Patents by Inventor Michio Zenbayashi
Michio Zenbayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 6451906Abstract: The object of the present invention is to provide a flame-retardant resin composition which has a high heat resistance, superior impact resistance and superior flame-retarding properties. The present invention provides a flame-retardant resin composition which is characterized by the fact that said composition contains (A) a polycarbonate type resin, (B) a silicone resin constructed from siloxane units expressed by the formula RSiO1.5 (T units) and siloxane units expressed by the formula R3SiO0.5 (M units), or a silicone resin constructed from T units, M units and siloxane units expressed by the formula SiO2.0 (Q units) (R indicates an unsubstituted or substituted monovalent hydrocarbon group with 1 to 10 carbon atoms), and (C) an anti-drip agent, and the aforementioned composition contains 0.1 to 9 parts by weight of the abovementioned silicone resin (B), and 0.01 to 10 parts by weight of the abovementioned anti-drip agent, per 100 parts by weight of the abovementioned polycarbonate resin (A).Type: GrantFiled: November 21, 2000Date of Patent: September 17, 2002Assignee: General Electric CompanyInventors: Akihiro Saito, Takuro Kitamura, Hiromi Ishida, Yoshiaki Takezawa, Yutaka Horie, Michio Zenbayashi
-
Patent number: 5115069Abstract: A glycidoxy group-containing organosilicon compound represented by formula (I) ##STR1## wherein R which may be the same or different each represents an alkyl group, an aryl group, or an alkenyl group, and n is 0 or an integer of 1 to 1,000. The compound is useful for modification of interfacial properties of various synthetic resins such as epoxy resins, polyesters, polyurethanes, polyamides and polyimides.Type: GrantFiled: March 27, 1990Date of Patent: May 19, 1992Assignee: Toshiba Silicone Co., Ltd.Inventors: Hisao Motegi, Takeshi Sunaga, Michio Zenbayashi
-
Patent number: 5059707Abstract: A hydroxyl group-containing organosilicon compound represented by formula (I) ##STR1## wherein R which may be the same or different each represents an alkyl group, an aryl group, or an alkenyl group, and n is 0 or an integer of 1 to 1,000. The compound can be suitably used for modification of surface properties of synthetic resins.Type: GrantFiled: March 27, 1990Date of Patent: October 22, 1991Assignee: Toshiba Silicone Co., Ltd.Inventors: Hisao Motegi, Takeshi Sunaga, Michio Zenbayashi
-
Patent number: 5004793Abstract: A room temperature-curable composition comprising(a) 100 parts by weight of a siloxane-amide block copolymer represented by the formula (1) ##STR1## wherein Y represents a hydrolyzable group-containing organosilyl group of the formula --SiR.sup.5.sub.a X.sub.a-ain whichR.sup.5 represents a substituted or unsubstituted monovalent hydrocarbon group,a is an integer of 0, 1 or 2, andX is directly bonded to the silicon atom and represents a hydolyzable group or a hydroxyl group,R.sup.1 represents a divalent group selected from the group consisting of ##STR2## in which R.sup.6 represents a hydrogen atom, a substituted or unsubstituted monovalent hydrocarbon group, or an organosilyl group of the formula --SiR.sup.8.sub.b X.sub.3-bin whichR.sup.8 represents a substituted or unsubstituted monovalent hydrocarbon group,b is an integer of 0, 1, 2, or 3, and X is the same as defined above, andR.sup.Type: GrantFiled: July 3, 1989Date of Patent: April 2, 1991Assignee: Toshiba Silicone Co., Ltd.Inventors: Hisayuki Nagaoka, Michio Zenbayashi, Chiyuki Shimizu
-
Patent number: 4927949Abstract: An improved method of preparing an aminoalkylalkoxy silane of the formula: ##STR1## in which R.sup.1 and R.sup.2 independently are alkyl groups having 1-8 carbon atoms, R.sup.3 is a hydrogen atom or an alkyl group having 1-6 carbon atoms, R.sup.4 and R.sup.5 independently are a member selected from the group consisting of a hydrogen atom, an alkyl group having 1-10 carbon atoms, --CH.sub.2 CH.sub.2 NH.sub.2, --CH.sub.2 CH.sub.2 NHCH.sub.2 CH.sub.2 NH.sub.2, an allyl group, a substituted phenyl group and a nonsubstituted phenyl group and a is an integer from 0-2, comprises the step of reacting a silane compound with an allylamine in the presence of a catalyst composition selected from the group consisting of (1) a rhodium complex catalyst and a heterocyclic compound containing nitrogen and/or sulfur atoms and (2) a rhodium complex catalyst having a heterocyclic compound containing nitrogen and/or sulfur atoms as a ligand.Type: GrantFiled: September 13, 1989Date of Patent: May 22, 1990Assignee: Toshiba Shilicone Co., Ltd.Inventors: Keiji Kabeta, Michio Zenbayashi
-
Patent number: 4882396Abstract: A siloxane-amide block copolymer having an alkenyl group or a photopolymerizable organic group at both terminals thereof which is represented by formula (I): ##STR1## wherein R.sup.1 represents a reaction residual group of an epoxy compound containing an alkenyl group or a photopolymerizable organic group and/or a substitution reaction product between said reaction residual group and an organosilyl group and the other symbols are as defined in the specification. The copolymer is produced by reacting a polycondensate of a diaminosiloxane and a dicarboxylic acid dihalide with a compound containing an alkenyl group or a photopolymerizable organic group at one terminal thereof and an epoxy group at the other terminal thereof. The siloxane-amide block copolymer exhibits excellent processability and reactive curability by application of heat, light or radiation.Type: GrantFiled: August 5, 1988Date of Patent: November 21, 1989Assignee: Toshiba Silicone Co., Ltd.Inventors: Hisayuki Nagaoka, Michio Zenbayashi
-
Patent number: 4877855Abstract: A siloxane-amide block copolymer represented by formula (I): ##STR1## wherein the symbols are as defined in the specification, is disclosed. The polymer of formula (I) is produced by reacting a polycondensate of a diaminosiloxane and a dicarboxylic acid dihalide with an epoxysilane to induce ring-opening addition reaction between the terminal amino groups of the polymer and the epoxy group of the epoxysilane. The siloxane-amide block copolymer exhibits excellent processability and reactive curability due to the hydrolyzable silyl groups at the both terminals.Type: GrantFiled: August 5, 1988Date of Patent: October 31, 1989Assignee: Toshiba Silicone Co., Ltd.Inventors: Hisayuki Nagaoka, Michio Zenbayashi, Chiyuki Shimizu
-
Patent number: 4649208Abstract: A process for making an organosilicon compound containing an amino group, which comprises reacting an allylamine with the hydrosilyl group of a silicon compound represented by the formula:H(R.sup.1).sub.n Si(OR.sup.2).sub.3-nwherein R.sup.1 represents monovalent groups which may be identical of different and are selected from the group consisting of substituted or unsubstituted hydrocarbon groups, di- or trimethylsilyl groups and mono- or polyorganosiloxanyl groups; R.sup.2 represents an alkoxy-substituted or unsubstituted alkyl group; and n represents an integer of 0 to 3,in the presence of a complex of platinum with an olefin or its derivative, said reaction being carried out further in the presence of an amino compound represented by the formula:N(R.sup.3).sub.3 or HNQwherein R.sup.Type: GrantFiled: December 20, 1985Date of Patent: March 10, 1987Assignee: Toshiba Silicone Co., Ltd.Inventors: Michio Zenbayashi, Noria Sato