Abstract: A flow-rate regulator device for controlling a flow rate of a liquid includes a first flow-rate regulator component positioned on an upstream side of a liquid line, and a second flow-rate regulator component positioned on a downstream side of the liquid line and connected in series to the first flow-rate regulator component. The first flow-rate regulator component adjusts a degree of opening such that a flow rate of liquid flowing through the liquid line is set a specified number of times greater than a target flow rate when the second flow-rate regulator component has a full opening, and the second flow-rate regulator component adjusts a degree of opening such that the flow rate of the liquid flowing through the liquid line is to be at the target flow rate when the first flow-rate regulator component is adjusted to have the degree of opening.

Abstract: A flow-rate regulator device for controlling a flow rate of a liquid includes a first flow-rate regulator component positioned on an upstream side of a liquid line, and a second flow-rate regulator component positioned on a downstream side of the liquid line and connected in series to the first flow-rate regulator component. The first flow-rate regulator component adjusts a degree of opening such that a flow rate of liquid flowing through the liquid line is set a specified number of times greater than a target flow rate when the second flow-rate regulator component has a full opening, and the second flow-rate regulator component adjusts a degree of opening such that the flow rate of the liquid flowing through the liquid line is to be at the target flow rate when the first flow-rate regulator component is adjusted to have the degree of opening.

Abstract: Disclosed is a cleaning apparatus capable of cleaning a holding unit of a holding member that holds a substrate. The cleaning apparatus is configured to prevent a cleaning liquid from adhering to a rear-end unit of the holding member where a drying is difficult to be done, while a cleaning process is performed by spraying the cleaning liquid to the holding unit. Also disclosed are a substrate processing system that incorporates the cleaning apparatus, a cleaning method based on the cleaning apparatus, a program to perform the cleaning method, and a storage medium to store the program. The cleaning apparatus is equipped with a cleaning unit that cleans the holding unit by spraying the cleaning liquid to the holding unit, and a cover unit that covers the rear-end unit by making a back-and-forth operation with respect to the holding member.

Abstract: Disclosed is a cleaning apparatus capable of cleaning a holding unit of a holding member that holds a substrate. The cleaning apparatus is configured to prevent a cleaning liquid from adhering to a rear-end unit of the holding member where a drying is difficult to be done, while a cleaning process is performed by spraying the cleaning liquid to the holding unit. Also disclosed are a substrate processing system that incorporates the cleaning apparatus, a cleaning method based on the cleaning apparatus, a program to perform the cleaning method, and a storage medium to store the program. The cleaning apparatus is equipped with a cleaning unit that cleans the holding unit by spraying the cleaning liquid to the holding unit, and a cover unit that covers the rear-end unit by making a back-and-forth operation with respect to the holding member.