Abstract: A system and method for combining positive and negative voltage electrostatic discharge (ESD) protection into a clamp that uses cascoded circuitry, including detecting, by an electrostatic discharge protection system, a voltage pulse on an input pin of an integrated circuit (IC) controller, the IC controller coupled between a power supply node and a ground supply node; determining, by the ESD protection circuit, an ESD event on the input pin based on the voltage detected on the input pin; and/or controlling, by the ESD protection circuit during the ESD event, one or more clamps to transport the voltage pulse from the input pin of the IC controller to the power supply node.

Abstract: A system and method for combining positive and negative voltage electrostatic discharge (ESD) protection into a clamp that uses cascoded circuitry, including detecting, by an electrostatic discharge protection system, a voltage pulse on an input pin of an integrated circuit (IC) controller, the IC controller coupled between a power supply node and a ground supply node; determining, by the ESD protection circuit, an ESD event on the input pin based on the voltage detected on the input pin; and/or controlling, by the ESD protection circuit during the ESD event, one or more clamps to transport the voltage pulse from the input pin of the IC controller to the power supply node.

Abstract: One aspect of the present invention provides a process for forming IC devices with ESD protection transistors. According to one aspect of the invention, an ESD protection transistor is provided with a light doping and then, after forming spacers, a heavy doping. The heavy doping with spacers in place can lower the sheet resistance, enhance the bipolar effect for the transistor, reduce the transistor's capacitance, and reduce the junction breakdown voltage, all without causing short channel effects. The invention thereby provides ESD protection transistors that are compact, highly sensitive, and fast-switching. The spacers can be formed at the same time as spacers for other transistors, such as other transistors in a peripheral region of the device.

Abstract: One aspect of the present invention provides a process for forming IC devices with ESD protection transistors. According to one aspect of the invention, an ESD protection transistor is provided with a light doping and then, after forming spacers, a heavy doping. The heavy doping with spacers in place can lower the sheet resistance, enhance the bipolar effect for the transistor, reduce the transistor's capacitance, and reduce the junction breakdown voltage, all without causing short channel effects. The invention thereby provides ESD protection transistors that are compact, highly sensitive, and fast-switching. The spacers can be formed at the same time as spacers for other transistors, such as other transistors in a peripheral region of the device.