Abstract: Surface acoustic wave devices and related methods. In some embodiments, a surface acoustic wave device for providing resonance of a surface acoustic wave having a wavelength ? can include a quartz substrate and a piezoelectric plate formed from LiTaO3 or LiNbO3 disposed over the quartz substrate. The piezoelectric plate can have a thickness greater than 2?. The surface acoustic wave device can further include an interdigital transducer electrode formed over the piezoelectric plate. The interdigital transducer electrode can have a mass density ? in a range 1.50 g/cm3<??6.00 g/cm3, 6.00 g/cm3<??12.0 g/cm3, or 12.0 g/cm3<??23.0 g/cm3, and a thickness greater than 0.148?, greater than 0.079?, or greater than 0.036?, respectively.

Abstract: Provided is a method for manufacturing a sheet for use in a tongue plaque cleaner, capable of reliably cutting loops of thread members provided at a given density, and forming thread members each having a shape with an arc portion sufficient enough to scrape off tongue plaque, through steps that are simple, low-cost and suitable for mass production. A method for manufacturing a sheet 1 for use in a tongue plaque cleaner for scraping off tongue plaque, includes: a step of heating a sheet material having multiple looped thread members 2 protruding from one surface of the sheet material, at a temperature below the melting point of the thread members 2; and a step of forming first thread members 3, 8 and second thread members 4, 9 by cutting loops of the thread members 2 heated.

Abstract: A vehicle driving support system evaluates the ability of a driver based on the driving operation of the driver for each of a plurality of driving-related functions possessed by the driver to drive the vehicle. In addition, the vehicle driving support system determines whether the ability of the driver is less than a predetermined standard for each of the driving-related functions and is not improved from then on, based on the past evaluation result of the ability of the driver. When determining that the ability of the driver is less than the predetermined standard for at least a part of the driving-related functions and is not improved from then on, the vehicle driving support system performs substitution control that causes a vehicle to perform the part of the driving-related functions instead so as to perform driving even if the driver does not exert the ability.

Abstract: A Pd-supporting Zr-based composite oxide wherein by having a Zr-containing composite oxide support and Pd supported thereon and by showing, upon XAFS (X-ray absorption fine structure) analysis, a maximum peak in a Pd bond distance range of 2.500-3.500 ?, the maximum peak being located in a position of 3.050-3.110 ?.

Abstract: A Pd-supporting Zr-based composite oxide wherein by having a Zr-containing composite oxide support and Pd supported thereon and by showing, upon XAFS (X-ray absorption fine structure) analysis, a maximum peak in a Pd bond distance range of 2.500-3.500 ?, the maximum peak being located in a position of 3.050-3.110 ?.

Abstract: Provided is a method for manufacturing a sheet for use in a tongue plaque cleaner, capable of reliably cutting loops of thread members provided at a given density, and forming thread members each having a shape with an arc portion sufficient enough to scrape off tongue plaque, through steps that are simple, low-cost and suitable for mass production. A method for manufacturing a sheet 1 for use in a tongue plaque cleaner for scraping off tongue plaque, includes: a step of heating a sheet material having multiple looped thread members 2 protruding from one surface of the sheet material, at a temperature below the melting point of the thread members 2; and a step of forming first thread members 3, 8 and second thread members 4, 9 by cutting loops of the thread members 2 heated.

Abstract: Provided is an exhaust gas purification catalyst with excellent durability against exhaust gas including a poisoning substance. The exhaust gas purification catalyst includes a porous substrate, a catalyst coating layer formed on the porous substrate, and a dummy coating layer formed on the outermost surface of the catalyst coating layer. The catalyst coating layer has a carrier and a noble metal catalyst supported on the carrier. The dummy coating layer includes a carrier having at least alumina and does not include a noble metal catalyst. The dummy coating layer is formed to have a length which, from the end on the exhaust gas inlet side, is 10% to 70% of the entire length of the catalyst coating layer along the exhaust gas flow direction.

