Abstract: Provided is a fabrication method of a semiconductor integrated circuit device, which comprises preparing a first mask having a plurality of openings formed in a halftone film which has been deposited over a mask substrate and has a function of reversing the phase of a transmitted light; preparing over said first mask a second mask which is made of a resist film capable of blocking an exposure light and has a resist pattern formed to expose desired opening patterns, among said plurality of opening patterns of said first mask, and a part of said halftone film around said desired opening patterns and to cover the other opening patterns; and transferring the desired patterns onto a photoresist film over a wafer by reduction projection exposure treatment with said second mask. According to the present invention, TAT and in turn, the delivery time of the semiconductor integrated circuit device can be shortened.

Abstract: An isolation and flattening technique for a semiconductor substrate having active devices, such as a bipolar transistor, and a MISFET, formed thereon, is disclosed.

Abstract: Herein disclosed is a chip-carrier type semiconductor device adopting the MCC structure, in which a semiconductor pellet is mounted on the surface of the base substrate and in which mounting terminals to be connected with external terminals of the semiconductor pellet are mounted on the rear surface of the base substrate. In order to effect a test such as screening easily and inexpensively even if the mounting terminals are multiplied or miniaturized, the chip-carrier type semiconductor device adopting the MCC structure is equipped on the side surfaces of the base substrate with auxiliary terminals to be electrically connected with a plurality of external terminals which are arrayed on an element formed main surface of the semiconductor pellet.

Abstract: A multi-layered structure of wirings on a semiconductor substrate has been employed in conjunction with the increase in the integration density of semiconductor integrated circuit devices. In the invention, dummy patterns made of the same material as an Al wiring layer for compensating for any step or level gradation are disposed in the regions below bump electrodes and in the proximity thereof in order to reduce any defects inherent to a multi-layered structure that occur in CCB bump electrodes formed on the multi-layered wirings and at pads as the base layer of the former.

Abstract: A bipolar type of semiconductor integrated circuit device is provided with U-shaped grooves which are formed by cutting a main surface of a semiconductor body to form isolation regions between bipolar transistors. A silicon oxide film can be formed in the U-shaped grooves by thermal oxidation simultaneously with the formation of a silicon oxide film used to form isolation regions between each collector contact region and base region. No separate step is needed for forming the silicon oxide film between the collector contact region and the base region. The thickness of the silicon oxide film can be controlled, and has a sufficient thickness even at its two edges, i.e., at its boundaries with the U-shaped grooves, so that the bipolar transistors exhibit good electrical characteristics. Namely, the collector resistance thereof does not increase, and the breakdown voltage at the pn junction between the collector region and the base region does not decrease.

Abstract: A semiconductor integrated circuit device having a plurality of first wirings that are formed on a semiconductor substrate and extend in a first direction and a plurality of second wirings that extend in a second direction defining an acute angle relative to the first direction. The plurality of first and second wirings have at their ends connection portions of a regular hexagonal shape or a circular shape.

Abstract: Disclosed is a semiconductor integrated circuit device adopting a gate array scheme, having a plurality of layers of wiring formed by a Design Automation system. The device according to the present invention includes a semiconductor substrate having basic cell forming regions, the basic cell forming regions being spaced from each other with wiring channel regions between adjacent basic cell forming regions. The wiring includes at least first-layer wiring lines arranged overlying the wiring channel regions; second-layer wiring lines overlying both the basic cell forming regions and the wiring channel regions; and third-layer wiring lines overlying both the basic cell forming regions and the wiring channel regions. The first-, second- and third-layer wiring lines respectively extend in first, second and third directions, the second direction being different from the first direction.

Abstract: A multi-layered structure of wirings on a semiconductor substrate has been employed in conjuction with the increase in the integration density of semiconductor integrated circuit devices. In the invention, dummy patterns made of the same material as an Al wiring layer for compensating for any step or level gradation are disposed in the regions below bump electrodes and in the proximity thereof in order to reduce any defects inherent to a multi-layered structure that occur in CCB bump electrodes formed on the multi-layered wirings and at pads as the base layer of the former.

Abstract: A bipolar type of semiconductor integrated circuit device is provided with U-shaped grooves which are formed by cutting a main surface of a semiconductor body to form isolation regions between bipolar transistors. A silicon oxide film can be formed in the U-shaped grooves by thermal oxidation simultaneously with the formation of a silicon oxide film used to form isolation regions between each collector contact region and base region. No separate step is needed for forming the silicon oxide film between the collector contact region and the base region. The thickness of the silicon oxide film can be controlled, and has a sufficient thickness even at its two edges, i.e., at its boundaries with the U-shaped grooves, so that the bipolar transistors exhibit good electrical characteristics. Namely, the collector resistance thereof does not increase, and the breakdown voltage at the pn junction between the collector region and the base region does not decrease.

Abstract: A bipolar type of semiconductor integrated circuit device is provided with U-shaped grooves which are formed by cutting a main surface of a semiconductor body to form isolation regions between bipolar transistors. A silicon oxide film can be formed in the U-shaped grooves by thermal oxidation simultaneously with the formation of a silicon oxide film used to form isolation regions between each collector contact region and base region. No separate step is needed for forming the silicon oxide film between the collector contact region and the base region. The thickness of the silicon oxide film can be controlled, and has a sufficient thickness even at its two edges, i.e., at its boundaries with the U-shaped grooves, so that the bipolar transistors exhibit good electrical characteristics. Namely, the collector resistance thereof does not increase, and the breakdown voltage at the pn junction between the collector region and the base region does not decrease.