Patents by Inventor Miegi Nakano

Miegi Nakano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5106724
    Abstract: There are disclosed an aqueous alkaline developer for light-sensitive lithographic printing plate commonly processing a negative-type light-sensitive lithographic printing plate having a light-sensitive layer containing a diazo compound and a positive-type light-sensitive lithographic printing plate having a light-sensitive layer containing an o-quinonediazide compound, which comprises containing an alkali agent, 0.1 to 10% by weight of a water-soluble reducing agent, a sodium, potassium or ammonium salt of an organic carboxylic acid, and a non-ionic or cationic surfactant, and having a pH in the range of 12.5 to 13.5, and also a developer composition for light-sensitive material, which comprises an aqueous solution containing a compound represented by the formula (I) shown below: ##STR1## wherein R.sub.1 represents an alkyl group or an alkoxy group each having 2 to 5 carbon atoms, or a hydroxyalkyl group having 2 to 5 carbon atoms; and R.sub.
    Type: Grant
    Filed: June 1, 1990
    Date of Patent: April 21, 1992
    Assignee: Konica Corporation
    Inventors: Akira Nogami, Minoru Seino, Masafumi Uehara, Miegi Nakano
  • Patent number: 5089839
    Abstract: An apparatus for processing an imagewise exposed pre-sensitized lithographic printing plate which entails uniformly applying a desired amount of developer, that has not been substantially used to the surface of the printing plate by a developer supply member comprised of two plates and having a slit at the lowermost portion thereof which contacts the surface of the printing plate, and then transferring the plate containing the developer to a developer storage tank, immersing the plate in the developer storage tank, and removing the developer from the plate.
    Type: Grant
    Filed: August 1, 1990
    Date of Patent: February 18, 1992
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Miegi Nakano, Minoru Seino, Masafumi Uehara, Akira Nogami
  • Patent number: 4963473
    Abstract: A method of processing an imagewise exposed pre-sensitize lithographic printing plate which entails uniformly applying a desired amount of developer, that has not been substantially used to the surface of the printing plate by a developer supply member comprised of two plates and having a slit at the lowermost portion thereof, and then transferring the plate containing the developer to a developer storage tank, immersing the plate in the developer storage tank, and removing the developer from the plate.
    Type: Grant
    Filed: May 1, 1989
    Date of Patent: October 16, 1990
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Miegi Nakano, Minoru Seino, Masafumi Uehara, Akira Nogami
  • Patent number: 4797346
    Abstract: A light-sensitive composition for use in the preparation of positive-type light-sensitive lithographic printing plate which comprises an o-naphthoquinone diazide compound and novolak resin in which the novolak resin comprises two different novolak resins each being prepared by the polycondensation or co-polycondensation of an aldehyde with at least one compound selected from the group consisting of phenol, m-cresol, o-cresol and p-cresol.
    Type: Grant
    Filed: May 13, 1987
    Date of Patent: January 10, 1989
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Takeshi Yamamoto, Nobumasa Sasa, Miegi Nakano