Patents by Inventor Mikiro Arai
Mikiro Arai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 5656577Abstract: The invention provides a fluid composition for a fluid coupling, which is excellent in viscosity stability and torque stability, and comprises a polyorganosiloxane base oil having a viscosity of 3,000-500,000 mm.sup.2 /sec at 25.degree. C. and at least one 5-membered heterocyclic compound incorporated in a proportion of 0.01-3.0 wt. % based on the total weight of the composition, said 5-membered heterocyclic compound being selected from the group consisting of thiadiazole derivatives and thiazole derivatives, both, having at least one monovalent group represented by the formula --S.sub.x --R.sup.6 in which R.sup.6 is a saturated or unsaturated monovalent group or atom composed of at least one atom selected from a carbon atom, a hydrogen atom, an oxygen atom, a nitrogen atom and a sulfur atom, and x is a number of 1 or greater.Type: GrantFiled: August 1, 1994Date of Patent: August 12, 1997Assignee: Tonen CorporationInventors: Tomohiro Kato, Hitoshi Ohenoki, Hironari Ueda, Mikiro Arai, Toshiaki Kuribayashi
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Patent number: 5166104Abstract: Novel polysiloxazanes comprising [SiH.sub.2).sub.n NH-- and [SiH.sub.2).sub.m O-- as the main repeating units are provided. The polysiloxazanes are produced by reacting a dihalosilane or an adduct thereof with a Lewis base, with ammonia and water vapor or oxygen. From the polysiloxazane, novel silicon oxynitride shapes can be produced and the silicon oxynitride shapes are essentially composed of silicon, nitride (5 mol % or more) and oxygen (5 mol % or more).Type: GrantFiled: September 6, 1991Date of Patent: November 24, 1992Assignee: Toa Nenryo Kogyo Kabushiki KaishaInventors: Osamu Funayama, Mikiro Arai, Hayato Nishii, Takeshi Isoda
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Patent number: 5145812Abstract: A molded body formed of a silicon nitride-based ceramic containing Si and N and optionally O, C and/or a metal. The ceramic is formed from a polysilazane. A molded body may be a composite body which is composed of a matrix of the ceramic and a reinforcing material such as powder or fiber embedded within the matrix or which is composed of ceramic powder bound with a binder formed of the silicon nitride-based ceramic.Type: GrantFiled: August 19, 1991Date of Patent: September 8, 1992Assignee: Toa Nenryo Kogyo Kabushiki KaishaInventors: Mikiro Arai, Osamu Funayama, Hayato Nishii, Tamio Ishiyama, Hiroshi Kaya, Takeshi Isoda, Kouichi Yasuda, Atsuro Takazawa, Tadashi Suzuki, Ichiro Kohshi, Masaaki Ichiyama, Tomohiro Kato
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Patent number: 5128286Abstract: A shaped body is disclosed which comprises substantially amorphous, silicon nitride-based ceramic containing Si, N and B as essential components and O, C and H as optional components in amounts providing the following atomic ratios:N/Si: 0.05 to 2.5,B/Si: 0.01-3,O/Si: 2.0 or less,C/Si: 1.5 or less, andH/Si: 0.1 or less.Type: GrantFiled: June 18, 1990Date of Patent: July 7, 1992Assignee: Tonen CorporationInventors: Osamu Funayama, Mikiro Arai, Hiroyuki Aoki, Yuuji Tashiro, Toshio Katahata, Kiyoshi Sato, Takeshi Isoda, Tadashi Suzuki, Ichiro Kohshi
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Patent number: 5079323Abstract: Novel polysiloxazanes comprising --SiH.sub.2).sub.n NH] and --SiH.sub.2).sub.m O] as the main repeating units are provided. The polysiloxazanes are produced by reacting a dihalosilane or an adduct thereof with a Lewis base, with ammonia and water vapor or oxygen. From the polysiloxazane, novel silicon oxynitride shapes can be produced and the silicon oxynitride shapes are essentially composed of silicon, nitride (5 mol % or more) and oxygen (5 mol % or more).Type: GrantFiled: July 18, 1990Date of Patent: January 7, 1992Assignee: Toa Nenro Kogyo Kabushiki KaishaInventors: Osamu Funayama, Mikiro Arai, Hayato Nishii, Takeshi Isoda
