Patents by Inventor Mikio Segawa

Mikio Segawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • EFEM
    Patent number: 9704727
    Abstract: An EFEM includes a housing 3 that constitutes a wafer transport chamber 9 that is substantially closed by connecting load ports 4 to an opening 31a provided on a wall 31, and connecting a processing apparatus 6; a wafer transport apparatus 2, and transports a wafer between the processing apparatus 6 and the FOUPs 7 mounted on the load ports 4; a gas delivery port 11; a gas suction port 12; a gas feedback path 10; and a FFU 13 that includes a filter 13b that is provided in the gas delivery port 11, and eliminates particles contained in the delivered gas, wherein the gas in the wafer transport chamber 9 is circulated by generating a downward gasflow in the wafer transport chamber 9 and feeding back the gas through the gas feedback path 10.
    Type: Grant
    Filed: December 12, 2014
    Date of Patent: July 11, 2017
    Assignee: SINFONIA TECHNOLOGY CO., LTD.
    Inventors: Mikio Segawa, Yasushi Taniyama, Mitsuo Natsume, Atsushi Suzuki, Toshihiro Kawai, Kunihiko Sato
  • Atmosphere replacement apparatus, substrate transport apparatus, substrate transport system, and EFEM
    Patent number: 9412634
    Abstract: The present invention provides an atmosphere replacement apparatus capable of replacing the atmosphere on the surface of a wafer with a small amount of gas. The apparatus is configured to have a cover capable of facing and covering the wafer to be transported, and a gas supply means that supplies gas having properties different from a surrounding atmosphere from the cover, and replaces the atmosphere on the surface of the wafer by the gas.
    Type: Grant
    Filed: November 10, 2014
    Date of Patent: August 9, 2016
    Assignee: SINFONIA TECHNOLOGY CO., LTD.
    Inventors: Mikio Segawa, Yasushi Taniyama, Shin Kawahisa, Mitsuo Natsume
  • EFEM
    Publication number: 20150170945
    Abstract: An EFEM includes a housing 3 that constitutes a wafer transport chamber 9 that is substantially closed by connecting load ports 4 to an opening 31a provided on a wall 31, and connecting a processing apparatus 6; a wafer transport apparatus 2, and transports a wafer between the processing apparatus 6 and the FOUPs 7 mounted on the load ports 4; a gas delivery port 11; a gas suction port 12; a gas feedback path 10; and a FFU 13 that includes a filter 13b that is provided in the gas delivery port 11, and eliminates particles contained in the delivered gas, wherein the gas in the wafer transport chamber 9 is circulated by generating a downward gasflow in the wafer transport chamber 9 and feeding back the gas through the gas feedback path 10.
    Type: Application
    Filed: December 12, 2014
    Publication date: June 18, 2015
    Applicant: SINFONIA TECHNOLOGY CO., LTD.
    Inventors: Mikio Segawa, Yasushi Taniyama, Mitsuo Natsume, Atsushi Suzuki, Toshihiro Kawai, Kunihiko Sato
  • ATMOSPHERE REPLACEMENT APPARATUS, SUBSTRATE TRANSPORT APPARATUS, SUBSTRATE TRANSPORT SYSTEM, AND EFEM
    Publication number: 20150128441
    Abstract: The present invention provides an atmosphere replacement apparatus capable of replacing the atmosphere on the surface of a wafer with a small amount of gas. The apparatus is configured to have a cover capable of facing and covering the wafer to be transported, and a gas supply means that supplies gas having properties different from a surrounding atmosphere from the cover, and replaces the atmosphere on the surface of the wafer by the gas.
    Type: Application
    Filed: November 10, 2014
    Publication date: May 14, 2015
    Applicant: SINFONIA TECHNOLOGY CO., LTD.
    Inventors: Mikio Segawa, Yasushi Taniyama, Shin Kawahisa, Mitsuo Natsume