Patents by Inventor Mika TAZURU

Mika TAZURU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polishing composition
    Patent number: 10696869
    Abstract: A polishing composition capable of suppressing surface defects and reducing haze is provided. The polishing composition includes: abrasives; at least one water-soluble polymer selected from vinyl alcohol-based resins having a 1,2-diol structural unit; a polyalcohol; and an alkali compound. Preferably, the polishing composition further includes a non-ionic surfactant.
    Type: Grant
    Filed: October 21, 2016
    Date of Patent: June 30, 2020
    Assignee: NITTA HAAS INCORPORATED
    Inventors: Noriaki Sugita, Shuhei Matsuda, Takayuki Matsushita, Mika Tazuru
  • Polishing composition
    Patent number: 10435588
    Abstract: A polishing composition that can suppress surface defects and reduce haze is provided. A polishing composition includes: abrasives; at least one water-soluble polymer selected from vinyl alcohol-based resins having a 1,2-diol structural unit; and an alkali compound, where an average particle size of particles in the polishing composition measured by dynamic light scattering is not more than 55 nm. Preferably, the polishing composition further includes a non-ionic surfactant. Preferably, the polishing composition further includes a polyalcohol.
    Type: Grant
    Filed: October 20, 2016
    Date of Patent: October 8, 2019
    Assignee: NITTA HAAS INCORPORATED
    Inventors: Noriaki Sugita, Mika Tazuru, Takayuki Matsushita, Shuhei Matsuda
  • POLISHING COMPOSITION
    Publication number: 20180312725
    Abstract: A polishing composition capable of suppressing surface defects and reducing haze is provided. The polishing composition includes: abrasives; at least one water-soluble polymer selected from vinyl alcohol-based resins having a 1,2-diol structural unit; a polyalcohol; and an alkali compound. Preferably, the polishing composition further includes a non-ionic surfactant.
    Type: Application
    Filed: October 21, 2016
    Publication date: November 1, 2018
    Inventors: Noriaki SUGITA, Shuhei MATSUDA, Takayuki MATSUSHITA, Mika TAZURU
  • POLISHING COMPOSITION
    Publication number: 20180305580
    Abstract: A polishing composition that can suppress surface defects and reduce haze is provided. A polishing composition includes: abrasives; at least one water-soluble polymer selected from vinyl alcohol-based resins having a 1,2-diol structural unit; and an alkali compound, where an average particle size of particles in the polishing composition measured by dynamic light scattering is not more than 55 nm. Preferably, the polishing composition further includes a non-ionic surfactant. Preferably, the polishing composition further includes a polyalcohol.
    Type: Application
    Filed: October 20, 2016
    Publication date: October 25, 2018
    Applicant: NITTA HAAS INCORPORATED
    Inventors: Noriaki SUGITA, Mika TAZURU, Takayuki MATSUSHITA, Shuhei MATSUDA