Patents by Inventor Mien-Win Wu

Mien-Win Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8778080
    Abstract: Disclosed is an atmospheric-pressure double-plasma graft polymerization apparatus. The apparatus includes a workbench, an initial roller of a roll-to-roll device, an atmospheric-pressure plasma activation device, a peroxide formation device, a coating and grafting device, a drying device, a graft polymerization and curing device, a curing device and a final roller of a roll-to-roll device. The devices are sequentially provided on the workbench.
    Type: Grant
    Filed: May 21, 2008
    Date of Patent: July 15, 2014
    Assignee: Institute of Nuclear Energy Research, Atomic Energy Council
    Inventors: Mien-Win Wu, Tien-Hsiang Hsueh, Cheng-Chang Hsieh, Chi-fong Ai
  • Patent number: 8642133
    Abstract: The present invention fabricates a hydrophobic and oleophobic polymer fabric through two stages of modification using atmospheric plasmas. The modified fabric has a rough surface and a fluorocarbon functional group having the lowest surface free energy. The fabric has a grafted fluorocarbon monomer layer to enhance the graft efficiency of the fluorocarbon functional groups and its wash fastness. The atmospheric plasmas can be mass produced and less expensively. Hence, the present invention can rapidly modify surfaces of polymeric materials with low cost and good environment protection.
    Type: Grant
    Filed: March 6, 2013
    Date of Patent: February 4, 2014
    Assignee: Institute of Nuclear Energy Research, Atomic Energy Council
    Inventors: Tien-Hsiang Hsueh, Mien-Win Wu, Chi-Fong Ai
  • Patent number: 8414980
    Abstract: A method of fabricating hydrophobic and oleophobic polymer fabric through two stages of modification using atmospheric plasmas including (a) moving a substrate into an atmospheric plasma area, generating an atmospheric filamentary discharge plasma with a first plasma working gas to obtain a first rough surface of said substrate, (b) exposing plasma treated substrate to air to obtain highly active peroxide on said first rough surface of said substrate, (c) immersing said substrate in a solution of fluorocarbon compound and processing a first stage of graft of a fluorocarbon monomer or oligomer on said substrate to obtain a grafted fluorocarbon monomer or oligomer layer on said first rough surface of said substrate, (d) processing a second stage of graft a fluorocarbon functional group to said grafted fluorocarbon monomer or oligomer layer by generating a carbon tetrafluoride plasma from a second plasma working gas and irradiating said carbon tetrafluoride plasma on said grafted fluorocarbon monomer or oligomer
    Type: Grant
    Filed: August 21, 2009
    Date of Patent: April 9, 2013
    Assignee: Atomic Energy Council-Institute of Nuclear Energy Research
    Inventors: Tien-Hsiang Hsueh, Mien-Win Wu, Chi-Fong Ai
  • Publication number: 20120255492
    Abstract: An apparatus provides large area atmospheric pressure plasma enhanced chemical vapor deposition without contaminations in its electrode assembly and deposited films. The apparatus consists of a large area vertical planar nitrogen plasma activation electrode assembly and its high voltage power supply, a large area vertical planar nitrogen plasma deposition electrode assembly and its high voltage power supply, a long-line uniform precursor jet apparatus, a roll-to-roll apparatus for substrate movement, and a sub-atmospheric pressure deposition chamber and its pumping apparatus.
    Type: Application
    Filed: April 6, 2011
    Publication date: October 11, 2012
    Applicant: ATOMIC ENERGY COUNCIL-INSTITUTE OF NUCLEAR ENETGY RESEARCH
    Inventors: Mien-Win Wu, Ding-Guey Tsai, Hwei-Lang Chang, Deng-Lain Lin, Cheng-Chang Hsieh, Chi-Fong Ai
  • Patent number: 8142608
    Abstract: An atmospheric pressure plasma reactor includes a high-voltage electrode, a common grounded electrode, a bias electrode and at least one dielectric layer. The high-voltage electrode is connected to a high-voltage power supply. The common grounded electrode is used with the high-voltage electrode to discharge and therefore produce planar atmospheric plasma from reactive gas. The bias electrode is used to generate bias for attracting the ions of the planar atmospheric pressure plasma. The dielectric layer is used to suppress undesirable arc discharge during the discharging.
