Abstract: The present invention provides a method of manufacturing a high-molecular thin film having a fine structure from a block-copolymer compound containing a block copolymer A as a main constituent composed of at least a block chain A1 and a block chain A2, and a block copolymer B as an accessory constituent composed of a block chain B1 miscible with a polymeric phase P1 mainly composed of the block chain A1 and a block chain B2 miscible with a polymeric phase P2 mainly composed of the block chain A2, and a substrate having a surface on which the block-copolymer compound is applied and on which a pattern member formed of a second material is discretely arranged to a surface part formed of a first material.

Abstract: A polymer thin film in which cylindrical phases are distributed in a continuous phase and are oriented in a pass-through-direction of the film includes at least: a first block copolymer including at least a block chain A1, as a component of the continuous phase, composed of polymerized monomers a1, and a block chain B1, as a component of the cylindrical phases, composed of polymerized monomers b1; and a second block copolymer including at least a block chain A2, as a component of the continuous phase, composed of polymerized monomers a2, and a block chain B2, as a component of the cylindrical phases, composed of polymerized monomers b2, with the second copolymer having a degree of polymerization different from that of the first copolymer. A film thickness of the polymer thin film and an average center distance between adjacent cylindrical phases have a relation represented by a predetermined expression.

Abstract: It is an object to provide a microstructure having cylindrical microdomains oriented in the film thickness direction and arranged in a regular pattern, for which a microphase separation phenomenon of a block copolymer is utilized. The process for producing the microstructure includes 2 steps; the first step for arranging, on a substrate (40), a polymer layer at least containing a block copolymer having a first block which constitutes a continuous phase (10) of the microstructure (30) and a second block which constitutes microdomains (20) dispersed in the continuous phase (10) and oriented in the thickness direction; and second step for thermally treating the substrate (40) at a neutral temperature (Tn), at which a first material (A) and second material (B) which constitute the respective first and second blocks have substantially the same interfacial tension with the substrate (40) surface (X).

Abstract: The present invention provides a method of manufacturing a high-molecular thin film having a fine structure from a block-copolymer compound containing a block copolymer A as a main constituent composed of at least a block chain A1 and a block chain A2, and a block copolymer B as an accessory constituent composed of a block chain B1 miscible with a polymeric phase P1 mainly composed of the block chain A1 and a block chain B2 miscible with a polymeric phase P2 mainly composed of the block chain A2, and a substrate having a surface on which the block-copolymer compound is applied and on which a pattern member formed of a second material is discretely arranged to a surface part formed of a first material.

Abstract: A polymer thin film 30 includes a continuous phase 10 primarily composed of polymers of a first monomer 11 and cylindrical microdomains each of which is primarily composed of a polymer of a second monomer 21, the cylindrical microdomains 20 being distributed in the continuous phase 10 and oriented along the penetration direction through the film, wherein the polymer thin film 30 contains block copolymers 31 which include at least respective first segments 12 formed by polymerization of the first monomer 11 and respective second segments 22 formed by polymerization of the second monomer 21, and polymers 13 compatible with the first segments.

Abstract: It is an object to provide a microstructure having cylindrical microdomains oriented in the film thickness direction and arranged in a regular pattern, for which a microphase separation phenomenon of a block copolymer is utilized. The process for producing the microstructure includes 2 steps; the first step for arranging, on a substrate (40), a polymer layer at least containing a block copolymer having a first block which constitutes a continuous phase (10) of the microstructure (30) and a second block which constitutes microdomains (20) dispersed in the continuous phase (10) and oriented in the thickness direction; and second step for thermally treating the substrate (40) at a neutral temperature (Tn), at which a first material (A) and second material (B) which constitute the respective first and second blocks have substantially the same interfacial tension with the substrate (40) surface (X).

Abstract: A polymer thin film in which cylindrical phases are distributed in a continuous phase and are oriented in a pass-through-direction of the film includes at least: a first block copolymer including at least a block chain A1, as a component of the continuous phase, composed of polymerized monomers a1, and a block chain B1, as a component of the cylindrical phases, composed of polymerized monomers b1; and a second block copolymer including at least a block chain A2, as a component of the continuous phase, composed of polymerized monomers a2, and a block chain B2, as a component of the cylindrical phases, composed of polymerized monomers b2, with the second copolymer having a degree of polymerization different from that of the first copolymer. A film thickness of the polymer thin film and an average center distance between adjacent cylindrical phases have a relation represented by a predetermined expression.