Abstract: A substrate processing apparatus includes a processing chamber configured to accommodate a substrate; a supply flow path configured to supply a processing fluid into the processing chamber; a heating mechanism configured to heat the processing fluid flowing through the supply flow path; a first temperature sensor configured to detect a temperature of the processing fluid downstream of the heating mechanism; a pressure sensor configured to detect a pressure of the processing fluid downstream of the heating mechanism; and a controller. The controller controls an output of the heating mechanism based on the pressure of the processing fluid detected by the pressure sensor and the temperature of the processing fluid detected by the first temperature sensor.

Abstract: A substrate processing apparatus includes a processing container; and a processing fluid supply configured to supply a processing fluid in a supercritical state into the processing container. The processing fluid supply includes a fluid supply line connected to a fluid supply source and the processing container; a pump; a heater on a downstream side of the pump and configured to heat the processing fluid to generate the processing fluid in the supercritical state; a first flow rate adjuster between the pump and the heater; a first pressure measurement section between the first flow rate adjuster and the heater; a second pressure measurement section between the pump and the first flow rate adjuster; and a controller configured to control the second flow rate adjuster based on first and second pressures of the processing fluid in a liquid state measured by the first and second pressure measurement sections.

Abstract: A substrate processing apparatus includes a processing vessel; and a processing fluid supply configured to supply a processing fluid in a supercritical state into the processing vessel. The processing fluid supply includes a fluid supply line; a cooling device provided in the fluid supply line, and configured to cool the processing fluid in a gas state to produce the processing fluid in a liquid state; a pump positioned downstream of the cooling device; a heating device positioned downstream of the pump, and configured to heat the processing fluid in the liquid state to generate the processing fluid in the supercritical state; a first flow rate adjuster positioned between the pump and the heating device, and configured to adjust a supply flow rate of the processing fluid supplied to the processing vessel; and a controller configured to control the first flow rate adjuster.

Abstract: A metallic glass composite includes: a metallic base made of a body-centered cubic ferrous material; and a thermally-sprayed glass portion formed at a film thickness of 10 to 2,000 ?m on the metallic base. A glass material forming the thermally-sprayed glass portion includes: a first ingredient group A consisting of SiO2 of 35 to 70 mass %; a second ingredient group B consisting of B2O3 of 9 to 15 mass %, Li2O of 5 to 9 mass % and Na2O of 4 to 10 mass %, which is 18 to 30 mass % in total; and a third ingredient group C consisting of BaO of 0 to 15 mass %, TiO2 of 2 to 15 mass %, Al2O3 of 0 to 8 mass %, and ZnO of 0 to 15 mass %, which is 10 to 30 mass % in total.

Abstract: A substrate processing apparatus includes a drying unit configured to replace a liquid film formed on an upper surface of a substrate in a horizontal state with a supercritical fluid to dry the substrate, wherein the drying unit includes a pressure container provided with a drying chamber formed therein to dry the substrate, and a lid configured to close an opening of the pressure container, and the substrate processing apparatus further comprises a support member configured to support the lid so as to be movable in both a first direction parallel to the opening and a second direction opposite to the first direction.

Abstract: A substrate processing apparatus includes a unit block including multiple liquid film forming devices each configured to form a liquid film on a top surface of a substrate, and a drying device configured to replace the liquid film with a supercritical fluid to dry the substrate; and a transfer block provided between the multiple liquid film forming devices and the drying device. The transfer block includes a transfer device configured to transfer the substrate between the multiple liquid film forming devices and the drying device, and a length of a transfer path of the substrate is equal between each of the multiple liquid film forming devices and the drying device.

Abstract: A substrate processing apparatus includes: a processing container in which a substrate is accommodated; a holder configured to hold the substrate in a horizontal posture at a holding position inside the processing container; and a fluid supplier configured to supply, into the processing container, a supercritical processing fluid for drying the substrate to which a liquid adheres, wherein the fluid supplier includes a first direction change member configured to change a flow of the supercritical processing fluid, supplied radially outward from the substrate held by the holder, in a direction that does not come in contact with a radial outer end of the substrate.

Abstract: A substrate liquid processing apparatus includes: at least one liquid pipe through which a processing liquid flows; a discharge nozzle configured to discharge the processing liquid supplied via the at least one liquid pipe; a valve mechanism configured to regulate a flow of the processing liquid in the at least one liquid pipe; and a liquid detection sensor configured to detect presence or absence of the processing liquid in the at least one liquid pipe, wherein in a state in which the valve mechanism is operating so that the processing liquid in the at least one liquid pipe is located at an upstream of a first pipe measurement site of the at least one liquid pipe, the liquid detection sensor detects the presence or absence of the processing liquid at the first pipe measurement site located at a first measurement point.

Abstract: A striker mounting structure is configured to mount a striker on a vehicle body. A hook fixed to a door is hooked to the striker. A reinforcement formed with an insertion hole may be attached to the vehicle body. An outer panel covering a reinforcement may include a striker mounting surface spaced from the reinforcement. A reinforcement member may be fixed to the striker and the striker mounting surface. Two or more connecting rods may extend from the reinforcement member. Each of the connecting rods may include locking portions, which are inserted in the insertion hole formed in the reinforcement.

Abstract: A striker mounting structure is designed to mount a striker on a vehicle body and prevent a door from entering a passenger compartment. A reinforcement provided on the vehicle body is covered by an outer panel. A striker mounting surface is arranged to be spaced away from the reinforcement in a front/backward direction of the vehicle body. The reinforcement is provided with an insertion hole opening toward a direction away from the passenger compartment. The striker and a reinforcement member are fixed to opposite sides of the striker mounting surface. A connecting rod is fixed to the reinforcement member and is formed with a locking portion extending into the insertion hole in a direction toward the passenger compartment and formed with an abutment portion. A distance between an end of the abutment portion and the passenger compartment is smaller than a distance between the striker and the passenger compartment.

