Patents by Inventor Miki Tsuruta

Miki Tsuruta has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • N-acyl-?-lactam derivative, macromolecular compound, and photoresist composition
    Patent number: 8859183
    Abstract: Provided are N-acyl-?-lactam derivatives represented by the following general formula, from which a photoresist composition capable of controlling an acid diffusion length to be short is obtained; a polymer obtained by polymerizing the N-acyl-?-lactam derivative represented by the following general formula as one of starting materials; and a photoresist composition containing the polymer, where the structural variables are as defined herein.
    Type: Grant
    Filed: August 2, 2013
    Date of Patent: October 14, 2014
    Assignee: Kuraray Co., Ltd.
    Inventors: Takashi Fukumoto, Shuji Matsunaga, Miki Tsuruta
  • N-acyl-?-lactam derivative, macromolecular compound, and photoresist composition
    Patent number: 8753794
    Abstract: Disclosed are an N-acyl-?-lactam derivative represented by the following general formula, from which a photoresist composition capable of controlling an acid diffusion length to be short is obtained; a polymer obtained by polymerizing the N-acyl-?-lactam derivative represented by the following general formula as one of starting materials; and a photoresist composition containing the polymer.
    Type: Grant
    Filed: August 27, 2010
    Date of Patent: June 17, 2014
    Assignee: Kuraray Co., Ltd.
    Inventors: Takashi Fukumoto, Shuji Matsunaga, Miki Tsuruta
  • N-ACYL-B-LACTAM DERIVATIVE, MACROMOLECULAR COMPOUND, AND PHOTORESIST COMPOSITION
    Publication number: 20140038106
    Abstract: Provided are N-acyl-?-lactam derivatives represented by the following general formula, from which a photoresist composition capable of controlling an acid diffusion length to be short is obtained; a polymer obtained by polymerizing the N-acyl-?-lactam derivative represented by the following general formula as one of starting materials; and a photoresist composition containing the polymer, where the structural variables are as defined herein.
    Type: Application
    Filed: August 2, 2013
    Publication date: February 6, 2014
    Applicant: Kuraray Co., Ltd.
    Inventors: Takashi FUKUMOTO, Shuji Matsunaga, Miki Tsuruta
  • N-ACYL-B-LACTAM DERIVATIVE, MACROMOLECULAR COMPOUND, AND PHOTORESIST COMPOSITION
    Publication number: 20120148954
    Abstract: Disclosed are an N-acyl-?-lactam derivative represented by the following general formula, from which a photoresist composition capable of controlling an acid diffusion length to be short is obtained; a polymer obtained by polymerizing the N-acyl-?-lactam derivative represented by the following general formula as one of starting materials; and a photoresist composition containing the polymer.
    Type: Application
    Filed: August 27, 2010
    Publication date: June 14, 2012
    Inventors: Takashi Fukumoto, Shuji Matsunaga, Miki Tsuruta