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Patent number: 5032551Abstract: Silicon nitride based ceramic fibers containing Si, N, O and at least one metal M in amounts providing the atomic ratios N/Si of 0.3 to 3, O/Si of 0.0001 to 15 and M/Si of 0.001 to 5 and exhibiting an X-ray small angle scattering such that the ratio of the intensity of the small angle scattering of the fibers to that of air is 1 to 20. The ceramic fibers are produced by spinning of a polymetallosilazane into fibers and calcining the spun fibers and are useful as reinforcing fibers for composite artices having a metal or resin matrix.Type: GrantFiled: March 2, 1989Date of Patent: July 16, 1991Assignee: Toa Nenryo Kogyo Kabushiki KaishaInventors: Yuuji Tashiro, Osamu Funayama, Mikiro Arai, Hiroyuki Aoki, Takeshi Isoda, Hiroshihi Kaya, Tadashi Suzuki, Toshio Katahata, Mutsuo Haino, Genshiro Nishimura
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Patent number: 5030744Abstract: Disclosed is a polyborosilazane having a B/Si atomic ratio of 0.01 to 3 and a number-average molecular weight of about 200 to about 500,000 which can be pyrolyzed to give ceramics. The polyborosilazane is produced by reacting a polysilazane having a number-average molecular weight of about 100 to about 50,000 with a boron compound.Type: GrantFiled: January 18, 1990Date of Patent: July 9, 1991Assignee: Tonen CorporationInventors: Osamu Funayama, Mikiro Arai, Yuuji Tashiro, Takeshi Isoda, Kiyoshi Sato
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Patent number: 4975512Abstract: A novel, reformed polysilazane obtained by reacting a polysilazane with a compound selected from ammonia, primary and secondary amines, hydrazine and mono-, di- and tri-substituted hydrazines to cross-link the polysilazane with the compound serving as a cross-linking agent or to link the compound to the polysilazane.Type: GrantFiled: August 10, 1988Date of Patent: December 4, 1990Assignees: Petroleum Energy Center, Toa Nenryo Kogyo Kabushiki KaishaInventors: Osamu Funayama, Mikiro Arai, Takeshi Isoda
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Patent number: 4965058Abstract: Novel polysiloxazanes comprising --SiH.sub.2).sub.n NH-- and --SiH.sub.2).sub.m O-- as the main repeating units are provided. The polysiloxazanes are produced by reacting a dihalosilane or an adduct thereof with a Lewis base, with ammonia and water vapor or oxygen. From the polysiloxazane, novel silicon oxynitride shapes can be produced and the silicon oxynitride shapes are essentially composed of silicon, nitride (5 mols % or more) and oxygen (5 mol % or more).Type: GrantFiled: July 19, 1989Date of Patent: October 23, 1990Assignee: Toa Nenryo Kogyo Kabushiki KaishaInventors: Osamu Funayama, Mikiro Arai, Hayato Nishii, Takeshi Isoda
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Patent number: 4933160Abstract: A novel, reformed, inorganic polysilazane which is liquid or solid at room temperature and soluble in o-xylene at room temperature and which has (a) a number-average molecular weight of 200-500,000, (b) contents of Si, N and H of 50-70% by weight, 20-34% by weight and 5-9% by weight, respectively; and (c) --SiH.sub.2 -- and --SiH.sub.3 groups, the molar ratio of the --SiH.sub.2 -- groups to the --SiH.sub.3 groups being 2.0:1 to 8.4:1. The reformed polysilazane is obtained by reaction of a solution of a polysilazane in an organic base-containing solvent to polycondense the polysilazane.Type: GrantFiled: March 14, 1989Date of Patent: June 12, 1990Assignees: Petroleum Energy Center, Toa Nenryo Kogyo Kabushiki KaishaInventors: Osamu Funayama, Mikiro Arai, Takeshi Isoda
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Patent number: 4886860Abstract: A novel polymetalosilazane having a metal/silicon atomic ratio of from 0.001 to 3 and a number average molecular weight of about 200 to 500,000 is prepared by a process comprising: reacting a polysilazane having a number average molecular weight of about 100 to 500,000, which has a skelton consisting substantially of units ##STR1## at least one R being hydrogen, with a metal alkoxide in which the metal is selected from metals of the groups IIA and III to V of the Periodic Table.Type: GrantFiled: March 17, 1989Date of Patent: December 12, 1989Assignee: Toa Nenryo Kogyo Kabushiki KaishaInventors: Mikiro Arai, Osamu Funayama, Yuuji Tashiro, Takeshi Isoda
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Patent number: 4869858Abstract: Novel polysiloxazanes comprising [(SiH.sub.2).sub.n NH] and [(SiH.sub.2).sub.m O] as the main repeating units are provided. The polysiloxazanes are produced by reacting a dihalosilane or an adduct thereof with a Lewis base, with ammonia and water vapor or oxygen. From the polysiloxazane, novel silicon oxynitride shapes can be produced and the silicon oxynitride shapes are essentially composed of silicon, nitride (5 mol % or more) and oxygen (5 mol % or more).Type: GrantFiled: February 12, 1987Date of Patent: September 26, 1989Assignee: Toa Nenryo Kogyo Kabushiki KaishaInventors: Osamu Funayama, Mikiro Arai, Hayato Nishii, Takeshi Isoda