    Type: Grant
    Filed: September 11, 2007
    Date of Patent: March 27, 2012
    Assignee: Atomic Energy Council—Institute of Nuclear Energy Research
    Inventors: Chi-fong Ai, Mien-Win Wu, Cheng-Chang Hsieh
  • Publication number: 20110045200
    Abstract: The present invention fabricates a hydrophobic and oleophobic polymer fabric through two stages of modification using atmospheric plasmas. The modified fabric has a rough surface and a fluorocarbon functional group having the lowest surface free energy. The fabric has a grafted fluorocarbon monomer layer to enhance the graft efficiency of the fluorocarbon functional groups and its wash fastness. The atmospheric plasmas can be mass produced and less expensively. Hence, the present invention can rapidly modify surfaces of polymeric materials with low cost and good environment protection.
    Type: Application
    Filed: August 21, 2009
    Publication date: February 24, 2011
    Applicant: ATOMIC ENERGY COUNCIL-INSTITUTE OF NUCLEAR ENERGY RESEARCH
    Inventors: Tien-Hsiang Hsueh, Mien-Win Wu, Chi-Fong Ai
  • Publication number: 20100218896
    Abstract: An atmospheric pressure plasma reactor includes a high-voltage electrode, a common grounded electrode, a bias electrode and at least one dielectric layer. The high-voltage electrode is connected to a high-voltage power supply. The common grounded electrode is used with the high-voltage electrode to discharge and therefore produce planar atmospheric plasma from reactive gas. The bias electrode is used to generate bias for attracting the ions of the planar atmospheric pressure plasma. The dielectric layer is used to suppress undesirable arc discharge during the discharging.
    Type: Application
    Filed: September 11, 2007
    Publication date: September 2, 2010
    Applicant: ATOMIC ENERGY COUNCIL - INSTITUTE OF NUCLEAR ENERGY RESEARCH
    Inventors: Chi-fong Ai, Mien-Win Wu, Cheng-Chang Hsieh
  • Publication number: 20090291226
    Abstract: Disclosed is a n atmospheric-pressure double-plasma graft polymerization apparatus. The apparatus includes a workbench, an initial roller of a roll-to-roll device, an atmospheric-pressure plasma activation device, a peroxide formation device, a coating and grafting device, a drying device, a graft polymerization and curing device, a curing device and a final roller of a roll-to-roll device. The devices are sequentially provided on the workbench.
    Type: Application
    Filed: May 21, 2008
    Publication date: November 26, 2009
    Applicant: ATOMIC ENERGY COUNCIL - INSTITUTE OF NUCLEAR ENERGY RESEARCH
    Inventors: Mien-Win WU, Tien-Hsiang Hsueh, Cheng-Chang Hsieh, Chi-fong Ai
  • Publication number: 20080060579
    Abstract: A dielectric barrier discharge uses three electrodes at an atmospheric pressure. A wide discharge gap can be used and an enhanced plasma density can be achieved so that thick materials can be processed and its processing speed can also be greatly improved.
    Type: Application
    Filed: August 28, 2006
    Publication date: March 13, 2008
    Applicant: ATOMIC ENERGY COUNCIL-INSTITUE OF NUCLEAR ENERGY RESEARCH
    Inventors: Cheng-Chang Hsieh, Mien-Win Wu, Chi-Fong Ai
  • Publication number: 20070154650
    Abstract: Abstract of the disclosure The present invention provides a method and an apparatus for a glow discharge plasma surface treatment of flexible sheet materials under atmospheric pressure. The apparatus comprises electrodes, a single plasma-gas flow channel, uniform gas inlet-and-outlet devices, gas-seal devices for the horizontal movements of sheet materials and reel devices, so as to attain an uniform distribution of plasma gases in the gap between electrodes. As a result, not only a great amount of expensive plasma gas is saved, but also an uniform glow discharge plasma is generated at the lowest input power to obtain a good quality of uniform plasma treatment with continuous processing and high production.
    Type: Application
    Filed: December 30, 2005
    Publication date: July 5, 2007
    Inventors: Mien-Win Wu, Cheng-Chang Hsieh, Chi-Fong Ai, Kuo-Chuan Cheng, Tien-Hsiang Hsuch