Patents by Inventor Mike Maxim

Mike Maxim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Approach to optimizing an ILD argon sputter process
    Patent number: 6645353
    Abstract: A sputter etch system and a method of conducting a sputter etch. The sputter etch system includes an etch chamber with a wafer pedestal having a top surface to support a wafer and a magnet configured to provide a continuous magnetic field directed at the top surface of the wafer pedestal.
    Type: Grant
    Filed: December 31, 1997
    Date of Patent: November 11, 2003
    Assignee: Intel Corporation
    Inventors: Brett E. Huff, Ken Schatz, Mike Maxim, William G. Petro
  • NOVEL APPROACH TO OPTIMIZING AN ILD ARGON SPUTTER PROCESS
    Publication number: 20030136664
    Abstract: A sputter etch system and a method of conducting a sputter etch. The sputter etch system includes an etch chamber with a wafer pedestal having a top surface to support a wafer and a magnet configured to provide a continuous magnetic field directed at the top surface of the wafer pedestal.
    Type: Application
    Filed: December 31, 1997
    Publication date: July 24, 2003
    Inventors: BRETT E. HUFF, KEN SCHATZ, MIKE MAXIM, WILLIAM G. PETRO