Abstract: An ion detection sensor fabrication method includes: preparing an ion-sensitive film preparation solution; preparing an ion-sensitive mixed layer preparation solution by mixing the ion-sensitive film preparation solution with graphene powder; and forming an ion-sensitive mixed layer sensitive to a target ion by applying the ion-sensitive mixed layer preparation solution to fill a gap between a source and a drain spaced apart from each other and to cover at least a portion of an upper surface of each of the source and the drain.

Abstract: An ion detection sensor fabrication method includes: preparing an ion-sensitive film preparation solution; preparing an ion-sensitive mixed layer preparation solution by mixing the ion-sensitive film preparation solution with graphene powder; and forming an ion-sensitive mixed layer sensitive to a target ion by applying the ion-sensitive mixed layer preparation solution to fill a gap between a source and a drain spaced apart from each other and to cover at least a portion of an upper surface of each of the source and the drain.

Abstract: An electronic device and a method thereof are provided. The electronic device is configured to display a first window including a first set of at least one icon on a background screen, and detect a first movement request in a first direction move, according to the first movement request, the first window in the first direction in the background screen and add and display a second window including a second set of at least one icon on the background screen.

Abstract: An electronic device and a method thereof are provided. The electronic device is configured to display a first window including a first set of at least one icon on a background screen, and detect a first movement request in a first direction move, according to the first movement request, the first window in the first direction in the background screen and add and display a second window including a second set of at least one icon on the background screen.

Abstract: Disclosed is a method of fabricating a liquid crystal display device enabling to form a uniform gate insulating layer in thickness. The present includes the steps of forming a gate line, a gate electrode, and a storage line on a substrate and forming a gate insulating layer on the substrate including the gate line and the gate electrode using first and second gases having a gas mixture ratio of 0.3˜0.5:1. And, the first and second gases are mono-silane (SiH4) and ammonia (NH3), respectively. Accordingly, the present invention enables a uniformly thick gate insulating layer, thereby to improving the discharging time as well as reducing flicker on the screen.

Abstract: A liquid crystal display device includes a first substrate, a second substrate opposed to the first substrate, a plurality of gate lines formed on the first substrate along a first direction, a plurality of data lines formed on the first substrate along a second direction perpendicular to the first direction to define a plurality of pixel regions at intersections of the gate and data lines, a plurality of gate pads, each of the gate pads formed at an end portion of a corresponding one of the plurality of gate lines, a plurality of data pads, each of the data pads formed at an end portion of a corresponding one of the plurality of data lines, a gate insulating film having a first density formed on an entire surface of the first substrate including the plurality of gate lines and the plurality of gate pads, a plurality of thin film transistors formed at each intersection of the gate and data lines and between respective gate lines and respective data lines, and a passivation film having a second density less th

Abstract: Disclosed is a method of fabricating a liquid crystal display device enabling to form a uniform gate insulating layer in thickness. The present includes the steps of forming a gate line, a gate electrode, and a storage line on a substrate and forming a gate insulating layer on the substrate including the gate line and the gate electrode using first and second gases having a gas mixture ratio of 0.3˜0.5:1. And, the first and second gases are mono-silane(SiH4) and ammonia(NH3), respectively. Accordingly, the present invention enables a uniformly thick gate insulating layer, thereby to improving the discharging time as well as reducing flicker on the screen.

Abstract: A method of adjusting a size of a substrate of a liquid crystal display device includes determining if first and second substrates that are sealed together and have a liquid crystal material disposed therebetween are mutually aligned, one of the first and second substrates having a deposition layer formed thereupon, and controlling an amount of deposition stress of the deposition layer when the first and second substrates are not mutually aligned.

Abstract: Disclosed is a method of fabricating a liquid crystal display device enabling to form a uniform gate insulating layer in thickness. The present includes the steps of forming a gate line, a gate electrode, and a storage line on a substrate and forming a gate insulating layer on the substrate including the gate line and the gate electrode using first and second gases having a gas mixture ratio of 0.3˜0.5:1. And, the first and second gases are mono-silane(SiH4) and ammonia(NH3), respectively. Accordingly, the present invention enables a uniformly thick gate insulating layer, thereby to improving the discharging time as well as reducing flicker on the screen.

Abstract: A liquid crystal display device includes a first substrate, a second substrate opposed to the first substrate, a plurality of gate lines formed on the first substrate along a first direction, a plurality of data lines formed on the first substrate along a second direction perpendicular to the first direction to define a plurality of pixel regions at intersections of the gate and data lines, a plurality of gate pads, each of the gate pads formed at an end portion of a corresponding one of the plurality of gate lines, a plurality of data pads, each of the data pads formed at an end portion of a corresponding one of the plurality of data lines, a gate insulating film having a first density formed on an entire surface of the first substrate including the plurality of gate lines and the plurality of gate pads, a plurality of thin film transistors formed at each intersection of the gate and data lines and between respective gate lines and respective data lines, and a passivation film having a second density less th

Abstract: A method of adjusting a size of a substrate of a liquid crystal display device includes determining if first and second substrates that are sealed together and have a liquid crystal material disposed therebetween are mutually aligned, one of the first and second substrates having a deposition layer formed thereupon, and controlling an amount of deposition stress of the deposition layer when the first and second substrates are not mutually aligned.