Patents by Inventor Milton O. Bernal

Milton O. Bernal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates
    Patent number: 11635688
    Abstract: The present invention is directed to a permanent photoimageable compositions and the cured products thereof useful for making negative-tone, permanent photoresist relief patterns on low surface energy polymer substrates, comprising: (A) one or more alkali soluble, film forming resins or one or more film forming resins that become soluble in alkali solutions by action of an acid, (B) one or more cationic photoinitiators, (C) one or more film casting solvents, and (D) one or more fluorinated compounds. The present invention is also directed to methods of forming a permanent photoresist relief pattern on a low surface energy polymer substrate using the disclosed compositions.
    Type: Grant
    Filed: March 4, 2013
    Date of Patent: April 25, 2023
    Assignee: KAYAKU ADVANCED MATERIALS, INC.
    Inventors: Daniel J. Nawrocki, Jeremy V. Golden, Milton O. Bernal, William D. Weber
  • PHOTOIMAGEABLE COMPOSITIONS AND PROCESSES FOR FABRICATION OF RELIEF PATTERNS ON LOW SURFACE ENERGY SUBSTRATES
    Publication number: 20150024326
    Abstract: The present invention is directed to a permanent photoimageable compositions and the cured products thereof useful for making negative-tone, permanent photoresist relief patterns on low surface energy polymer substrates, comprising: (A) one or more alkali soluble, film forming resins or one or more film forming resins that become soluble in alkali solutions by action of an acid, (B) one or more cationic photoinitiators, (C) one or more film casting solvents, and (D) one or more fluorinated compounds. The present invention is also directed to methods of forming a permanent photoresist relief pattern on a low surface energy polymer substrate using the disclosed compositions.
    Type: Application
    Filed: March 4, 2013
    Publication date: January 22, 2015
    Inventors: Daniel J. Nawrocki, Jeremy V. Golden, Milton O. Bernal, William D. Weber