Abstract: A plasma chamber for physical vapor deposition, having an anode aperture shield that reduces the field of view to the substrate for deposition particles from the sputtering target. The anode aperture shield limits the deposition particles reaching the substrate to selected maximum angles from the vertical, and rejects particles approaching with a larger angle from the vertical. The node aperture shield is grounded and may be constructed of an upper plate and a lower plate spaced apart from the upper plate, wherein the upper plate may include perforations or may incorporate an electron filter.

Abstract: Embodiments of a substrate carrier are described. The substrate carrier includes a carrier tray having a deposition surface and a set of pedestal positions on the deposition surface. In some embodiments, the set comprises an N×M array of pedestal positions with N?1 and M?1. Each pedestal position is adapted to receive a corresponding substrate pedestal, and each pedestal has a working surface adapted to receive a substrate. One or more adjusters are positioned in a corresponding pedestal position. The adjuster can adjust a distance between the deposition surface and the working surface, an angular orientation of the working surface relative to the deposition surface, or both.

Abstract: A cooler for maintaining an internal temperature while simultaneously protecting contents stored therein from UV light may include a container body with an interior region, the interior region sized to accommodate items to be kept within a desired temperature range; a lid hingeably attached to the container body; an angled lip extending from an outer edge of the container body; and at least one holster built into the angled lip, wherein the at least one holster is sized to accommodate a vaccine gun. The cooler may also include an alerting temperature gauge configured to alert a user when the temperature in the interior region falls outside of the desired temperature range.

Abstract: A circuit includes a generator that supplies a signal that is directly proportional to the absolute temperature. No calibration or external reference components are necessary.