Patents by Inventor Miki TAKIMOTO

Miki TAKIMOTO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11640903
    Abstract: An analysis apparatus includes a stage on which an analysis sample as an analysis target and a first adjustment sample used for adjusting a focus are provided. A laser generation unit generates a laser beam for vaporizing the analysis sample or the first adjustment sample by irradiating the sample with the laser beam. A detection unit detects a signal intensity of an element of the analysis sample or the first adjustment sample vaporized by irradiation with the laser beam. A controller determines a focus position of the laser beam with respect to a front surface position of the first adjustment sample based on the signal intensity of the first adjustment sample, and performs a control such that the focus position of the laser beam corresponds with a front surface of the analysis sample.
    Type: Grant
    Filed: August 17, 2021
    Date of Patent: May 2, 2023
    Assignee: KIOXIA CORPORATION
    Inventors: Jiahong Wu, Miki Takimoto
  • Publication number: 20220277946
    Abstract: An analysis apparatus includes a stage on which an analysis sample as an analysis target and a first adjustment sample used for adjusting a focus are provided. A laser generation unit generates a laser beam for vaporizing the analysis sample or the first adjustment sample by irradiating the sample with the laser beam. A detection unit detects a signal intensity of an element of the analysis sample or the first adjustment sample vaporized by irradiation with the laser beam. A controller determines a focus position of the laser beam with respect to a front surface position of the first adjustment sample based on the signal intensity of the first adjustment sample, and performs a control such that the focus position of the laser beam corresponds with a front surface of the analysis sample.
    Type: Application
    Filed: August 17, 2021
    Publication date: September 1, 2022
    Applicant: Kioxia Corporation
    Inventors: Jiahong WU, Miki TAKIMOTO
  • Publication number: 20220018743
    Abstract: An analysis system includes a stage that supports a sample. The analysis system includes a first supplier configured to provide a hydrophobic material on the sample, and surround an inspection region on the sample with the hydrophobic material. The analysis system includes a second supplier configured to provide an inspection liquid over the inspection region. The analysis system includes a collector configured to collect the inspection liquid. The analysis system includes an analyzer configured to analyze a component contained in the collected inspection liquid.
    Type: Application
    Filed: March 2, 2021
    Publication date: January 20, 2022
    Applicant: Kioxia Corporation
    Inventor: Miki TAKIMOTO