Abstract: A substrate processing apparatus includes a processing vessel; and a processing fluid supply configured to supply a processing fluid in a supercritical state into the processing vessel. The processing fluid supply includes a fluid supply line; a cooling device provided in the fluid supply line, and configured to cool the processing fluid in a gas state to produce the processing fluid in a liquid state; a pump positioned downstream of the cooling device; a heating device positioned downstream of the pump, and configured to heat the processing fluid in the liquid state to generate the processing fluid in the supercritical state; a first flow rate adjuster positioned between the pump and the heating device, and configured to adjust a supply flow rate of the processing fluid supplied to the processing vessel; and a controller configured to control the first flow rate adjuster.

Abstract: A substrate liquid processing apparatus includes: at least one liquid pipe through which a processing liquid flows; a discharge nozzle configured to discharge the processing liquid supplied via the at least one liquid pipe; a valve mechanism configured to regulate a flow of the processing liquid in the at least one liquid pipe; and a liquid detection sensor configured to detect presence or absence of the processing liquid in the at least one liquid pipe, wherein in a state in which the valve mechanism is operating so that the processing liquid in the at least one liquid pipe is located at an upstream of a first pipe measurement site of the at least one liquid pipe, the liquid detection sensor detects the presence or absence of the processing liquid at the first pipe measurement site located at a first measurement point.

Abstract: A processing apparatus includes a chamber configured to accommodate a substrate to be processed, a nozzle provided in the chamber and configured to supply a processing solution to the substrate, a flow rate measuring part configured to measure a flow rate of the processing solution supplied to the nozzle, a flow path opening/closing part configured to open and close a supply flow path of the processing solution to the nozzle, and a controller configured to output a close signal causing the flow path opening/closing part to perform a closing operation that closes the supply flow path. The controller is configured to detect an operation abnormality of the flow path opening/closing part based on an accumulated amount of the flow rate measured by the flow rate measuring part after outputting the close signal.

Abstract: A substrate processing system includes multiple assemblies framed and including such that each of the assemblies includes a substrate processing apparatus which supplies a processing fluid to a substrate and processes the substrate, a fluid supply control apparatus including a fluid control device which controls flow of the processing fluid supplied to the substrate processing apparatus, and a drive equipment apparatus including a drive device which drives movement of the fluid control device in the fluid supply control apparatus.

Abstract: A substrate solution-treatment apparatus includes: a substrate holding part for holding a substrate; a nozzle for supplying a treatment solution onto the substrate; a supply line; a flow rate control mechanism including a flow rate meter and a flow rate control valve installed in the supply line; an opening/closing valve installed in the supply line; and a control part for controlling operations of the flow rate control mechanism and the opening/closing valve. The flow rate control mechanism controls the flow rate control valve such that a detection value of the flow rate meter coincides with a flow rate target value provided from the control part. The control part controls the nozzle to supply the treatment solution onto the substrate with the opening/closing valve opened, and provides a first flow rate as the flow rate target value to the flow rate control mechanism.

Abstract: The adhesive sheet for bonding an unvulcanized rubber to a metal, including a base cloth layer impregnated with a solvent dispersed type vulcanization adhesive having reactivity with the unvulcanized rubber; and an adhesive layer having reactivity with the metal.

Abstract: A vehicle-body lower structure includes: a side sill; and a cross member, wherein the side sill includes a side sill outer and a side sill inner, a bulk having a shape corresponding to the cross member is provided on the opposite side of the side sill inner from the cross member in a closed-section space formed by the side sill outer and the side sill inner, and the bulk includes a front wall portion, a rear wall portion placed behind the front wall portion in the vehicle-body front-rear direction, and a connecting wall portion connecting the front wall portion and the rear wall portion, the front wall portion and the connecting wall portion forming a first edge line extending in the vehicle width direction, and the rear wall portion and the connecting wall, portion forming a second edge line extending in the vehicle width direction.

Abstract: A vehicle side structure includes a reinforcement extending upward from a rear wheel well, a side outer panel placed outward of the rear wheel well and the reinforcement in the vehicle width direction, a striker configured to lock a rear side door, and a bracket to which the striker is attached. An engaged portion is provided in the reinforcement, the striker is placed on an outer side of the side outer panel, and the bracket is provided with an engaging portion configured to engage with the engaged portion.

Abstract: A center pillar structure includes a pillar inner panel, a lower pillar outer panel disposed outward of the pillar inner panel in the vehicle-width direction, and an upper pillar outer panel disposed upward of the lower pillar outer panel in the vehicle-height direction. The lower pillar outer panel includes a side wall portion, a front wall portion connected to a front end of the side wall portion, and a rear wall portion connected to a rear end of the side wall portion. The upper pillar outer panel includes an overlapping portion overlapping the side wall portion, and the overlapping portion is provided at a lower end portion of the upper pillar outer panel in the vehicle-height direction. At least one of the front wall portion and the rear wall portion is provided with a linear bent portion extending in the vehicle-height direction.

Abstract: A striker mounting structure is configured to mount a striker on a vehicle body. A hook fixed to a door is hooked to the striker. A reinforcement formed with an insertion hole may be attached to the vehicle body. An outer panel covering a reinforcement may include a striker mounting surface spaced from the reinforcement. A reinforcement member may be fixed to the striker and the striker mounting surface. Two or more connecting rods may extend from the reinforcement member. Each of the connecting rods may include locking portions, which are inserted in the insertion hole formed in the reinforcement.