivity of the projection optical system fluctuates.