Patents by Inventor Mihoko Ishima

Mihoko Ishima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Metal-polishing liquid and chemical mechanical polishing method using the same
    Patent number: 7857985
    Abstract: The invention provides a metal polishing liquid comprising an oxidizing agent and colloidal silica in which a part of a surface of the colloidal silica is covered with aluminum atoms, and a Chemical Mechanical Polishing method using the same. An amino acid, a compound having an isothiazoline-3-one skeleton, an organic acid, a passivated film forming agent, a cationic surfactant, a nonionic surfactant, and a water-soluble polymer may be contained. A metal polishing liquid which is used in Chemical Mechanical Polishing in manufacturing of a semiconductor device, attains low dishing of a subject to be polished, and can perform polishing excellent in in-plane uniformity of a surface to be polished.
    Type: Grant
    Filed: January 30, 2007
    Date of Patent: December 28, 2010
    Assignee: Fujifilm Corporation
    Inventors: Katsuhiro Yamashita, Kenji Takenouchi, Tomoo Kato, Yoshinori Nishiwaki, Mihoko Ishima
  • Metal-polishing liquid and chemical mechanical polishing method using the same
    Publication number: 20070186484
    Abstract: The invention provides a metal polishing liquid comprising an oxidizing agent and colloidal silica in which a part of a surface of the colloidal silica is covered with aluminum atoms, and a Chemical Mechanical Polishing method using the same. An amino acid, a compound having an isothiazoline-3-one skeleton, an organic acid, a passivated film forming agent, a cationic surfactant, a nonionic surfactant, and a water-soluble polymer may be contained. A metal polishing liquid which is used in Chemical Mechanical Polishing in manufacturing of a semiconductor device, attains low dishing of a subject to be polished, and can perform polishing excellent in in-plane uniformity of a surface to be polished.
    Type: Application
    Filed: January 30, 2007
    Publication date: August 16, 2007
    Applicant: FUJIFILM Corporation
    Inventors: Katsuhiro Yamashita, Kenji Takenouchi, Tomoo Katou, Yoshinori Nishiwaki, Mihoko Ishima