Patents by Inventor Mikhail N. Naydenkov

Mikhail N. Naydenkov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of providing optical quality silicon surface
    Patent number: 6890450
    Abstract: A system and method for making an optical quality silicon surface on optical systems, including integrated optical waveguide device structures, is provided. A rough surface is formed through a dry etching process. Thermal oxide is grown on the surface either by a wet or dry oxidation process. A HF based solution is used to etch the grown oxide, reducing the surface roughness. The process may be performed repeatedly in order to obtain the desired amount of smoothness.
    Type: Grant
    Filed: September 14, 2001
    Date of Patent: May 10, 2005
    Assignee: Intel Corporation
    Inventors: Mikhail N. Naydenkov, Quyen T. Huynh, Sivasubramaniam S. Yegnanarayanan
  • Method of providing optical quality silicon surface
    Publication number: 20020104822
    Abstract: A system and method for making an optical quality silicon surface on optical systems, including integrated optical waveguide device structures, is provided. A rough surface is formed through a dry etching process. Thermal oxide is grown on the surface either by a wet or dry oxidation process. A HF based solution is used to etch the grown oxide, reducing the surface roughness. The process may be performed repeatedly in order to obtain the desired amount of smoothness.
    Type: Application
    Filed: September 14, 2001
    Publication date: August 8, 2002
    Inventors: Mikhail N. Naydenkov, Quyen T. Huynh, Sivasubramaniam S. Yegnanarayanan