Abstract: A semiconductor device array comprising highly densely arranged nano-size semiconductor devices is prepared by a simple method. The array comprises a porous body having cylinder-shaped pores formed by removing cylinder-shaped regions from a structure that includes a matrix member formed so as to contain silicon or germanium and the cylinder-shaped regions containing aluminum and dispersed in the matrix member, semiconductor regions formed in the pores, each having at least a p-n or p-i-n junction, and a pair or electrodes, arranged respectively on the top and at the bottom of the semiconductor regions. The semiconductor regions and the pair of electrodes form a plurality of semiconductor devices on a substrate.

Abstract: This invention provides an image forming process that by turn provides an excellent ink fixation effect for high speed low energy consumption printing. Two-valued or multi-valued gradation expression of a picture element, or the smallest output unit, is realized by controlling the number of liquid droplets impacting on a recording medium for each dot formed on the recording medium. The liquid droplets are subjected to physical or chemical modification so as to be fixed to the recording medium. The present invention also provides an image forming apparatus, an ink for liquid droplet recording and a liquid droplet ejection and projection method that can be used for the image forming process.

Abstract: A method for manufacturing a porous structured material comprises the steps of: preparing a reactant solution that contains a metal compound and a surfactant, coating a substrate with the reactant solution, and holding the substrate in an atmosphere containing water vapor. In a thin film of an oxide having a porous structure, a surfactant is retained in the pores, and the pore walls contain tin oxide crystals.

Abstract: A method of preparing a continuous and uniform mesostructured silica film with uniaxially aligned channel structure. The method includes the steps of making a solution containing silicon and surfactant be in contact with a substrate having alignment control ability and drying the substrate made in contact with the solution to remove the solvents contained in the solution.