Patents by Inventor Mikio Yamahiro

Mikio Yamahiro has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7868112
    Abstract: A polymer containing: a constitutional unit A that is derived from fluorosilsesquioxane having one addition polymerizable functional group in a molecule; a constitutional unit B that is derived from organopolysiloxane having an addition polymerizable functional group; and a constitutional unit C that is derived from an addition polymerizable monomer and has a group having a polymerizable unsaturated bond on a side chain, and optionally containing a constitutional unit D that is derived from an addition polymerizable monomer other than the fluorosilsesquioxane having one addition polymerizable functional group in a molecule, the organopolysiloxane having an addition polymerizable functional group and the addition polymerizable monomer having a functional group capable of introducing a group having a polymerizable unsaturated bond.
    Type: Grant
    Filed: December 17, 2007
    Date of Patent: January 11, 2011
    Assignee: Chisso Corporation
    Inventors: Hisao Oikawa, Koji Ohguma, Kenya Ito, Minoru Nakayama, Shin Koga, Mikio Yamahiro, Hiroyuki Sato
  • Patent number: 7863396
    Abstract: The present invention provides a silicon compound represented by Formula (1) and a polymer obtained by using the same, and this makes it possible not only to obtain an organic-inorganic composite material having a distinct structure but also to control the structure of the above polymer as a molecular aggregate. wherein R1 is a group independently selected from hydrogen, alkyl having a carbon atom number of 1 to 40, substituted or non-substituted aryl and substituted or non-substituted arylalkyl; in this alkyl having a carbon atom number of 1 to 40, optional hydrogens may be substituted with fluorine, and optional —CH2— may be substituted with —O—, —CH?CH—, cycloalkylene or cycloalkenylene; in alkylene in this arylalkyl, optional hydrogens may be substituted with fluorine, and optional —CH2— may be substituted with —O— or —CH?CH—; and A1 is a group having an ?-haloester group.
    Type: Grant
    Filed: March 5, 2004
    Date of Patent: January 4, 2011
    Assignee: Chisso Corporation
    Inventors: Mikio Yamahiro, Hisao Oikawa, Kenya Ito, Yasuhiro Yamamoto, Masami Tanaka, Nobumasa Ootake, Kenichi Watanabe, Kohji Ohno, Yoshinobu Tsujii, Takeshi Fukuda
  • Publication number: 20100137540
    Abstract: A polymer and a treating agent (such as a surface-treating agent) are provided that have excellent characteristics in such properties as water repellency, oil repellency, antifouling property and charge controlling property. The polymer contains a structural unit derived from fluorosilsesquioxane having an addition polymerizable group, or contains a structural unit derived from fluorosilsesquioxane having an addition polymerizable group and a structural unit derived from organopolysiloxane having an addition polymerizable group. The treating agent contains the polymer. An article treated with the treating agent is also provided.
    Type: Application
    Filed: March 21, 2008
    Publication date: June 3, 2010
    Applicant: CHISSO CORPORATION
    Inventors: Kenya Ito, Hisao Oikawa, Koji Ohguma, Mikio Yamahiro
  • Publication number: 20100093951
    Abstract: A polymer containing: a constitutional unit A that is derived from fluorosilsesquioxane having one addition polymerizable functional group in a molecule; a constitutional unit B that is derived from organopolysiloxane having an addition polymerizable functional group; and a constitutional unit C that is derived from an addition polymerizable functional monomer containing a group having active hydrogen, and optionally containing a constitutional unit D that is derived from an addition polymerizable monomer other than the fluorosilsesquioxane having one addition polymerizable functional group in a molecule, the organopolysiloxane having an addition polymerizable functional group and the addition polymerizable monomer containing a group having active hydrogen.
    Type: Application
    Filed: December 17, 2007
    Publication date: April 15, 2010
    Inventors: Hisao Oikawa, Koji Ohguma, Kenya Ito, Mikio Yamahiro
  • Patent number: 7687593
    Abstract: Provided are: an addition polymer of fluorosilsesquioxane (a) having one addition polymerizable functional group or an addition copolymer of the fluorosilsesquioxane (a) having one addition polymerizable functional group and an addition polymerizable monomer (b); a coating film including the polymer or the copolymer; and an addition copolymer of the fluorosilsesquioxane (a) having one addition polymerizable functional group and organopolysiloxane (c) having an addition polymerizable functional group, or an addition copolymer of the fluorosilsesquioxane (a) having one addition polymerizable functional group, the organopolysiloxane (c) having an addition polymerizable functional group, and the addition polymerizable monomer (b).
    Type: Grant
    Filed: September 28, 2006
    Date of Patent: March 30, 2010
    Assignee: Chisso Corporation
    Inventors: Mikio Yamahiro, Koji Ohguma, Hisao Oikawa, Hisanobu Minamizawa, Hiroyuki Sato, Kenichi Watanabe
  • Publication number: 20100075245
    Abstract: Disclosed is a resin particle having a volume average particle diameter of 10 nm to 500 nm, obtained by polymerizing an addition polymerizable monomer containing a silsesquioxane (a) represented by Formula (I) or by copolymerizing the silsesquioxane (a) with an addition polymerizable monomer (b), where R1 to R7 each independently represent a group selected from the group consisting of hydrogen, alkyl having 1 to 40 carbon atoms, substituted or unsubstituted aryl, and substituted or unsubstituted arylalkyl; any hydrogen in the alkyl group is optionally substituted by fluorine and any —CH2— is optionally substituted by —O—, —CH?CH—, cycloalkylene or cycloalkenylene; any hydrogen in alkylene in the arylalkyl group is optionally substituted by fluorine and any —CH2— is optionally substituted by —O— or —CH?CH—; and A1 represents an addition polymerizable functional group.
    Type: Application
    Filed: September 22, 2009
    Publication date: March 25, 2010
    Inventors: Masaki Watanabe, Naohito Shimota, Hiroshi Yamashita, Naohiro Watanabe, Tsuneyasu Nagatomo, Tsuyoshi Sugimoto, Shinichi Wakamatsu, Kenya Itoh, Mikio Yamahiro
  • Publication number: 20100063222
    Abstract: A polymer containing: a constitutional unit A that is derived from fluorosilsesquioxane having one addition polymerizable functional group in a molecule; a constitutional unit B that is derived from organopolysiloxane having an addition polymerizable functional group; and a constitutional unit C that is derived from an addition polymerizable monomer and has a group having a polymerizable unsaturated bond on a side chain, and optionally containing a constitutional unit D that is derived from an addition polymerizable monomer other than the fluorosilsesquioxane having one addition polymerizable functional group in a molecule, the organopolysiloxane having an addition polymerizable functional group and the addition polymerizable monomer having a functional group capable of introducing a group having a polymerizable unsaturated bond.
    Type: Application
    Filed: December 17, 2007
    Publication date: March 11, 2010
    Applicant: Chisso Corporation
    Inventors: Hisao Oikawa, Koji Ohguma, Kenya Ito, Minoru Nakayama, Shin Koga, Mikio Yamahiro, Hiroyuki Sato
  • Patent number: 7662985
    Abstract: A production process for a silicon compound represented by Formula (6), characterized by reacting a compound represented by Formula (4) with a compound represented by Formula (5): wherein all of the variables are defined in the specification.
    Type: Grant
    Filed: January 7, 2009
    Date of Patent: February 16, 2010
    Assignee: Chisso Corporation
    Inventors: Mikio Yamahiro, Hisao Oikawa, Kenya Ito, Yasuhiro Yamamoto, Masami Tanaka, Nobumasa Ootake, Kenichi Watanabe, Kohji Ohno, Yoshinobu Tsujii, Takeshi Fukuda
  • Patent number: 7595353
    Abstract: The invention provides a photocurable polymer composition having a fluorine-containing polymer and a fluorine-free polymer, and preferably further having a polymerizable double bond-containing compound and a photopolymerization initiator. The fluorine-containing polymer preferably includes a fluorosilsesquioxane skeleton.
    Type: Grant
    Filed: September 28, 2006
    Date of Patent: September 29, 2009
    Assignee: Chisso Corporation
    Inventors: Hisanobu Minamisawa, Mikio Yamahiro, Akira Meguro
  • Patent number: 7563917
    Abstract: The object of the present invention is to provide a new kind of silicon compound having an ester-type organic functional group and a new method for providing a T8-silsesquioxane compound having a hydroxyl group by using said silicon compound as the starting material. A silicon compound represented by formula (1) is obtained through the production process characterized by using a silicon compound represented by formula (2). wherein: in formula (1), each of seven R1 group is independently selected from the group consisting of hydrogen, alkyl, substituted or unsubstituted aryl, and substituted or unsubstituted arylalkyl and A2 is a hydroxyl-terminal organic functional group, and in formula (2), each of R1 group is the same as R1 in formula (1), and A1 is an organic functional group containing an acyloxy group.
    Type: Grant
    Filed: September 8, 2006
    Date of Patent: July 21, 2009
    Assignee: Chisso Corporation
    Inventors: Mikio Yamahiro, Hisao Oikawa, Kenya Ito, Masami Tanaka, Nobumasa Ootake, Kenichi Watanabe
  • Publication number: 20090143606
    Abstract: The present invention provides a silicon compound represented by Formula (1) and a polymer obtained by using the same, and this makes it possible not only to obtain an organic-inorganic composite material having a distinct structure but also to control the structure of the above polymer as a molecular aggregate. wherein R1 is a group independently selected from hydrogen, alkyl having a carbon atom number of 1 to 40, substituted or non-substituted aryl and substituted or non-substituted arylalkyl; in this alkyl having a carbon atom number of 1 to 40, optional hydrogens may be substituted with fluorine, and optional —CH2— may be substituted with —O—, —CH?CH—, cycloalkylene or cycloalkenylene; in alkylene in this arylalkyl, optional hydrogens may be substituted with fluorine, and optional —CH2— may be substituted with —O— or —CH?CH—; and A1 is a group having an ?-haloester bond.
    Type: Application
    Filed: January 7, 2009
    Publication date: June 4, 2009
    Inventors: Mikio Yamahiro, Hisao Oikawa, Kenya Ito, Yasuhiro Yamamoto, Masami Tanaka, Nobumasa Ootake, Kenichi Watanabe, Kohji Ohno, Yoshinobu Tsujii, Takeshi Fukuda
  • Publication number: 20090137765
    Abstract: The present invention provides a silicon compound represented by Formula (1) and a polymer obtained by using the same, and this makes it possible not only to obtain an organic-inorganic composite material having a distinct structure but also to control the structure of the above polymer as a molecular aggregate. wherein R1 is a group independently selected from hydrogen, alkyl having a carbon atom number of 1 to 40, substituted or non-substituted aryl and substituted or non-substituted arylalkyl; in this alkyl having a carbon atom number of 1 to 40, optional hydrogens may be substituted with fluorine, and optional —CH2— may be substituted with —O—, —CH?CH—, cycloalkylene or cycloalkenylene; in alkylene in this arylalkyl, optional hydrogens may be substituted with fluorine, and optional —CH2— may be substituted with —O— or —CH?CH—; and A1 is a group having an ?-haloester bond.
    Type: Application
    Filed: January 7, 2009
    Publication date: May 28, 2009
    Inventors: Mikio Yamahiro, Hisao Oikawa, Kenya Ito, Yasuhiro Yamamoto, Masami Tanaka, Nobumasa Ootake, Kenichi Watanabe, Kohji Ohno, Yoshinobu Tsujii, Takeshi Fukuda
  • Patent number: 7399819
    Abstract: A large part of conventional organic-inorganic composite materials is obtained by mechanical blending silsesquioxanes with organic polymers, and therefore it has been very difficult to control the structure thereof as the molecular aggregate of the composite materials. An object of the present invention is to provide a novel silicon compound having a living radical polymerization-initiating ability for an addition-polymerizable monomer and a polymer obtained using the same to thereby solve the problem described above regarding the conventional organic-inorganic composite materials. The present inventors have found that a novel silsesquioxane derivative to which a group having an ability to initiate polymerization of a monomer is useful as means for solving the problem described above.
    Type: Grant
    Filed: September 17, 2003
    Date of Patent: July 15, 2008
    Assignee: Chisso Corporation
    Inventors: Mikio Yamahiro, Hisao Oikawa, Kazuhiro Yoshida, Kenya Ito, Yasuhiro Yamamoto, Masami Tanaka, Nobumasa Ootake, Kenichi Watanabe, Kohji Ohno, Yoshinobu Tsujii, Takeshi Fukuda
  • Patent number: 7375170
    Abstract: Since the majority of conventional organic/inorganic composite materials are obtained by mechanical blending of a silsesquioxane and an organic polymer or other means, it was extremely difficult to control the structure of the composite as a molecular agglomerate. In order to solve such a problem, the invention is to provide a silicon compound represented by Formula (1). This novel silicon compound has a living radical polymerization initiating ability for addition polymerizable monomers of a wide range.
    Type: Grant
    Filed: December 27, 2005
    Date of Patent: May 20, 2008
    Assignees: Chisso Corporation, Chisso Petrochemical Corporation
    Inventors: Hisao Oikawa, Mikio Yamahiro, Koji Ohguma, Nobumasa Ootake, Kenichi Watanabe, Kohji Ohno, Yoshinobu Tsujii, Takeshi Fukuda
  • Publication number: 20080103280
    Abstract: The invention provides an ink-jet ink including a fluorine-containing compound (C) in the form of fluorosilsesquioxane having an organic group having 1 to 100 carbon atoms.
    Type: Application
    Filed: October 26, 2007
    Publication date: May 1, 2008
    Inventors: Hiroyuki Satou, Yoshihiro Deyama, Mikio Yamahiro
  • Patent number: 7256243
    Abstract: The present invention provides a novel silicon compound represented by Formula (1) having a living radical polymerization initiating ability for addition-polymerizable monomers and a polymer obtained using the same. The above polymer can provide an organic-inorganic composite material having a distinct structure. wherein R1 is hydrogen, alkyl, aryl or arylalkyl; R2 and R3 are alkyl, phenyl or cyclohexyl; and A is a group having an ability to initiate polymerization of a monomer.
    Type: Grant
    Filed: May 4, 2005
    Date of Patent: August 14, 2007
    Assignee: Chisso Corporation
    Inventors: Hisao Oikawa, Mikio Yamahiro, Kazuhiro Yoshida, Nobumasa Ootake, Kenichi Watanabe, Kohji Ohno, Yoshinobu Tsujii, Takeshi Fukuda
  • Patent number: 7235619
    Abstract: A silsesquioxane derivative represented by Formula (2): wherein R is hydrogen, an alkyl, an aryl, or an arylalkyl; and X is hydrogen, chlorine, a functional group, or a group having a functional group.
    Type: Grant
    Filed: May 4, 2005
    Date of Patent: June 26, 2007
    Assignee: Chisso Corporation
    Inventors: Yoshitaka Morimoto, Kenya Ito, Hisaoi Oikawa, Mikio Yamahiro, Kenichi Watanabe, Nobumasa Ootake
  • Publication number: 20070135602
    Abstract: Provided are: an addition polymer of fluorosilsesquioxane (a) having one addition polymerizable functional group or an addition copolymer of the fluorosilsesquioxane (a) having one addition polymerizable functional group and an addition polymerizable monomer (b); a coating film including the polymer or the copolymer; and an addition copolymer of the fluorosilsesquioxane (a) having one addition polymerizable functional group and organopolysiloxane (c) having an addition polymerizable functional group, or an addition copolymer of the fluorosilsesquioxane (a) having one addition polymerizable functional group, the organopolysiloxane (c) having an addition polymerizable functional group, and the addition polymerizable monomer (b).
    Type: Application
    Filed: September 28, 2006
    Publication date: June 14, 2007
    Inventors: Mikio Yamahiro, Koji Ohguma, Hisao Oikawa, Hisanobu Minamizawa, Hiroyuki Sato, Kenichi Watanabe
  • Publication number: 20070082968
    Abstract: The invention provides a photocurable polymer composition having a fluorine-containing polymer and a fluorine-free polymer, and preferably further having a polymerizable double bond-containing compound and a photopolymerization initiator. The fluorine-containing polymer preferably includes a fluorosilsesquioxane skeleton.
    Type: Application
    Filed: September 28, 2006
    Publication date: April 12, 2007
    Inventors: Hisanobu Minamisawa, Mikio Yamahiro, Akira Meguro
  • Publication number: 20070004932
    Abstract: The object of the present invention is to provide a new kind of silicon compound having an ester-type organic functional group and a new method for providing a T8-silsesquioxane compound having a hydroxyl group by using said silicon compound as the starting material. A silicon compound represented by formula (1) is obtained through the production process characterized by using a silicon compound represented by formula (2). wherein: in formula (1), each of seven R1 group is independently selected from the group consisting of hydrogen, alkyl, substituted or unsubstituted aryl, and substituted or unsubstituted arylalkyl and A2 is a hydroxyl-terminal organic functional group, and in formula (2), each of R1 group is the same as R1 in formula (1), and A1 is an organic functional group containing an acyloxy group.
    Type: Application
    Filed: September 8, 2006
    Publication date: January 4, 2007
    Inventors: Mikio Yamahiro, Hisao Oikawa, Kenya Ito, Masami Tanaka, Nobumasa Ootake, Kenichi Watanabe