Patents by Inventor Michiya NAITO

Michiya NAITO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Metal-containing onium salt compound, photodegradable base, resist composition, and method for manufacturing device using said resist composition
    Patent number: 11347147
    Abstract: A metal-containing onium salt compound suitable for use as a photodegradable base of a resist composition and a resist composition using the metal-containing onium salt compound are provided, the resist composition having excellent sensitivity to ionizing radiation such as extreme ultraviolet (EUV), excellent resolution and focal depth in lithography, and can reduce line width roughness (LWR) in a fine pattern. The onium salt compound including a specific metal is used as the photodegradable base.
    Type: Grant
    Filed: October 25, 2017
    Date of Patent: May 31, 2022
    Assignee: TOYO GOSEI CO., LTD.
    Inventors: Michiya Naito, Masamichi Hayakawa, Yoshiyuki Utsumi
  • Photosensitive compound, photoacid generator and resist composition containing the photosensitive compound, and method for manufacturing device using the resist composition
    Patent number: 11048166
    Abstract: A photosensitive compound which can be suitably used for a resist composition having superior sensitivity with respect to light of short wavelength such as KrF and the like, especially to extreme ultraviolet or electron beam, superior resolution and depth of focus in lithography, and can suppress LER (line edge roughness) in fine pattern, a resist composition using the photosensitive compound, and a manufacturing method of a device is provided. A photosensitive compound including a divalent Te atom is provided.
    Type: Grant
    Filed: December 20, 2017
    Date of Patent: June 29, 2021
    Assignee: TOYO GOSEI CO., LTD.
    Inventors: Michiya Naito, Masamichi Hayakawa, Yoshiyuki Utsumi
  • METAL-CONTAINING ONIUM SALT COMPOUND, PHOTODEGRADABLE BASE, RESIST COMPOSITION, AND METHOD FOR MANUFACTURING DEVICE USING SAID RESIST COMPOSITION
    Publication number: 20190243243
    Abstract: A metal-containing onium salt compound suitable for use as a photodegradable base of a resist composition and a resist composition using the metal-containing onium salt compound are provided, the resist composition having excellent sensitivity to ionizing radiation such as extreme ultraviolet (EUV), excellent resolution and focal depth in lithography, and can reduce line width roughness (LWR) in a fine pattern. The onium salt compound including a specific metal is used as the photodegradable base.
    Type: Application
    Filed: October 25, 2017
    Publication date: August 8, 2019
    Applicant: TOYO GOSEI CO., LTD.
    Inventors: Michiya NAITO, Masamichi HAYAKAWA, Yoshiyuki UTSUMI
  • PHOTOSENSITIVE COMPOUND, PHOTOACID GENERATOR AND RESIST COMPOSITION CONTAINING THE PHOTOSENSITIVE COMPOUND, AND METHOD FOR MANUFACTURING DEVICE USING THE RESIST COMPOSITION
    Publication number: 20190243238
    Abstract: A photosensitive compound which can be suitably used for a resist composition having superior sensitivity with respect to light of short wavelength such as KrF and the like, especially to extreme ultraviolet or electron beam, superior resolution and depth of focus in lithography, and can suppress LER (line edge roughness) in fine pattern, a resist composition using the photosensitive compound, and a manufacturing method of a device is provided. A photosensitive compound including a divalent Te atom is provided.
    Type: Application
    Filed: December 20, 2017
    Publication date: August 8, 2019
    Applicant: TOYO GOSEI CO., LTD.
    Inventors: Michiya NAITO, Masamichi HAYAKAWA, Yoshiyuki UTSUMI
  • Manufacturing method of polymer
    Patent number: 9850334
    Abstract: A method for manufacturing a polymer of which structure is exactly controlled is disclosed.
    Type: Grant
    Filed: April 13, 2015
    Date of Patent: December 26, 2017
    Assignee: TOYO GOSEI CO., LTD.
    Inventors: Yuki Kawakami, Michiya Naito, Takeshi Ikeya
  • MANUFACTURING METHOD OF POLYMER
    Publication number: 20170037169
    Abstract: A method for manufacturing a polymer of which structure is exactly controlled is disclosed.
    Type: Application
    Filed: April 13, 2015
    Publication date: February 9, 2017
    Applicant: TOYO GOSEI CO., LTD.
    Inventors: Yuki KAWAKAMI, Michiya NAITO, Takeshi IKEYA