Patents by Inventor Mike Adel

Mike Adel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers
    Patent number: 10649447
    Abstract: Various methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers are provided. One method for creating a dynamic sampling scheme for a process during which measurements are performed on wafers includes performing the measurements on all of the wafers in at least one lot at all measurement spots on the wafers. The method also includes determining an optimal sampling scheme, an enhanced sampling scheme, a reduced sampling scheme, and thresholds for the dynamic sampling scheme for the process based on results of the measurements. The thresholds correspond to values of the measurements at which the optimal sampling scheme, the enhanced sampling scheme, and the reduced sampling scheme are to be used for the process.
    Type: Grant
    Filed: May 16, 2017
    Date of Patent: May 12, 2020
    Assignee: KLA-Tencor Corp.
    Inventors: Pavel Izikson, John Robinson, Mike Adel, Amir Widmann, Dongsub Choi, Anat Marchelli
  • Periodic patterns and technique to control misalignment between two layers
    Patent number: 10151584
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Grant
    Filed: October 30, 2017
    Date of Patent: December 11, 2018
    Assignee: KLA-Tencor Corporation
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • PERIODIC PATTERNS AND TECHNIQUE TO CONTROL MISALIGNMENT BETWEEN TWO LAYERS
    Publication number: 20180100735
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Application
    Filed: October 30, 2017
    Publication date: April 12, 2018
    Applicant: KLA-Tencor Corporation
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Periodic patterns and technique to control misalignment between two layers
    Patent number: 9835447
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Grant
    Filed: October 24, 2016
    Date of Patent: December 5, 2017
    Assignee: KLA-Tencor Corporation
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Methods and Systems for Creating or Performing a Dynamic Sampling Scheme for a Process During Which Measurements Are Performed on Wafers
    Publication number: 20170255188
    Abstract: Various methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers are provided. One method for creating a dynamic sampling scheme for a process during which measurements are performed on wafers includes performing the measurements on all of the wafers in at least one lot at all measurement spots on the wafers. The method also includes determining an optimal sampling scheme, an enhanced sampling scheme, a reduced sampling scheme, and thresholds for the dynamic sampling scheme for the process based on results of the measurements. The thresholds correspond to values of the measurements at which the optimal sampling scheme, the enhanced sampling scheme, and the reduced sampling scheme are to be used for the process.
    Type: Application
    Filed: May 16, 2017
    Publication date: September 7, 2017
    Inventors: Pavel Izikson, John Robinson, Mike Adel, Amir Widmann, Dongsub Choi, Anat Marchelli
  • Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers
    Patent number: 9651943
    Abstract: Various methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers are provided. One method for creating a dynamic sampling scheme for a process during which measurements are performed on wafers includes performing the measurements on all of the wafers in at least one tot at all measurement spots on the wafers. The method also includes determining an optimal sampling scheme, an enhanced sampling scheme, a reduced sampling scheme, and thresholds for the dynamic sampling scheme for the process based on results of the measurements. The thresholds correspond to values of the measurements at which the optimal sampling scheme, the enhanced sampling scheme, and the reduced sampling scheme are to be used for the process.
    Type: Grant
    Filed: April 26, 2012
    Date of Patent: May 16, 2017
    Assignee: KLA-Tencor Corp.
