Patents by Inventor Mike Stubenrauch

Mike Stubenrauch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Self-organized pin-type nanostructures, and production thereof on silicon
    Patent number: 8058086
    Abstract: By means of an RIE etch process for silicon (3), a pin-type structure (4,4a) without crystal defects is formed with high aspect ratio and with nano dimensions on the surface of silicon wafers without any additional patterning measures (e-beam, interference lithography, and the like) by selecting the gas components of the etch plasma in self-organization wherein, among others, a broadband antireflective behavior is obtained that may be applicable in many fields.
    Type: Grant
    Filed: October 10, 2006
    Date of Patent: November 15, 2011
    Assignees: X-FAB Semiconductor Foundries AG, Technische Universitaet Ilmenau
    Inventors: Konrad Bach, Daniel Gaebler, Michael Fischer, Mike Stubenrauch
  • SELF-ORGANIZED PIN-TYPE NANOSTRUCTURES, AND PRODUCTION THEREOF ON SILICON
    Publication number: 20110127641
    Abstract: By means of an RIE etch process for silicon (3), a pin-type structure (4,4a) without crystal defects is formed with high aspect ratio and with nano dimensions on the surface of silicon wafers without any additional patterning measures (e-beam, interference lithography, and the like) by selecting the gas components of the etch plasma in self-organization wherein, among others, a broadband antireflective behaviour is obtained that may be applicable in many fields.
    Type: Application
    Filed: October 10, 2006
    Publication date: June 2, 2011
    Inventors: Konrad Bach, Daniel Gaebler, Michael Fischer, Mike Stubenrauch