Abstract: An optical device manufacturing method and an optical device manufacturing apparatus using local etching are characterized in that in a wafer process of manufacturing a waveguide type optical device including a light-propagating core and a cladding, a nozzle which locally performs etching processing is used for movement, and a slanted end surface at an arbitrary angle, an end surface having a curved shape, or a core having a varying film thickness is formed in an arbitrary position on the wafer. A slanted end surface is formed at an optical waveguide end using local etching, for example, a 45° reflective mirror, a light-condensing nonplanar reflective mirror, or a film thickness controlled core is implemented, and high-efficiency optical connection is realized.