Abstract: There is provided a method of forming a micro-patterned functional film with a high precision on a substrate comprising:(a) a step of forming a positive or negative-type photoresist film on the entire surface of a substrate having a conductive layer thereon;(b) an exposure step of irradiating light to the surface of the already formed positive or negative-type photoresist film through overlapped photo-masks having patterns that makes the film cover the substrate except for the predetermined part for forming a functional film in the next developing step;(c) a developing step of removing the photoresist film of the predetermined part for forming a functional film;(d) a step of forming a functional film on the substrate in the part where said photoresist film is removed, by electrodeposition with said conductive layer as one electrode; and(e) a step of removing the positive or negative-type photoresist film remaining after the step (c).

Abstract: A method for manufacturing a substrate having electrically conductive circuits on its surface, window-shaped films on the electrically conducive circuits and a frame-shaped film at the regions not occupied with the window-shaped films, includes the steps of:(a) coating the surface of a transparent substrate with a photoresist composition to cover the electrically conductive circuits-carrying surface of the substrate, followed by forming a photoresist film,(b) superposing a photomask on the surface of the photoresist film formed in step (a) and exposing the thus mask-superposed photoresist film to light,(c) subjecting the substrate obtained in step (b) to development,(d) subjecting the photoresist film left in step (c) to heat-treatment, second exposure to light or no treatment,(e) subjecting the substrate passed the steps (a) to electro-deposition using the electrically conductive circuits on the substrate as one electrode to form electro-deposition coating films,(f) eliminating the photoresist film having be

Abstract: A method for manufacturing a substrate having electrically conductive circuits on the surface of a transparent substrate, window-shaped coating films on the electrically conductive circuits and a frame-shaped, functional coating film at the regions not occupied with the window-shaped coating films, includes the steps of:(a) coating the surface of a transparent substrate with a photoresist composition to cover the circuits-carrying surface of the substrate, followed by forming a photoresist coating film,(b) superposing a photomask on the surface of the photoresist coating film formed through step (a) and exposing the thus masked photoresist coating film to light,(c) subjecting the substrate formed through steps (a) and (b) to development, and eliminating the photoresist coating film in the frame-shaped part,(d) subjecting the photoresist coating film left in step (c) to heat-treatment,(e) coating the substrate obtained through steps (a) to (d) in this order with a negative photoresist composition containing a

Abstract: A method for manufacturing a substrate useful as a color filter for LCD and having window-shaped coating films and a frame-shaped, functional coating film at the regions not occupied with the window-shaped coating films, which comprises the steps of:(a) forming a functional coating film on a transparent substrate having electrically conductive circuits on a surface thereof,(b) superposing a photomask having a predetermined pattern on the surface of the coating film formed in step (a), and exposing the thus masked coating film to light,(c) subjecting the intermediate product to developing to leave a frame-shaped coating film, and(d) subjecting the resulting substrate formed through steps (a) to (c) to electro-deposition to form electro-deposition coating films on the electrically conductive circuits, enables production of coating films of fine pattern with improved precision.