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Patent number: 4861569Abstract: A novel, reformed, inorganic polysilazane which is liquid or solid at room temperature and soluble in o-xylene at room temperature and which has (a) a number-average molecular weight of 200-500,000, (b) contents of Si, N and H of 50-70% by weight, 20-34% by weight and 5-9% by weight, respectively; and (c) --SiH.sub.2 -- and --SiH.sub.3 groups, the molar ratio of the --SiH.sub.2 -- groups to the --SiH.sub.3 groups being 2.0:1 to 8.4:1. The reformed polysilazane is obtained by reaction of a solution of a polysilazane in an organic base-containing solvent to polycondense the polysilazane.Type: GrantFiled: August 10, 1988Date of Patent: August 29, 1989Assignees: Petroleum Energy Center, Toa Nenryo Kogyo Kabushiki KaishaInventors: Osamu Funayama, Mikiro Arai, Takeshi Isoda
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Patent number: 4840778Abstract: Novel primarily chain inorganic polysilazanes of average molecular weight of 690 to 2000 are prepared from novel adducts of a halosilane and a base by reacting the adducts with ammonia in unreactive solvents. Silicon nitride is prepared by heating the polysilazanes at 1000.degree. to 1600.degree. C., preferably below 1300.degree. C., most preferably 1000.degree. to 1100.degree. C.Type: GrantFiled: November 26, 1985Date of Patent: June 20, 1989Assignee: Toa Nenryo Kogyo Kabushiki KaishaInventors: Mikiro Arai, Takeshi Isoda, Takuji Itoh
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Patent number: 4818611Abstract: Silicon nitride fibers having a carbon content of 5 weight percent or less have high heat insulating properties and favorable mechanical properties and are useful as heat resistant, highly insulating materials or reinforcing agents for composite materials, particularly in the aerospace industry. Such high purity silicon nitride fibers are produced by spinning a solution of perhydropolysilazanes, an inert solvent and a spinning agent into fibers, preferably continuous fibers, and firing the spun fibers at 800.degree. to 1300.degree. C. in an inert atmosphere to form silicon nitride fibers of high purity.Type: GrantFiled: November 13, 1986Date of Patent: April 4, 1989Assignee: Tao Nenryo Kogyo K.K.Inventors: Mikiro Arai, Osamu Funayama, Hayato Nishii, Takeshi Isoda
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Patent number: 4795622Abstract: A silicon halide, preferably SiCl.sub.4, is reacted with an excess of a base, e.g. a Lewis base or Bronsted base with steric hindrance group to produce an adduct. The adduct, which need not be separated, is treated with ammonia gas to produce the imide of silicon. A light organic solvent is used. The temperature used is -78.degree. C. to 100.degree. C. and the reaction is rapid.Byproduct ammonium halide is removed, and the imide is heated at 1000.degree. C. to 1600.degree. C. in an oven in an atmosphere containing nitrogen, to produce silicon nitride of good sintering characteristics and more than 70 wt % of which is of the .alpha.-crystal form.Type: GrantFiled: April 24, 1986Date of Patent: January 3, 1989Assignee: Toa Nenryo Kogyo Kabushiki KaishaInventors: Takeshi Isoda, Mikiro Arai
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Patent number: 4659850Abstract: A novel polyorgano(hydro)silazane having the compositional formula: (RSiHNH).sub.x [(RSiH).sub.1.5 N].sub.1-x, wherein R is an alkyl group, an alkenyl group, a cycloalkyl group, an aryl group, another group in which the atom directly bound to Si is carbon, an alkylsilyl group, an alkylamino group, or an alkoxy group, and 0.4<x<1. This polyorgano(hydro)silazane is produced by reacting a complex of organo(hydro)diholosilane and a base with dry ammonia. This novel silazane is useful as a ceramic starting material, a polymer hardening agent, a densifying agent, a surface coating material, etc., and can be produced safely and at a low cost.Type: GrantFiled: April 9, 1986Date of Patent: April 21, 1987Assignee: Toa Nenryo Kogyo Kabushiki KaishaInventors: Mikiro Arai, Takeshi Isoda, Osamu Funayama