Abstract: Provided are plasma enhanced chemical vapor deposition methods of depositing smooth and conformal ashable hard mask films on substrates containing raised or recessed features. The methods involve using precursors having relatively high C:H ratios, such as acetylene (C:H ratio of 1), and plasmas having low ion energies and fluxes. According to various embodiments, the methods involve depositing smooth ashable hard mask films using high frequency radio frequency-generated plasmas with no low frequency component and/or relatively high pressures. Also provided are methods of depositing ashable hard mask films having good selectivity and improved side wall coverage and roughness. The methods involve depositing a first ashable hard mask film on a substrate having a feature using a process optimized for selectivity and/or optical properties and then depositing a smoothing layer on the first ashable hard mask film using an HF-only process.

Abstract: An automatic coin sorting device is provided. The sorting device may include a housing having a hopper configured for receiving coins, a coin tray coupled to the housing, wherein the coin tray is moveable from a first position to a second position, and a plurality of tubular coin receiving members removably secured to the coin tray, wherein each tubular coin receiving member is configured for receiving a different-sized coin. Each tubular coin receiving member includes an angled opening near one face of the coin receiving member to prevent jamming or back-filling of the coins when the coin receiving member is filled to capacity.

Abstract: Provided are plasma enhanced chemical vapor deposition methods of depositing smooth and conformal ashable hard mask films on substrates containing raised or recessed features. The methods involve using precursors having relatively high C:H ratios, such as acetylene (C:H ratio of 1), and plasmas having low ion energies and fluxes. According to various embodiments, the methods involve depositing smooth ashable hard mask films using high frequency radio frequency-generated plasmas with no low frequency component and/or relatively high pressures (e.g., 2-5 Torr). Also provided are methods of depositing ashable hard mask films having good selectivity and improved side wall coverage and roughness. The methods involve depositing a first ashable hard mask film on a substrate having a feature using a process optimized for selectivity and/or optical properties and then depositing a smoothing layer on the first ashable hard mask film using an HF-only process.

Abstract: A packaged integrated circuit including a substrate 520 including a metal grid 570, 580 over a top surface of the substrate and an integrated circuit chip 500 mounted on the substrate over the grid. The metal grid can be electrically isolated from the integrated circuit or it can be electrically connected to the integrated circuit, through electrical ground for example.

Abstract: A system for monitoring the status of mobile units includes a module and a local station. The module attaches to the mobile unit and includes a sensor and transmitter. The module transmits signals to a receiver at the local station. The signals can indicate shock, tampering, or theft. The receiver delivers the signal to a computer at the local station. The computer stores and analyzes the data. The computer includes a display, a keyboard, and a printer. The computer is programmed to present the data to the user and is fitted with an internal card to dial a monitoring station.