Abstract: A positive type resist composition having an alkali-soluble siloxane polymer expressed by the following Formula (1), a photosensitive compound, and a 1 ?m thick resist film formed of the positive type resist composition which has 5% to 60% of transmittance to i-line radiation; in the Formula (1), R1 and R2 express a monovalent organic group, and may be identical or different; “A” is a group expressed by the following Formula (2) having at least one phenolic hydroxyl group; and “a”, “b,” and “c” satisfy the following relation; a+b+c=1, in the Formula (2), R3, R4, and R5 express one of a hydrogen atom and a monovalent organic group, and may be identical or different, “m” expresses an integer, and “n” expresses an integer of 1 to 5. Preferably, 0.25?a?0.60, and 0?c?0.25. The composition is preferably used in a resist film undergoing oxygen plasma etching.

Abstract: A positive type resist composition having an alkali-soluble siloxane polymer expressed by the following Formula (1), a photosensitive compound, and a 1 ?m thick resist film formed of the positive type resist composition which has 5% to 60% of transmittance to i-line radiation; in the Formula (1), R1 and R2 express a monovalent organic group, and may be identical or different; “A” is a group expressed by the following Formula (2) having at least one phenolic hydroxyl group; and “a”, “b,” and “c” satisfy the following relation; a+b+c=1, in the Formula (2), R3, R4, and R5 express one of a hydrogen atom and a monovalent organic group, and may be identical or different, “m” expresses an integer, and “n” expresses an integer of 1 to 5. Preferably, 0.25?a?0.60, and 0?c?0.25. The composition is preferably used in a resist film undergoing oxygen plasma etching.

Abstract: A positive type resist composition having an alkali-soluble siloxane polymer expressed by the following Formula (1), a photosensitive compound, and a 1 ?m thick resist film formed of the positive type resist composition which has 5% to 60% of transmittance to i-line radiation; in the Formula (1), R1 and R2 express a monovalent organic group, and may be identical or different; “A” is a group expressed by the following Formula (2) having at least one phenolic hydroxyl group; and “a”, “b,” and “c” satisfy the following relation; a+b+c=1, in the Formula (2), R3, R4, and R5 express one of a hydrogen atom and a monovalent organic group, and may be identical or different, “m” expresses an integer, and “n” expresses an integer of 1 to 5. Preferably, 0.25?a?0.60, and 0?c?0.25. The composition is preferably used in a resist film undergoing oxygen plasma etching.

Abstract: A positive type resist composition having an alkali-soluble siloxane polymer expressed by the following Formula (1), a photosensitive compound, and a 1 &mgr;m thick resist film formed of the positive type resist composition which has 5% to 60% of transmittance to i-line radiation; 1

Abstract: The present invention provides an optically anisotropic film characterized in that the retardation at 80.degree. C. is 20-97% of that at 30.degree. C., and the film is made from a mixture of a transparent or semitransparent polymer and at least one liquid crystal compound, wherein the ratio of the liquid crystal compound in the mixture is 0.5-50% by weight based on the combined weight of the liquid crystal compound and the polymer, or an optically anisotropic film characterized in that the retardation at 60.degree. C. is 50-99% of that at 30.degree. C., and the film comprises a mixture of a transparent or semitransparent polymer and at least one liquid crystal compound, wherein the ratio of the liquid crystal compound in the mixture is 0.5-50% by weight based on the combined weight of the liquid crystal compound and the polymer.

Abstract: A process for continuously producing a phase retarder film or sheet comprising continuously supplying a stretched thermoplastic resin film or sheet to a heating zone in parallel with the stretching direction of the film or sheet and heating the film or sheet to a temperature not lower than the glass transition temperature of the resin while applying pressure to the surface of the film or sheet passing through the heating zone, thereby continuously subjecting the film or sheet to thermal relaxation while suppressing the expansion of the film or sheet in a direction parallel to the surface of the film or sheet and perpendicular to the stretching axis. According to the present invention, a phase retarder film or sheet having a low angular dependence of retardation can be produced continuously. By using the phase retarder film(s) or sheet(s) thus obtained as optical compensator(s), the viewing angle characteristics of liquid crystal display devices can remarkably be improved.

Abstract: A process for producing a phase retarder film or sheet, which comprises subjecting a stretched thermoplastic resin film or sheet to thermal relaxation at a temperature not lower than the glass transition temperature of the thermoplastic resin to shrink the film or sheet in the stretching axis direction while suppressing the expansion of the film or sheet in a direction parallel to the film or sheet surface and perpendicular to the stretching axis.