Patents by Inventor Mike Littau

Mike Littau has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for evaluating microstructures on a workpiece based on the orientation of a grating on the workpiece
    Patent number: 8027037
    Abstract: In a measuring system, a method for evaluating parameters of a workpiece includes measuring a periodic structure, such as a grating, on the workpiece to produce image data. An orientation of features in the image data, produced by higher order diffractions from the periodic structure, is identified. An orientation of the periodic structure is determined based on the orientation of the features in the image data. The image data is then modified, based on the orientation of the periodic structure, to correlate with, and for comparison to, simulated image data to ascertain parameters of the workpiece. Alternatively, optical components in the measuring system, or the workpiece itself, are adjusted to provide a desired alignment between the optical components and the periodic structure. A microstructure on the workpiece may then be measured, and the resulting image data may be compared to the simulated image data to ascertain parameters of the microstructure.
    Type: Grant
    Filed: January 28, 2010
    Date of Patent: September 27, 2011
    Assignee: Nanometrics Incorporated
    Inventors: Mike Littau, Darren Forman, Chris Raymond, Steven Hummel
  • Method for Evaluating Microstructures on a Workpiece Based on the Orientation of a Grating on the Workpiece
    Publication number: 20100135571
    Abstract: In a measuring system, a method for evaluating parameters of a workpiece includes measuring a periodic structure, such as a grating, on the workpiece to produce image data. An orientation of features in the image data, produced by higher order diffractions from the periodic structure, is identified. An orientation of the periodic structure is determined based on the orientation of the features in the image data. The image data is then modified, based on the orientation of the periodic structure, to correlate with, and for comparison to, simulated image data to ascertain parameters of the workpiece. Alternatively, optical components in the measuring system, or the workpiece itself, are adjusted to provide a desired alignment between the optical components and the periodic structure. A microstructure on the workpiece may then be measured, and the resulting image data may be compared to the simulated image data to ascertain parameters of the microstructure.
    Type: Application
    Filed: January 28, 2010
    Publication date: June 3, 2010
    Applicant: NANOMETRICS INCORPORATED
    Inventors: Mike Littau, Darren Forman, Chris Raymond, Steven Hummel
  • Method for evaluating microstructures on a workpiece based on the orientation of a grating on the workpiece
    Patent number: 7656542
    Abstract: In a measuring system, a method for evaluating parameters of a workpiece includes measuring a periodic structure, such as a grating, on the workpiece to produce image data. An orientation of features in the image data, produced by higher order diffractions from the periodic structure, is identified. An orientation of the periodic structure is determined based on the orientation of the features in the image data. The image data is then modified, based on the orientation of the periodic structure, to correlate with, and for comparison to, simulated image data to ascertain parameters of the workpiece. Alternatively, optical components in the measuring system, or the workpiece itself, are adjusted to provide a desired alignment between the optical components and the periodic structure. A microstructure on the workpiece may then be measured, and the resulting image data may be compared to the simulated image data to ascertain parameters of the microstructure.
    Type: Grant
    Filed: March 10, 2006
    Date of Patent: February 2, 2010
    Assignee: Nanometrics Incorporated
    Inventors: Mike Littau, Darren Forman, Chris Raymond, Steven Hummel
  • Method for evaluating microstructures on a workpiece based on the orientation of a grating on the workpiece
    Publication number: 20070211261
    Abstract: In a measuring system, a method for evaluating parameters of a workpiece includes measuring a periodic structure, such as a grating, on the workpiece to produce image data. An orientation of features in the image data, produced by higher order diffractions from the periodic structure, is identified. An orientation of the periodic structure is determined based on the orientation of the features in the image data. The image data is then modified, based on the orientation of the periodic structure, to correlate with, and for comparison to, simulated image data to ascertain parameters of the workpiece. Alternatively, optical components in the measuring system, or the workpiece itself, are adjusted to provide a desired alignment between the optical components and the periodic structure. A microstructure on the workpiece may then be measured, and the resulting image data may be compared to the simulated image data to ascertain parameters of the microstructure.
    Type: Application
    Filed: March 10, 2006
    Publication date: September 13, 2007
    Inventors: Mike Littau, Darren Forman, Chris Raymond, Steven Hummel