Patents by Inventor Miki TAMADA
Miki TAMADA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11745216Abstract: A method for producing a film includes: coating a surface of a substrate with a composition containing a polymer having a structural unit represented by formula (1) and having a number average molecular weight of 13000 or more and a solvent, heating a coating film formed by the coating, and removing, with a rinsing liquid, a part of the coating film after the heating, wherein the rinsing liquid to be used contains a basic compound. In the formula (1), Y1 is a single bond, —CO—NR2—, a divalent aromatic ring group, a divalent group containing —O—, or a divalent group containing —CO—NR2—. A1 is a single bond, —O—, —S—, or —NR3—. R1 is a hydrogen atom, a monovalent hydrocarbon group, a monovalent halogenated hydrocarbon group, or a monovalent group having a heterocyclic structure.Type: GrantFiled: June 23, 2022Date of Patent: September 5, 2023Assignee: JSR CORPORATIONInventors: Ryo Kumegawa, Sosuke Osawa, Miki Tamada, Ken Maruyama, Motohiro Shiratani
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Publication number: 20230259032Abstract: A composition includes: at least one polymer represented by formula (1), formula (2), or both; and a solvent. A1 and A2 are each independently a structural unit having 2 or more carbon atoms; a plurality of A's are the same or different and a plurality of A2s are the same or different; n1 and n2 are each independently an integer of 2 to 500; R1, R2, and R3 are each independently an organic group having 1 or more carbon atoms, or R1 and R2 taken together represent a ring together with X1, Y1, and P; R1 and R2 are the same or different; X1, Y1, and Y2 are each independently a single bond, —O—, or —NR4—; R4 is an organic group having 1 or more carbon atoms; and Z1 and Z2 are each independently hydrogen or an organic group having 1 to 15 carbon atoms.Type: ApplicationFiled: April 25, 2023Publication date: August 17, 2023Applicant: JSR CORPORATIONInventors: Miki TAMADA, Ryo KUMEGAWA, Hiroyuki KOMATSU, Motohiro SHIRATANI, Ken MARUYAMA, Sosuke OSAWA
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Publication number: 20230203229Abstract: A composition includes a polymer (1) having a partial structure represented by formula (1), and a solvent. X is a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl group having 1 to 5 carbon atoms, a hydroxyalkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Y is a monovalent organic group having 1 to 12 carbon atoms and containing a hetero atom or a monovalent inorganic acid group. Z is a linking group represented by —O—, —S—, or —NR—, where R is an organic group having 1 to 20 carbon atoms. R1 and R2 are each independently a hydrogen atom, a halogen atom, or an organic group having 1 to 20 carbon atoms, or the like.Type: ApplicationFiled: February 10, 2023Publication date: June 29, 2023Applicant: JSR CORPORATIONInventors: Miki TAMADA, Ryo KUMEGAWA, Motohiro SHIRATANI, Hiroyuki KOMATSU, Ken MARUYAMA, Sosuke OSAWA
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Publication number: 20230103682Abstract: Provided are a method for forming a resist pattern that demonstrates excellent performance in sensitivity, resolution, etc. in an exposure step when a next-generation exposure technique is applied, and a radiation-sensitive resin composition. The method for forming a resist pattern includes step (1) of forming a resist film in which a content of a radiation-sensitive acid generator (C) is 0.1% by mass or less, step (2) of exposing the resist film to EUV or an electron beam (EB), and step (3) of developing the resist film exposed in the step (2).Type: ApplicationFiled: January 12, 2021Publication date: April 6, 2023Applicant: JSR CORPORATIONInventors: Kazuki KASAHARA, Katsuaki NISHIKORI, Sosuke OSAWA, Miki TAMADA, Motohiro SHIRATANI
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Patent number: 11603480Abstract: A composition includes a polymer and a solvent. The polymer (A) satisfies at least one of the conditions (i) and (ii): (i) having in one terminal part of a main chain a block of a first structural unit that includes an amino group; and (ii) having a sulfur atom bonding to one end of the main chain, wherein a monovalent group that includes an amino group bonds to the sulfur atom.Type: GrantFiled: August 1, 2019Date of Patent: March 14, 2023Assignee: JSR CORPORATIONInventors: Hiroyuki Komatsu, Motohiro Shiratani, Miki Tamada
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Patent number: 11578230Abstract: A method of producing a substrate includes: applying a composition on a metal basal plate to form a coating film; and forming a metal-containing layer on at least a part of the coating film. The composition contains a solvent, and a polymer having a first terminal structure and a second terminal structure in a single molecule. Each of the first terminal structure and the second terminal structure is at least one selected from the group consisting of a structure represented by formula (1) and a structure represented by formula (2). A1 and A2 each independently represent a monovalent group having a functional group capable of forming a chemical bond with a metal atom. L2 represents —S—, —NR—, or —NA22-, wherein A22 represents a monovalent group having a functional group capable of forming a chemical bond with a metal atom.Type: GrantFiled: March 9, 2021Date of Patent: February 14, 2023Assignee: JSR CORPORATIONInventors: Hiroyuki Komatsu, Miki Tamada, Ryo Kumegawa, Tatsuya Sakai
