Abstract: In a photomask blank comprising a light-shielding film and an antireflective film on a transparent substrate, the light-shielding film and the antireflective film are formed of a chromium base material containing oxygen, nitrogen and carbon such that the content of carbon decreases stepwise or continuously from a surface side toward the substrate. The photomask blank can be etched at a controlled rate to produce perpendicular walls. A photomask is manufactured by lithographically patterning the photomask blank. The photomask blank and photomask have uniform film properties and contribute to the microfabrication of semiconductor ICs of greater density and finer feature size.

Abstract: A phase shift mask blank includes a transparent substrate and a phase shift film composed primarily of a metal and silicon. The substrate has an etch rate A and the phase shift film has an etch rate B when the blank is patterned by reactive ion etching, such that the etch selectivity B/A is at least 5.0. When a phase shift mask is manufactured from the blank, the substrate is less prone to overetching, providing good controllability and in-plane uniformity of the phase shift in patterned areas. The phase shift mask can be used to fabricate semiconductor integrated circuits to a smaller minimum feature size and a higher level of integration.

Abstract: In a photomask blank comprising a light-shielding film and an antireflective film on a transparent substrate, the light-shielding film and the antireflective film are formed of a chromium base material containing oxygen, nitrogen and carbon such that the content of carbon decreases stepwise or continuously from a surface side toward the substrate. The photomask blank can be etched at a controlled rate to produce perpendicular walls. A photomask is manufactured by lithographically patterning the photomask blank. The photomask blank and photomask have uniform film properties and contribute to the microfabrication of semiconductor ICs of greater density and finer feature size.

Abstract: A phase shift mask blank includes a transparent substrate and a phase shift film composed primarily of a metal and silicon. The substrate has an etch rate A and the phase shift film has an etch rate B when the blank is patterned by reactive ion etching, such that the etch selectivity B/A is at least 5.0. When a phase shift mask is manufactured from the blank, the substrate is less prone to overetching, providing good controllability and in-plane uniformity of the phase shift in patterned areas. The phase shift mask can be used to fabricate semiconductor integrated circuits to a smaller minimum feature size and a higher level of integration.

Abstract: Disclosed are a pyrimidine or triazine compound represented by the following formula (I): ##STR1## wherein R.sup.1 represents cyano group, a halogen atom, hydroxy group or --O--R.sup.7 where R.sup.7 represents a lower alkyl group, a lower alkenyl group, a lower alkynyl group, a halo-lower alkyl group or a cyano-lower alkyl group; R.sup.2 represents hydrogen atom or a lower alkyl group; R.sup.3 represents hydrogen atom or a lower alkyl group; R.sup.4 represents a 1-imidazolyl group, --NHSO.sub.2 --R.sup.8 where R.sup.8 represents a lower alkyl group or a phenyl group which may have a substituent, hydroxy group, a lower alkoxy group or a benzyloxy group when Z is nitrogen atom; or a 1-imidazolyl group, --NHSO.sub.2 --R.sup.8 where R.sup.

Abstract: Disclosed are a pyrimidine or triazine compound represented by the following formula (I): ##STR1## wherein R.sup.1 represents cyano group, a halogen atom, hydroxy group or --O--R.sup.7 where R.sup.7 represents a lower alkyl group, a lower alkenyl group, a lower alkynyl group, a halo-lower alkyl group or a cyano-lower alkyl group; R.sup.2 represents hydrogen atom or a lower alkyl group; R.sup.3 represents hydrogen atom or a lower alkyl group; R.sup.4 represents a 1-imidazolyl group, --NHSO.sub.2 --R.sup.8 where R.sup.8 represents a lower alkyl group or a phenyl group which may have a substituent, hydroxy group, a lower alkoxy group or a benzyloxy group when Z is nitrogen atom; or a 1-imidazolyl group, --NHSO.sub.2 --R.sup.8 where R.sup.

Abstract: Disclosed are a sulfonamide compound represented by the following formula (I): ##STR1## wherein Y represents a lower akyl group, a lower alkenyl group, a lower alkynyl group, a halo-lower alkyl group, a cyano-lower alkyl group or --C(CH.sub.3).sub.2 (OR.sup.1) where R.sup.1 represents a lower akyl group, a lower alkenyl group, a lower alkynyl group, a halo-lower alkyl group or a cyano-lower alkyl group; Q represents a substituted or unsubstituted pyridyl group or --NR.sup.2 R.sup.3 where R.sup.2 represents a hydrogen atom, a lower alkyl group, a lower alkoxy group; and R.sup.3 represents a lower alkyl group, a lower alkenyl group, a lower alkynyl group, a phenyl group or a benzyl group; or R.sup.2 and R.sup.3 may be combined to form a cycloamino group; X represents an oxygen atom or a sulfur atom; and Z represents a nitrogen atom or --CH.dbd. group;processes for preparing the same and a herbicide containing the same as an active ingredient(s).

Abstract: 4-Anilinoquinazoline derivatives of formula (I): ##STR1## (in which: R.sup.1 represents a hydrogen atom, a halogen atom, a trifluoromethyl group or a nitro group;R.sup.2 represents a hydrogen atom, a C.sub.1 -C.sub.4 alkyl group, an alkoxy group or a halogen atom; andR.sup.3 represents a hydrogen atom cr a C.sub.1 -C.sub.4 alkyl group)and pharmaceutically acceptable salts thereof are, except where R.sup.1 represents a hydrogen atom or a chlorine atom in the 6- position when R.sup.2 and R.sup.3 both represent hydrogen atoms, new compounds and have been found to possess valuable analgesic and anti-inflammatory activities. These compounds can be prepared by heating the appropriate 4-haloquinazoline with an appropriate aniline or aniline derivative.

Abstract: New 4-anilinopyrimidine derivatives of formula (I): ##STR1## (wherein: R.sup.1 and R.sup.2 are the same or different and each represents a C.sub.1 -C.sub.6 alkyl group or R.sup.1 and R.sup.2 together represent a C.sub.3 -C.sub.5 alkylene group;R.sup.3 represents a hydrogen atom or a C.sub.1 -C.sub.6 alkyl group;n is 0, 1 or 2; andR.sup.4 represents a C.sub.1 -C.sub.6 alkyl group, a C.sub.1 -C.sub.6 alkoxy group, a C.sub.1 -C.sub.6 haloalkyl group, a halogen atom, a nitro group, a C.sub.1 -C.sub.6 alkanesulphonyl group, a cyano group, a carboxy group or a C.sub.2 -C.sub.7 alkoxycarbonyl group and, when n is 2, the two groups represented by R.sup.4 may be the same or different or they may together represent a methylenedioxy group)and pharmaceutically acceptable acid addition salts thereof have been found to have strong antidepressant activity, with low toxicity and very few side-effects.

Abstract: Compounds having the formula (I) ##STR1## [wherein: R.sup.1 and R.sup.2 are each alkyl or halogen, or they are trimethylene or tetramethylene; R.sup.3 is hydrogen or alkyl; A is alkylene; and R.sup.4 is optionally substituted phenyloxy or benzyloxy substituted with at least one alkyl, halogen, alkoxy, alkylthio, alkenyl, trifluoromethyl or nitro; optionally substituted phenyl substituted with one or two halogen atoms, alkyl or alkoxy; furyl or thienyl] and their salts.

Abstract: Agricultural fungicidal compositions containing as an active ingredient one or more 4-aminoquinazoline derivatives. The amino group is substituted, e.g., with a phenoxyalkylene, and the quinazoline nucleus may be substituted at 2- and or 6-positions.

Abstract: A method of using 4-anilinoquinazoline derivatives of formula (I): ##STR1## (in which: R.sup.1 represents a hydrogen atom, a halogen, atom, a trifluoromethyl group or a nitro group;R.sup.2 represents a hydrogen atom, a C.sub.1 -C.sub.4 alkyl group, an alkoxy group or a halogen atom; andR.sup.3 represents a hydrogen atom or a C.sub.1 -C.sub.4 alkyl group)and pharmaceutically acceptable salts thereof are, provided that R.sup.1 does not represents a hydrogen atom or a chlorine atom in the 6- position when R.sup.2 and R.sup.3 both represent hydrogen atoms, as an analgesic and anti-inflammatory in the treatment of mammals. These compounds can be prepared by heating the appropriate 4-haloquinazoline with an appropriate aniline or aniline derivative.

Abstract: 4-Aminoquinazoline derivatives of formula (I): ##STR1## (wherein: R.sup.1 represents an alkyl group, a cycloalkyl group, an alkenyl group or a benzyl group;R.sup.2 and R.sup.3 are the same or different and each represents a hydrogen atom, an alkyl group, an alkoxy group or a halogen atom;X represents a straight or branched chain alkylene group; andn is 0 or 1)and salts and hydrates thereof are valuable fungicidal, anti-insect (insect-repellent and insecticidal) and acaricidal compounds and thus can be used to treat or prevent many diseases affecting agricultural and horticultural plants, while, at the same time, having a much lower toxicity to fish than is exhibited by other known compounds.

Abstract: Agricultural fungicidal compositions containing as an active ingredient one or more 4-aminoquinazoline derivatives. The amino group is substituted, e.g., with a phenoxyalkylene, and the quinazoline nucleus may be substituted at 2- and or 6-positions.