Abstract: A waveguide and an attenuation pole waveguide bandpass filter with a simple structure without any additional structure such as a negative cross coupling between resonators. The attenuation pole waveguide bandpass filter arranged at right angle to the longitudinal direction (radio wave propagation direction) is composed only of conductors. The conductor comprises depressions each opening outwardly and having a non-conducting region which continues from the inside of the opening section to the outside, and a window in the conductor section between these opposed depressions. In an alternative embodiment, such conductor shall be covered by a dielectric such as a resin.

Abstract: A waveguide and an attenuation pole waveguide bandpass filter with a simple structure without any additional structure such as a negative cross coupling between resonators. The attenuation pole waveguide bandpass filter arranged at right angle to the longitudinal direction (radio wave propagation direction) is composed only of conductors. The conductor comprises depressions each opening outwardly and having a non-conducting region which continues from the inside of the opening section to the outside, and a window in the conductor section between these opposed depressions. In an alternative embodiment, such conductor shall be covered by a dielectric such as a resin.

Abstract: In a horn antenna apparatus for use in an antenna system for radar, some of the excited radio waves in a TE11 mode in a radio-wave input portion 1 are converted to those in a higher mode in a waveguide portion 5. As the inclination of a line of intersection S of the waveguide portion 5 is not fixed but continuously varied, the higher mode such as a TM11 mode and TE12 mode and the like is excited everywhere in the direction of the axis Z of the waveguide portion 5. Then the configuration of the line of intersection is determined so that an amplitude and a phase as the generated quantity of higher mode such as the TM11 mode generated in the waveguide portion 5 conform to desired values with respect to each higher mode.

Abstract: In a horn antenna apparatus for use in an antenna system for radar, some of the excited radio waves in a TE11 mode in a radio-wave input portion 1 are converted to those in a higher mode in a waveguide portion 5. As the inclination of a line of intersection S of the waveguide portion 5 is not fixed but continuously varied, the higher mode such as a TM11 mode and TE12 mode and the like is excited everywhere in the direction of the axis Z of the waveguide portion 5. Then the configuration of the line of intersection is determined so that an amplitude and a phase as the generated quantity of higher mode such as the TM11 mode generated in the waveguide portion 5 conform to desired values with respect to each higher mode.

Abstract: Electrolyzed waters, including an anode water and a cathode water, having either oxidizing or reducing activity and having either acidity or alkalescency, which is obtained by electrolysis of an aqueous solution prepared by addition of a minute amount of electrolytes, is applied wet processings including cleaning, etching and rinsing processings of semiconductor wafers. The effects of the electrolyzed waters are not lower than those the conventional acidic or alkalic chemicals provide, and remarkably reduces quantity of chemicals used in wet processings in semiconductor manufacturing.

Abstract: Semiconductor substrates are treated in a treating solution consisting of hydrofluoric acid, hydrogen peroxide and a purified water or in a treating solution consisting of hydrofluoric acid, ammonium fluoride, hydrogen peroxide and a purified water, wherein the treating solution preferably has a hydrofluoric acid concentration of 0.1 to 10 wt % and a hydrogen peroxide concentration of 0.1 to 15 wt %. A process for treating semiconductor substrates is provided according to this invention, which allows less inclusion of metallic impurities from the treating solution and has excellent ability of removing metallic impurities with a very small amount of microparticles deposited on the substrate. The number of microparticles deposited on the semiconductor substrates can be reduced to about 1/10 the level in the conventional process.

Abstract: An improved filling and casing system is disclosed herein, which comprises a case conveying device for conveying cases, a carrier conveying device disposed adjacent to and in parallel to the case conveying device for conveying carriers capable of accommodating and holding containers, an uncasing station including a container gripper movable between the case and the carrier for taking out the containers from the case and accommodating them in the carrier, a filling station including a filling head for performing a filling operation for the containers accommodated and held in the carrier, and a capping station including a capping head for performing a capping operation for the filled containers. The uncasing station, the filling station and the capping station are disposed in succession along the case conveying device and the carrier conveying device.