Patents by Inventor Min-Chin Su

Min-Chin Su has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Manufacturing method of reflective layer of display device, reflective LCD device and transflective LCD device
    Patent number: 7505097
    Abstract: A reflective and a transflective liquid crystal display device and a manufacturing method thereof are provided. The manufacturing method includes the following steps. First, a substrate structure of a reflective or a transflective liquid crystal display device is provided. Next, a reflection layer is formed over the substrate structure, a protection layer is formed over the reflection layer, and a photoresist layer is formed over the protection layer. Then, the photoresist layer is patterned to form a patterned photoresist layer, the protection layer is patterned to form a patterned protection layer, and the reflection layer is patterned to form a patterned reflection layer. Thereafter, the patterned photoresist layer is removed.
    Type: Grant
    Filed: April 12, 2005
    Date of Patent: March 17, 2009
    Assignee: TPO Displays Corp.
    Inventors: Hung-Yi Luo, Min-Chin Su, Shih-Han Chen, Been-Chih Liou, Jr-Hong Chen
  • Manufacturing method of reflective layer of display device, reflective LCD device and transflective LCD device
    Publication number: 20060227265
    Abstract: A reflective and a transflective liquid crystal display device and a manufacturing method thereof are provided. The manufacturing method includes the following steps. First, a substrate structure of a reflective or a transflective liquid crystal display device is provided. Next, a reflection layer is formed over the substrate structure, a protection layer is formed over the reflection layer, and a photoresist layer is formed over the protection layer. Then, the photoresist layer is patterned to form a patterned photoresist layer, the protection layer is patterned to form a patterned protection layer, and the reflection layer is patterned to form a patterned reflection layer. Thereafter, the patterned photoresist layer is removed.
    Type: Application
    Filed: April 12, 2005
    Publication date: October 12, 2006
    Inventors: Hung-Yi Luo, Min-Chin Su, Shih-Han Chen, Been-Chih Liou, Jr-Hong Chen