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Publication number: 20230027151Abstract: A method for producing a film includes: coating a surface of a substrate with a composition containing a polymer having a structural unit represented by formula (1) and having a number average molecular weight of 13000 or more and a solvent, heating a coating film formed by the coating, and removing, with a rinsing liquid, a part of the coating film after the heating, wherein the rinsing liquid to be used contains a basic compound. In the formula (1), Y1 is a single bond, —CO—NR2—, a divalent aromatic ring group, a divalent group containing —O—, or a divalent group containing —CO—NR2—. A1 is a single bond, —O—, —S—, or —NR3—. R1 is a hydrogen atom, a monovalent hydrocarbon group, a monovalent halogenated hydrocarbon group, or a monovalent group having a heterocyclic structure.Type: ApplicationFiled: June 23, 2022Publication date: January 26, 2023Applicant: JSR CORPORATIONInventors: Ryo KUMEGAWA, Sosuke Osawa, Miki Tamada, Ken Maruyama, Motohiro Shiratani
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Patent number: 11525067Abstract: A modification method of a surface of a substrate includes: applying a composition on a surface of a metal substrate, and heating a coating film formed by the applying, wherein the composition contains: a polymer having a first structural unit that includes an aromatic ring, and a second structural unit that includes an ethylenic double bond; a thermal acid generating agent; and a solvent, wherein the polymer has a functional group capable of bonding to a metal atom in the metal substrate.Type: GrantFiled: July 31, 2019Date of Patent: December 13, 2022Assignee: JSR CORPORATIONInventors: Hiroyuki Komatsu, Miki Tamada, Hitoshi Osaki, Tomoki Nagai
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Patent number: 11462405Abstract: A pattern-forming method includes forming a prepattern and including a first polymer is formed on a silicon-containing film on a substrate. An underlayer film including a second polymer is formed in recessed portions of the prepattern. A composition for directed self-assembled film formation including a third polymer is applied on the underlayer film and the prepattern. The first polymer includes a first structural unit. The second polymer includes: a molecular chain including the first structural unit and a second structural unit that differs from the first structural unit; and an end structure that bonds to one end of the molecular chain and includes at least one selected from the group consisting of an amino group, a hydroxy group and a carboxy group. The third polymer is a block copolymer including a block of the first structural unit and a block of the second structural unit.Type: GrantFiled: October 10, 2019Date of Patent: October 4, 2022Assignee: JSR CORPORATIONInventors: Hiroyuki Komatsu, Miki Tamada, Hitoshi Osaki, Tomoki Nagai
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Patent number: 11426761Abstract: A modification method of a surface of a base includes applying a composition on a surface layer of a base to form a coating film. The surface layer contains a metal atom. The coating is heated. The composition contains a polymer and a solvent. The polymer includes at an end of a main chain or at an end of a side chain thereof, a functional group that is at least one selected from: a group represented by the following formula (1); a group containing a carbon-carbon triple bond; and a group containing an aromatic hydroxy group. In the formula (1), R1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and n is an integer of 1 to 10, wherein in a case in which n is no less than 2, a plurality of R1s are identical or different.Type: GrantFiled: August 24, 2020Date of Patent: August 30, 2022Assignee: JSR CORPORATIONInventors: Hiroyuki Komatsu, Miki Tamada, Hitoshi Osaki, Tomoki Nagai
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Publication number: 20210189553Abstract: A method of producing a substrate includes: applying a composition on a metal basal plate to form a coating film; and forming a metal-containing layer on at least a part of the coating film. The composition contains a solvent, and a polymer having a first terminal structure and a second terminal structure in a single molecule. Each of the first terminal structure and the second terminal structure is at least one selected from the group consisting of a structure represented by formula (1) and a structure represented by formula (2). A1 and A2 each independently represent a monovalent group having a functional group capable of forming a chemical bond with a metal atom. L2 represents —S—, —NR—, or —NA22-, wherein A22 represents a monovalent group having a functional group capable of forming a chemical bond with a metal atom.Type: ApplicationFiled: March 9, 2021Publication date: June 24, 2021Applicant: JSR CORPORATIONInventors: Hiroyuki KOMATSU, Miki TAMADA, Ryo KUMEGAWA, Tatsuya SAKAI