    Inventors: Pavel Izikson, John Robinson, Mike Adel, Amir Widmann, Dongsub Choi, Anat Marchelli
  • PERIODIC PATTERNS AND TECHNIQUE TO CONTROL MISALIGNMENT BETWEEN TWO LAYERS
    Publication number: 20170038198
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Application
    Filed: October 24, 2016
    Publication date: February 9, 2017
    Applicant: KLA-Tencor Corporation
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Periodic patterns and technique to control misalignment between two layers
    Patent number: 9476698
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Grant
    Filed: December 7, 2015
    Date of Patent: October 25, 2016
    Assignee: KLA-Tencor Corporation
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Periodic Patterns and Technique to Control Misalignment Between Two Layers
    Publication number: 20160084639
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Application
    Filed: December 7, 2015
    Publication date: March 24, 2016
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Periodic patterns and techniques to control misalignment between two layers
    Patent number: 9234745
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Grant
    Filed: July 1, 2015
    Date of Patent: January 12, 2016
    Assignee: KLA-Tencor Corporation
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Periodic Patterns and Techniques to Control Misalignment Between Two Layers
    Publication number: 20150300815
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Application
    Filed: July 1, 2015
    Publication date: October 22, 2015
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Periodic patterns and technique to control misalignment between two layers
    Patent number: 9103662
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Grant
    Filed: September 24, 2013
    Date of Patent: August 11, 2015
    Assignee: KLA-Tencor Corporation
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Periodic Patterns and Technique to Control Misalignment Between Two Layers
    Publication number: 20140022563
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Application
    Filed: September 24, 2013
    Publication date: January 23, 2014
    Applicant: KLA-Tencor Corporation
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Periodic patterns and technique to control misalignment between two layers
    Patent number: 8570515
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Grant
    Filed: November 30, 2009
    Date of Patent: October 29, 2013
    Assignee: KLA-Tencor Corporation
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Periodic patterns and technique to control misaligment between two layers
    Patent number: 8525994
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Grant
    Filed: April 22, 2009
    Date of Patent: September 3, 2013
    Assignee: KLA-Tencor Corporation
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Methods and Systems for Creating or Performing a Dynamic Sampling Scheme for a Process During Which Measurements Are Performed on Wafers
    Publication number: 20120208301
    Abstract: Various methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers are provided. One method for creating a dynamic sampling scheme for a process during which measurements are performed on wafers includes performing the measurements on all of the wafers in at least one tot at all measurement spots on the wafers. The method also includes determining an optimal sampling scheme, an enhanced sampling scheme, a reduced sampling scheme, and thresholds for the dynamic sampling scheme for the process based on results of the measurements. The thresholds correspond to values of the measurements at which the optimal sampling scheme, the enhanced sampling scheme, and the reduced sampling scheme are to be used for the process.
    Type: Application
    Filed: April 26, 2012
    Publication date: August 16, 2012
    Applicant: KLA-TENCOR CORPORATION
    Inventors: Pavel Izikson, John Robinson, Mike Adel, Amir Widmann, Dongsub Choi, Anat Marchelli
  • Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers
    Patent number: 8175831
    Abstract: Various methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers are provided. One method for creating a dynamic sampling scheme for a process during which measurements are performed on wafers includes performing the measurements on all of the wafers in at least one lot at all measurement spots on the wafers. The method also includes determining an optimal sampling scheme, an enhanced sampling scheme, a reduced sampling scheme, and thresholds for the dynamic sampling scheme for the process based on results of the measurements. The thresholds correspond to values of the measurements at which the optimal sampling scheme, the enhanced sampling scheme, and the reduced sampling scheme are to be used for the process.
    Type: Grant
    Filed: April 22, 2008
    Date of Patent: May 8, 2012
    Assignee: KLA-Tencor Corp.
    Inventors: Pavel Izikson, John Robinson, Mike Adel, Amir Widmann, Dongsub Choi, Anat Marchelli
  • Computer-implemented methods, carrier media, and systems for creating a metrology target structure design for a reticle layout
    Patent number: 7925486
    Abstract: Computer-implemented methods, carrier media, and systems for creating a metrology target structure design for a reticle layout are provided. One computer-implemented method for creating a metrology target structure design for a reticle layout includes simulating how one or more initial metrology target structures will be formed on a wafer based on one or more fabrication processes that will be used to form a metrology target structure on the wafer and one or more initial metrology target structure designs. The method also includes creating the metrology target structure design based on results of the simulating step.
    Type: Grant
    Filed: March 13, 2007
    Date of Patent: April 12, 2011
    Assignee: KLA-Tencor Technologies Corp.
    Inventors: Mark Smith, Robert Hardister, Mike Pochkowski, Amir Widmann, Elyakim Kassel, Mike Adel
  • PERIODIC PATTERNS AND TECHNIQUE TO CONTROL MISALIGNMENT BETWEEN TWO LAYERS
    Publication number: 20100073688
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Application
    Filed: November 30, 2009
    Publication date: March 25, 2010
    Applicant: KLA-Tencor Technologies Corporation
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Periodic patterns and technique to control misalignment between two layers
    Patent number: 7656528
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Grant
    Filed: February 9, 2007
    Date of Patent: February 2, 2010
    Assignee: KLA-Tencor Corporation
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman