Abstract: A method for detecting plasma instability within a processing chamber of a plasma processing system during substrate processing is provided. The method includes collecting a set of process data, the process data including a set of induced current signals flowing through a measuring capacitor. The method further includes converting the set of induced current signals into a set of analog voltage signals and converting the set of analog voltage signals into a set of digital signals. The method also includes analyzing the set of digital signals to detect high frequency perturbations, the high frequency perturbations indicating the plasma instability.

Abstract: A method for detecting plasma instability within a processing chamber of a plasma processing system during substrate processing is provided. The method includes collecting a set of process data, the process data including a set of induced current signals flowing through a measuring capacitor. The method further includes converting the set of induced current signals into a set of analog voltage signals and converting the set of analog voltage signals into a set of digital signals. The method also includes analyzing the set of digital signals to detect high frequency perturbations, the high frequency perturbations indicating the plasma instability.

Abstract: An arrangement for detecting plasma instability within a processing chamber of a plasma processing system during substrate processing is provided. The arrangement includes a probe arrangement, wherein the probe arrangement is disposed on a surface of the processing chamber and is configured to measure at least one plasma processing parameter. The probe arrangement includes a plasma-facing sensor and a measuring capacitor, wherein the plasma-facing sensor is coupled to a first plate of the measuring capacitor. The arrangement also includes a detection arrangement, which is coupled to a second plate of the measuring capacitor. The detection arrangement is configured to convert an induced current flowing through the measuring capacitor into a set of digital signals, the set of digital signals being processed to detect the plasma instability.

Abstract: The method for generating radicals comprises: feeding F2 gas or a mixed gas of F2 gas and an inert gas into a chamber of which the inside is provided with a carbon material, supplying a carbon atom from the carbon material by applying a target bias voltage to the carbon material, and thereby generating high density radicals, wherein the ratio of CF3 radical, CF2 radical and CF radical is arbitrarily regulated by controlling the target bias voltage applied to the carbon material while measuring the infrared absorption spectrum of radicals generated inside the chamber.

Abstract: An arrangement for detecting plasma instability within a processing chamber of a plasma processing system during substrate processing is provided. The arrangement includes a probe arrangement, wherein the probe arrangement is disposed on a surface of the processing chamber and is configured to measure at least one plasma processing parameter. The probe arrangement includes a plasma-facing sensor and a measuring capacitor, wherein the plasma-facing sensor is coupled to a first plate of the measuring capacitor. The arrangement also includes a detection arrangement, which is coupled to a second plate of the measuring capacitor. The detection arrangement is configured to convert an induced current flowing through the measuring capacitor into a set of digital signals, the set of digital signals being processed to detect the plasma instability.

Abstract: A method for designing an etch recipe is provided. An etch is performed, comprising providing an etch gas with a set halogen to carbon ratio, forming a plasma from the etch gas, and etching trenches over via. Via faceting is measured. The halogen to carbon ratio is reset according to the measured via faceting, where the halogen to carbon ratio is increased if too much faceting is measured and the halogen to carbon ratio is decreased if too little faceting is measured. The previous steps are repeated until a desired amount of faceting is obtained.

Abstract: [Object] To stably generate plasma at atmospheric pressure. [Solving Means] There are provided a tubular casing 10 into which a gas and a microwave are introduced, a hole 30 provided in a bottom surface of this casing, and a columnar conductor 40 which is provided in an axis direction of the casing, a bottom surface of the conductor 40 having a contour placed inside the contour of the hole. A minute gap A formed between the contour of a bottom surface 41 of the conductor 40 and the contour of the hole, a coaxial waveguide formed of the conductor and the casing, and an insulating film 22 formed at least on a contour portion forming the hole at the minute gap are provided. In the structure described above, the microwave is guided to the minute gap by the coaxial waveguide, and the gas is made to pass through the minute gap, so that the gas is placed in a plasma state at the minute gap.

Abstract: The method for generating radicals comprises: feeding F2 gas or a mixed gas of F2 gas and an inert gas into a chamber of which the inside is provided with a carbon material, supplying a carbon atom from the carbon material by applying a target bias voltage to the carbon material, and thereby generating high density radicals, wherein the ratio of CF3 radical, CF2 radical and CF radical is arbitrarily regulated by controlling the target bias voltage applied to the carbon material while measuring the infrared absorption spectrum of radicals generated inside the chamber.

Abstract: A platen together with a frame supporting the platen is rotatably mounted on a shaft and a platen gap is regulated by rotary movement of the frame about that shaft to detect thickness of a printing sheet at a first printing position. The mechanism for setting the platen gap is simplified and precise and the present printer can accommodate even printing sheets whose thickness is partially different. Further, it is detected platen temperature by a simple temperature detecting means and to change the platen position according to the detected temperature by a predetermined value ±&Dgr;d for a standard value d0 of the gap.

Abstract: A platen together with a frame supporting the platen is rotatably mounted on a shaft and a platen gap is regulated by rotary movement of the frame about that shaft to detect thickness of a printing sheet at a first printing position. The mechanism for setting the platen gap is simplified and precise and the present printer can accommodate even printing sheets whose thickness is partially different. Further, it is detected platen temperature by a simple temperature detecting means and to change the platen position according to the detected temperature by a predetermined value ±&Dgr;d for a standard value d0 of the gap.

Abstract: Step parts 30A, 30B are formed on both sides of a first member 20 attached to a base 1 of a stapler such that the member is free to slide, and the thickness of a binding object (for example, a bundle of paper) is determined by comparing with the height of steps 31A-33A, 31B-33B of the step parts 30A, 30B. Markings are made on the steps 31A-33A, 31B-33B corresponding to their height. A hollow part 42 is formed inside the first member 20.

Abstract: A platen together with a frame supporting the platen is rotatably mounted on a shaft and a platen gap is regulated by rotary movement of the frame about that shaft to detect thickness of a printing sheet at a first printing position. The mechanism for setting the platen gap is simplified and precise and the present printer can accommodate even printing sheets whose thickness is partially different. Further, it is detected platen temperature by a simple temperature detecting means and to change the platen position according to the detected temperature by a predetermined value ±&Dgr;d for a standard value d0 of the gap.

Abstract: An impelling blade guide is inserted into a space provided for inserting a blade unit in order to create a simple structure for the removal of staples which have become jammed in the staple ejecting mouth during empty operation. A notched section is formed in proximity to the staple ejecting mouth of the frame. During normal operation, the impelling blade guide can be easily raised since an indentation formed on the notched section and a projection formed on the impelling blade guide are fixed. When a staple is jammed in the staple ejecting mouth, the impelling blade guide is pulled up and the projection separates from the indentation. Thus the rear surface side of the staple ejecting mouth is opened. In such a way, jammed staples can be easily removed from the staple ejecting mouth.