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Publication number: 20200384499Abstract: A modification method of a surface of a base includes applying a composition on a surface layer of a base to form a coating film. The surface layer contains a metal atom. The coating is heated. The composition contains a polymer and a solvent. The polymer includes at an end of a main chain or at an end of a side chain thereof, a functional group that is at least one selected from: a group represented by the following formula (1); a group containing a carbon-carbon triple bond; and a group containing an aromatic hydroxy group. In the formula (1), R1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and n is an integer of 1 to 10, wherein in a case in which n is no less than 2, a plurality of R1s are identical or different.Type: ApplicationFiled: August 24, 2020Publication date: December 10, 2020Applicant: JSR CORPORATIONInventors: Hiroyuki KOMATSU, Miki TAMADA, Hitoshi OSAKI, Tomoki NAGAI
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Publication number: 20200333707Abstract: A resist pattern-forming method includes applying a radiation-sensitive composition directly or indirectly on a substrate to form a resist film. The resist film is exposed to an extreme ultraviolet ray or an electron beam. The resist film is developed after the exposing. The radiation-sensitive composition includes a first complex, a compound and a second complex. The first complex includes a metal atom and a first ligand coordinating to the metal atom. The compound gives a second ligand that differs from the first ligand. The second complex includes the metal atom and the second ligand coordinating to the metal atom.Type: ApplicationFiled: April 21, 2020Publication date: October 22, 2020Applicant: JSR CORPORATIONInventors: Miki Tamada, Sousuke Oosawa, Ken Maruyama
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Publication number: 20200118819Abstract: A pattern-forming method includes forming a prepattern and including a first polymer is formed on a silicon-containing film on a substrate. An underlayer film including a second polymer is formed in recessed portions of the prepattern. A composition for directed self-assembled film formation including a third polymer is applied on the underlayer film and the prepattern. The first polymer includes a first structural unit. The second polymer includes: a molecular chain including the first structural unit and a second structural unit that differs from the first structural unit; and an end structure that bonds to one end of the molecular chain and includes at least one selected from the group consisting of an amino group, a hydroxy group and a carboxy group. The third polymer is a block copolymer including a block of the first structural unit and a block of the second structural unit.Type: ApplicationFiled: October 10, 2019Publication date: April 16, 2020Applicant: JSR CORPORATIONInventors: Hiroyuki KOMATSU, Miki TAMADA, Hitoshi OSAKI, Tomoki NAGAI
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Publication number: 20200087530Abstract: A modification method of a surface of a substrate includes: applying a composition on a surface of a metal substrate, and heating a coating film formed by the applying, wherein the composition contains: a polymer having a first structural unit that includes an aromatic ring, and a second structural unit that includes an ethylenic double bond; a thermal acid generating agent; and a solvent, wherein the polymer has a functional group capable of bonding to a metal atom in the metal substrate.Type: ApplicationFiled: July 31, 2019Publication date: March 19, 2020Applicant: JSR CORPORATIONInventors: Hiroyuki KOMATSU, Miki TAMADA, Hitoshi OSAKI, Tomoki NAGAI
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Publication number: 20200040209Abstract: A composition includes a polymer and a solvent. The polymer (A) satisfies at least one of the conditions (i) and (ii): (i) having in one terminal part of a main chain a block of a first structural unit that includes an amino group; and (ii) having a sulfur atom bonding to one end of the main chain, wherein a monovalent group that includes an amino group bonds to the sulfur atom.Type: ApplicationFiled: August 1, 2019Publication date: February 6, 2020Applicant: JSR CORPORATIONInventors: Hiroyuki KOMATSU, Motohiro Shiratani, Miki Tamada
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Publication number: 20200013617Abstract: A substrate treatment method includes: overlaying a film on a surface of a substrate which includes a first region including a metal atom in a surface layer thereof, using a directed self-assembling material which contains a compound having no less than 6 carbon atoms and including at least one cyano group. After the overlaying, the film on a region other than the first region is removed. After the removing, a pattern principally containing a metal oxide is formed by an Atomic Layer Deposition process or a Chemical Vapor Deposition process on the region other than the first region, of the surface of the substrate.Type: ApplicationFiled: July 8, 2019Publication date: January 9, 2020Applicant: JSR CORPORATIONInventors: Hiroyuki KOMATSU, Miki TAMADA, Hitoshi OSAKI, Motohiro SHIRATANI, Tomoki NAGAI