Patents by Inventor Mike Schmotzer

Mike Schmotzer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9790595
    Abstract: Systems and methods of reducing outgassing of a substance within a reaction chamber of a reactor are disclosed. Exemplary methods include depositing a barrier layer within the reaction chamber and using a scavenging precursor to react with species on a surface of the reaction chamber. Exemplary systems include gas-phase deposition systems, such as atomic layer deposition systems, which include a barrier layer source and/or a scavenging precursor source fluidly coupled to a reaction chamber of the system.
    Type: Grant
    Filed: January 27, 2015
    Date of Patent: October 17, 2017
    Assignee: ASM IP Holding B.V.
    Inventors: Sung-Hoon Jung, Petri Raisanen, Eric Jen Cheng Liu, Mike Schmotzer
  • Publication number: 20150140210
    Abstract: Systems and methods of reducing outgassing of a substance within a reaction chamber of a reactor are disclosed. Exemplary methods include depositing a barrier layer within the reaction chamber and using a scavenging precursor to react with species on a surface of the reaction chamber. Exemplary systems include gas-phase deposition systems, such as atomic layer deposition systems, which include a barrier layer source and/or a scavenging precursor source fluidly coupled to a reaction chamber of the system.
    Type: Application
    Filed: January 27, 2015
    Publication date: May 21, 2015
    Inventors: Sung-Hoon Jung, Petri Raisanen, Eric Jen Cheng Liu, Mike Schmotzer
  • Patent number: 8993054
    Abstract: Systems and methods of reducing outgassing of a substance within a reaction chamber of a reactor are disclosed. Exemplary methods include depositing a barrier layer within the reaction chamber and using a scavenging precursor to react with species on a surface of the reaction chamber. Exemplary systems include gas-phase deposition systems, such as atomic layer deposition systems, which include a barrier layer source and/or a scavenging precursor source fluidly coupled to a reaction chamber of the system.
    Type: Grant
    Filed: July 12, 2013
    Date of Patent: March 31, 2015
    Assignee: ASM IP Holding B.V.
    Inventors: Sung-Hoon Jung, Petri Raisanen, Eric Jen Cheng Liu, Mike Schmotzer
  • Publication number: 20150017319
    Abstract: Systems and methods of reducing outgassing of a substance within a reaction chamber of a reactor are disclosed. Exemplary methods include depositing a barrier layer within the reaction chamber and using a scavenging precursor to react with species on a surface of the reaction chamber. Exemplary systems include gas-phase deposition systems, such as atomic layer deposition systems, which include a barrier layer source and/or a scavenging precursor source fluidly coupled to a reaction chamber of the system.
    Type: Application
    Filed: July 12, 2013
    Publication date: January 15, 2015
    Inventors: Sung-Hoon Jung, Petri Raisanen, Eric Jen Cheng Liu, Mike Schmotzer