Abstract: Provided is an exhaust gas purification catalyst with excellent durability against exhaust gas including a poisoning substance. The exhaust gas purification catalyst includes a porous substrate, a catalyst coating layer formed on the porous substrate, and a dummy coating layer formed on the outermost surface of the catalyst coating layer. The catalyst coating layer has a carrier and a noble metal catalyst supported on the carrier. The dummy coating layer includes a carrier having at least alumina and does not include a noble metal catalyst. The dummy coating layer is formed to have a length which, from the end on the exhaust gas inlet side, is 10% to 70% of the entire length of the catalyst coating layer along the exhaust gas flow direction.

Abstract: Provided is an intraoral cleaner capable of widely cleaning the interior of the oral cavity due to the fact that a head portion thereof does not include an element corresponding to a ring portion found in conventional tongue cleaners. The intraoral cleaner includes a rod-shaped grip and a flat and thin head portion provided on the front end of the rod-shaped grip. The head portion is composed of a pouch-shaped sheet and a core portion filling the interior of the pouch-shaped sheet. The entire outer surface of the pouch-shaped sheet is equipped with linear members for scraping out dirt inside the oral cavity.

Abstract: Provided is a tongue cleaner comprising: a head 1 forming a main body of said tongue cleaner; and a plurality of linear materials 31, 41, 51, 61 protruding from said head 1 and comprised of a loop pile; wherein said plurality of linear materials make up a plurality of linear material groups 65 to 69 comprised of at least two of said linear materials 31, 41, 51, 61 protruding from a pair of common loop-starting points 71, and a loop shape of said linear material 31, 41, 51, 61 differs from one another in each linear material group 65 to 69.

Abstract: Provided is an intraoral cleaner capable of widely cleaning the interior of the oral cavity due to the fact that a head portion thereof does not include an element corresponding to a ring portion found in conventional tongue cleaners. The intraoral cleaner includes a rod-shaped grip and a flat and thin head portion provided on the front end of the rod-shaped grip. The head portion is composed of a pouch-shaped sheet and a core portion filling the interior of the pouch-shaped sheet. The entire outer surface of the pouch-shaped sheet is equipped with linear members for scraping out dirt inside the oral cavity.

Abstract: A resist pattern forming method using a coating and developing apparatus and an aligner being connected thereto which are controlled to form a resist film on a surface of a substrate with a base film and a base pattern formed thereon, followed by inspecting at least one of a plurality of measurement items selected from: reflection ratio and film thickness of the base film and the resist film, line width after a development, an accuracy that the base pattern matches with a resist pattern, a defect on the surface after the development, etc. A parameter subject to amendment is selected based on corresponding data of each measurement item, such as the film thickness of the resist and the line width after the development, and amendment of the parameter is performed. This results in a reduced workload of an operator, and the appropriate amendment can be performed.

Abstract: A tongue cleaner in which a gap between a concavely curved surface formed in a cleaner head and a sheet for covering the same is minimized or eliminated, decreasing the likeliness of tongue coating to accumulate therebetween. A head is provided with a first sheet on a face of the head formed with a concavely curved surface. The sheet is fixed to a lateral side of the head, enabling the sheet opposed to the concavely curved surface to be slidable thereon. After arranging a sheet material on the concavely curved surface with the head being in a single-piece state as a component of the tongue cleaner, the sheet material is pressed against the concavely curved surface by means of a lower mold and an upper mold.

Abstract: An exhaust gas purifying catalyst is provided in which alloying of precious metals is prevented even at high temperatures so that degradation of catalyst can be inhibited. The exhaust gas purifying catalyst comprises a substrate serving as a passage of exhaust gas; and a catalyst coating layer formed on the internal surface of the through hole and including precious metals and a refractory inorganic oxide. The catalyst coating layer formed in the area A located on the upstream portion of the passage with respect to the flow direction of exhaust gas contains a precious metal, Rh. The weight ratio of Rh and the precious metal other than Rh is 1:0 to 0.5. The catalyst coating layer formed in the area B located on the downstream portion of the passage contains precious metal other than Rh. The weight of the precious metal other than Rh is larger than the weight of Rh.

