Patents by Inventor Min-Chih Hsieh

Min-Chih Hsieh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Anti-ESD photomask blank
    Patent number: 7387855
    Abstract: An anti-electrostatic discharge photomask blank for fabrication of an anti-electrostatic discharge photomask is disclosed. The anti-electrostatic discharge photomask blank includes a mask substrate, a conductive layer provided on the mask substrate and an opaque patterning layer provided on the conductive layer. The conductive layer prevents charges of opposite polarity from accumulating on a photomask fabricated from the photomask blank, thus preventing electrostatic discharges on the photomask.
    Type: Grant
    Filed: January 10, 2005
    Date of Patent: June 17, 2008
    Inventors: Eric Chiang, Hung-Chun Wang, Min-Chih Hsieh, Ming-Tao Ho
  • Anti-ESD photomask blank
    Publication number: 20060154153
    Abstract: An anti-electrostatic discharge photomask blank for fabrication of an anti-electrostatic discharge photomask is disclosed. The anti-electrostatic discharge photomask blank includes a mask substrate, a conductive layer provided on the mask substrate and an opaque patterning layer provided on the conductive layer. The conductive layer prevents charges of opposite polarity from accumulating on a photomask fabricated from the photomask blank, thus preventing electrostatic discharges on the photomask.
    Type: Application
    Filed: January 10, 2005
    Publication date: July 13, 2006
    Inventors: Eric Chiang, Hung-Chun Wang, Min-Chih Hsieh, Ming-Tao Ho