Patents by Inventor Min Fan

Min Fan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7747402
    Abstract: Electrochemical analysis is performed by applying one or more time-sequenced voltage waveforms in a solution and measuring the resulting current in the solution. Raw data representative of the measured current parameters may be integrated based on one or more integration time intervals, and the raw data may be displayed in one or more three dimensional plots. The integrated data and the raw data may also be displayed in one or more two-dimensional plots. The raw data is stored for three dimensional displays and the integrated data is stored for two dimensional displays. Baseline correction is performed on the raw data and the baseline corrected data is displayed in one or more three dimensional plots and in one or more two dimensional plots. The raw data is stored at a rate between 100 Hz and 10 KHz.
    Type: Grant
    Filed: February 11, 2005
    Date of Patent: June 29, 2010
    Assignee: Dionex Corporation
    Inventors: Der-Min Fan, Raymond Gordon White, Walter Douglas Modic, Henry Hon-Kit Yeung, Ronald Steven Baron, Damon R. Gragg
  • Patent number: 7562092
    Abstract: The claims of the present application recite a method and system for accessing information in an otherwise inaccessible application database of a DBMS using view definitions that implement a security protocol.
    Type: Grant
    Filed: December 22, 2004
    Date of Patent: July 14, 2009
    Assignee: Microsoft Corporation
    Inventors: Min Fan, Edward A. Martinez, Tsvi Reiter, Jasjit Singh Grewal
  • Publication number: 20060180478
    Abstract: The invention is a method, system and software application for electrochemical analysis of analytes in a solution. In one aspect of the invention, raw data is received from an electrochemical analysis and the raw data is analyzed. The analyzed data and the raw data are displayed. The electrochemical analysis is performed by applying one or more time-sequenced voltage waveforms in the solution and measuring the resulting current in the solution. In one aspect of the invention, the raw data is received from the electrochemical analysis wherein the raw data is representative of the measured current parameters. The raw data may be integrated based on one or more integration time intervals, and the raw data may be displayed in one or more three dimensional plots. The integrated data and the raw data may also be displayed in one or more two-dimensional plots. The raw data is stored for three dimensional displays and the integrated data is stored for two dimensional displays.
    Type: Application
    Filed: February 11, 2005
    Publication date: August 17, 2006
    Inventors: Der-Min Fan, Henry Yeung, Ronald Baron, Damon Gragg, Raymond White, Walter Modic
  • Publication number: 20060136479
    Abstract: The claims of the present application recite a method and system for accessing information in an otherwise inaccessible application database of a DBMS using view definitions that implement a security protocol.
    Type: Application
    Filed: December 22, 2004
    Publication date: June 22, 2006
    Applicant: MICROSOFT CORPORATION
    Inventors: Min Fan, Edward Martinez, Tsvi Reiter, Jasjit Grewal
  • Publication number: 20040110681
    Abstract: Methods for validating the in vivo targeting specificity of compounds according to pharmacokinetic criteria are described. An improved method to generate a library of peptides with reduced complexity and enhanced candidate compound membership comprises expressing oligonucleotides encoding cyclic peptides with randomized coding sequences representing the non-bridging amino acids. Also described is determination of structure activity relationships using kinetic technique using in vivo panning. Design of targeting compounds with appropriate space/charge/hydrophobicity conformations can be based on the results of these kinetic structure activity relationship (kSAR) determinations. In addition, compositions resulting from this methodology are useful in treating neuroinflammatory and lung disorders, and disorders involving disseminated blood cell coagulopathy interactions with vascular endothelium.
    Type: Application
    Filed: August 8, 2003
    Publication date: June 10, 2004
    Inventors: Xiao-Min Fan, Elias Lazarides, Catherine M. Woods
  • Patent number: 6485513
    Abstract: A prosthetic vessel graft assembly has a tube of synthetic graft material surrounding a stent at its distal end, together with a plurality of collapsible anchors projecting radially from the stent. The assembly mounts on an introducer that may be tunneled through skin or inserted in an opening and pushed down to a vessel for introducing the graft through the vessel side wall. The introducer is configured to follow a guide wire which is inserted via a needle through an opening in the side wall of the vessel. A peel-away sheath covers the stent, graft, and anchor members at the distal end keeping them collapsed against the tubular body.
    Type: Grant
    Filed: October 6, 2000
    Date of Patent: November 26, 2002
    Assignee: The General Hospital Corporation
    Inventor: Chieh-Min Fan
  • Publication number: 20020076479
    Abstract: A method of monitoring the conditions during chemical vapor deposition. First, a first substrate is provided. A first oxide layer is formed over the first substrate and then a first silicon nitride layer is deposited over the first oxide layer under a set of depositing conditions. The first silicon nitride layer is removed so that the remaining first oxide layer can serve as a first measuring oxide layer. The interface trap density of the first measuring oxide layer is measured to obtain a first interface trap density. A second substrate is provided. A second oxide layer is formed over the second substrate. After setting the depositing conditions identical to the set of depositing conditions for depositing the first silicon nitride layer over the first substrate, a second silicon nitride layer is deposited over the second oxide layer. The second silicon nitride layer is performed under an actual set of depositing conditions.
    Type: Application
    Filed: December 29, 2000
    Publication date: June 20, 2002
    Applicant: United Microelectronics Corp.
    Inventors: Tzung-Hua Ying, Tang Yu, Jumn-Min Fan
  • Patent number: 6350707
    Abstract: The present invention provides a method of fabricating capacitor dielectric layer. A bottom electrode covered by a native oxide layer on a chip is provided. The chip is disposed into a low pressure furnace. A mixture of dichlorosilane and ammonia is introduced into the low pressure furnace to form a nitride layer on the native oxide layer. In the same low pressure furnace, nitrogen monoxide or nitric oxygen is infused to form an oxynitride layer on the nitride layer.
    Type: Grant
    Filed: September 3, 1999
    Date of Patent: February 26, 2002
    Assignee: United Microelectronics Corp.
    Inventors: Tse-Wei Liu, Jumn-Min Fan, Weichi Ting