Patents by Inventor Mikio Takigawa

Mikio Takigawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210057196
    Abstract: A sputtering target comprising a target material, wherein a sputtering face of the target material has a ramp provided to reduce a thickness of the target material at a position where erosion concentrates most intensively during sputtering.
    Type: Application
    Filed: November 2, 2020
    Publication date: February 25, 2021
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Toshiaki KURODA, Mikio TAKIGAWA
  • Publication number: 20210005437
    Abstract: A process for producing a sputtering target in which a target material is diffusion-bonded to a backing plate material having an annular frame part, the method comprising: an incorporating step of incorporating the target material inside the frame part of the backing plate material in such a manner that the uppermost position of the target material becomes higher than the uppermost position of the frame part of the backing plate material in a height direction of the frame part of the backing plate material; and a bonding step of diffusion-bonding the target material to the backing plate material.
    Type: Application
    Filed: September 21, 2020
    Publication date: January 7, 2021
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Mikio TAKIGAWA
  • Patent number: 10886111
    Abstract: A process for producing a sputtering target in which a target material is diffusion-bonded to a backing plate material having an annular frame part, the method comprising: an incorporating step of incorporating the target material inside the frame part of the backing plate material in such a manner that the uppermost position of the target material becomes higher than the uppermost position of the frame part of the backing plate material in a height direction of the frame part of the backing plate material; and a bonding step of diffusion-bonding the target material to the backing plate material.
    Type: Grant
    Filed: July 10, 2017
    Date of Patent: January 5, 2021
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Mikio Takigawa
  • Patent number: 10861684
    Abstract: A sputtering target comprising a target material, wherein a sputtering face of the target material has a ramp provided to reduce a thickness of the target material at a position where erosion concentrates most intensively during sputtering.
    Type: Grant
    Filed: March 26, 2018
    Date of Patent: December 8, 2020
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Toshiaki Kuroda, Mikio Takigawa
  • Patent number: 10737352
    Abstract: A process for producing a sputtering target in which a target material is diffusion-bonded to a top face of a backing plate material, the process comprising: a step of heating the top face of the target material by a hot plate while pressing from above thereby diffusion-bonding the target material to the backing plate material in such a manner that the step is performed at a center part prior to an outer peripheral part of the top face.
    Type: Grant
    Filed: June 19, 2019
    Date of Patent: August 11, 2020
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Mikio Takigawa, Toshiyuki Terasawa
  • Publication number: 20190299324
    Abstract: A process for producing a sputtering target in which a target material is diffusion-bonded to a top face of a backing plate material, the process comprising: a step of heating the top face of the target material by a hot plate while pressing from above thereby diffusion-bonding the target material to the backing plate material in such a manner that the step is performed at a center part prior to an outer peripheral part of the top face.
    Type: Application
    Filed: June 19, 2019
    Publication date: October 3, 2019
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Mikio TAKIGAWA, Toshiyuki TERASAWA
  • Patent number: 10369656
    Abstract: A process for producing a sputtering target in which a target material is diffusion-bonded to a top face of a backing plate material, the process comprising: a step of heating the top face of the target material by a hot plate while pressing from above thereby diffusion-bonding the target material to the backing plate material in such a manner that the step is performed at a center part prior to an outer peripheral part of the top face.
    Type: Grant
    Filed: July 10, 2017
    Date of Patent: August 6, 2019
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Mikio Takigawa, Toshiyuki Terasawa
  • Publication number: 20180315586
    Abstract: A process for producing a sputtering target in which a target material is diffusion-bonded to a backing plate material having an annular frame part, the method comprising: an incorporating step of incorporating the target material inside the frame part of the backing plate material in such a manner that the uppermost position of the target material becomes higher than the uppermost position of the frame part of the backing plate material in a height direction of the frame part of the backing plate material; and a bonding step of diffusion-bonding the target material to the backing plate material.
    Type: Application
    Filed: July 10, 2017
    Publication date: November 1, 2018
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Mikio TAKIGAWA
  • Publication number: 20180304400
    Abstract: A process for producing a sputtering target in which a target material is diffusion-bonded to a top face of a backing plate material, the process comprising: a step of heating the top face of the target material by a hot plate while pressing from above thereby diffusion-bonding the target material to the backing plate material in such a manner that the step is performed at a center part prior to an outer peripheral part of the top face.
    Type: Application
    Filed: July 10, 2017
    Publication date: October 25, 2018
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Mikio TAKIGAWA, Toshiyuki TERASAWA
  • Publication number: 20180286646
    Abstract: A sputtering target comprising a target material, wherein a sputtering face of the target material has a ramp provided to reduce a thickness of the target material at a position where erosion concentrates most intensively during sputtering.
    Type: Application
    Filed: March 26, 2018
    Publication date: October 4, 2018
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Toshiaki KURODA, Mikio TAKIGAWA
  • Publication number: 20160343551
    Abstract: Objects of the present invention consist in achievement of both of elongation of life of a sputtering target as well as uniformity of a thickness of a resulting thin coating layer formed on a substrate during the period. The present invention provides a sputtering target comprising a target material, which is characterized in that the target material has a sputtering surface having a first area placed at the center, which is circular and flat; and a second area placed outside of the first area and concentrically with the first area, which has a ring shape, wherein the first area is positioned at a location lower than that of the second area by 15% of thickness of the second area at most, and the first area has a diameter which is ranging from 60% to 80% of a circumferential diameter of the sputtering surface.
    Type: Application
    Filed: January 20, 2015
    Publication date: November 24, 2016
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Mikio TAKIGAWA, Toshiaki KURODA
  • Patent number: 6914119
    Abstract: A heat-resistant polyether having a heat resistance to a temperature of 300° C. or higher, sufficient solubility in organic solvents, low water absorption and high adhesion to substrates is provided by a heat-resistant polyether including a repeating unit represented by the formula (1) and having a polystyrene-converted weight-average molecular weight determined by GPC of not less than 1000 and not more than 50000: wherein Ar represents a bivalent organic group having an aromatic ring; R1 to R8 each independently represent a hydrogen atom or an aryl group which may be substituted; and when at least one of R1 to R8 is an aryl group which may be substituted, X represents a direct bond or a hydrocarbon group having 1 to 20 carbon atoms, while when all of R1 to R8 are hydrogen atoms, X is represented by the formula (2): —CR9(R10)—??(2) wherein R9 and R10 each independently represent an aryl group which may be substituted.
    Type: Grant
    Filed: July 18, 2002
    Date of Patent: July 5, 2005
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Yuji Yoshida, Mikio Takigawa, Naoya Satoh
  • Publication number: 20030060591
    Abstract: A heat-resistant polyether having a heat resistance to a temperature of 300° C.
    Type: Application
    Filed: July 18, 2002
    Publication date: March 27, 2003
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yuji Yoshida, Mikio Takigawa, Naoya Satoh