Abstract: A pattern forming system 1 includes a checking apparatus 400 and a control section 500. The checking apparatus 400 is configured to measure and check a sidewall angle SWA of a resist pattern formed on a substrate W after a developing process. The control section 500 is configured to use a difference between a target value of the sidewall angle SWA of the resist pattern after the developing process and a check result of the sidewall angle SWA obtained by the checking apparatus 400, to set a process condition for a first heat process 71 to 74 or a second heat process 84 to 89 so as to cause the sidewall angle SWA to approximate the target value thereof after the developing process.

Abstract: A pattern forming system 1 includes a checking apparatus 400, a storage device 502, and a control section 500. The checking apparatus 400 is configured to measure and check a state of a resist pattern formed on a substrate W after a developing process and output a first check result thus obtained, and to measure and check a state of a pattern formed on the substrate after an etching process and output a second check result thus obtained. The storage device 502 stores a correlation formula obtained from the first check result and the second check result. The control section 500 is configured to use the correlation formula to obtain a target value of the state of the pattern after the developing process from a target value of the state of the pattern after the etching process, and to use a difference between the target value of the state of the pattern after the developing process and the first check result to set a condition for the first heat process and/or the second heat process.

Abstract: A pattern forming system 1 is configured to execute a series of processes, which includes a first heat process for performing a heat process on a substrate W after a resist liquid coating process, a light exposure process for performing light exposure on a resist film in accordance with a predetermined pattern, a second heat process for promoting a chemical reaction in the resist film after the light exposure, a developing process for developing the resist film after the light exposure, and an etching process for etching an oxide film by use of a resist pattern formed by the developing process as a mask. The system includes a checking apparatus 400 configured to measure and check a state of a pattern formed after the etching process, and a control section 500 configured to use a check result to set a condition for the first heat process and/or the second heat process so as to cause the state of the pattern to be uniform on a surface of the substrate W after the etching process.

Abstract: A resist pattern forming method using a coating and developing apparatus and an aligner being connected thereto which are controlled to form a resist film on a surface of a substrate with a base film and a base pattern formed thereon, followed by inspecting at least one of a plurality of measurement items selected from: reflection ratio and film thickness of the base film and the resist film, line width after a development, an accuracy that the base pattern matches with a resist pattern, a defect on the surface after the development, etc. A parameter subject to amendment is selected based on corresponding data of each measurement item, such as the film thickness of the resist and the line width after the development, and amendment of the parameter is performed. This results in a reduced workload of an operator, and the appropriate amendment can be performed.

Abstract: A resist pattern forming method using a coating and developing apparatus and an aligner being connected thereto which are controlled to form a resist film on a surface of a substrate with a base film and a base pattern formed thereon, followed by inspecting at least one of a plurality of measurement items selected from: reflection ratio and film thickness of the base film and the resist film, line width after a development, an accuracy that the base pattern matches with a resist pattern, a defect on the surface after the development, etc. A parameter subject to amendment is selected based on corresponding data of each measurement item, such as the film thickness of the resist and the line width after the development, and amendment of the parameter is performed. This results in a reduced workload of an operator, and the appropriate amendment can be performed.

Abstract: In the present invention, in the photolithography process in which a certain focus condition has been already set, a film on a substrate is exposed to only zero-order light of a light source transmitted, and then developed to reduce a first portion of the film on the substrate. Further, the film on the substrate is exposed to zero-order light and higher order light of the light source transmitted, and then developed to reduce a second portion of the film on the substrate. Thereafter, the film thicknesses of the first portion and the second portion are measured, and the measured film thicknesses of the first portion and the second portion are converted into line widths of a resist pattern by previously obtained correlations between the film thicknesses and the line widths. The converted line width of the second portion is then subtracted from the converted line width of the first portion, whereby the line width depending only on the focus component is calculated.