Patents by Inventor Mika Yamamura

Mika Yamamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4965155
    Abstract: Disclosed is an organic photoconductive material for the electrophotography, which comprises a linear high-molecular-weight polymer having a rhodanine derivative of the following formula incorporated as a substituent: ##STR1## In this derivative group, a benzylidene group or the like is bonded to the 5-position of the rhodanine ring. A photosensitive material comprising a polymer having this rhodanine derivative group shows a photoconductivity to visible rays even without addition of a charge-generating pigment.
    Type: Grant
    Filed: December 2, 1988
    Date of Patent: October 23, 1990
    Assignee: Mita Industrial Co., Ltd.
    Inventors: Toshihiko Nishiguchi, Mika Yamamura